JPH0458169B2 - - Google Patents

Info

Publication number
JPH0458169B2
JPH0458169B2 JP58191626A JP19162683A JPH0458169B2 JP H0458169 B2 JPH0458169 B2 JP H0458169B2 JP 58191626 A JP58191626 A JP 58191626A JP 19162683 A JP19162683 A JP 19162683A JP H0458169 B2 JPH0458169 B2 JP H0458169B2
Authority
JP
Japan
Prior art keywords
substrate
pattern
exposed
mask substrate
camera
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58191626A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6083329A (ja
Inventor
Hiroshige Sakahara
Yoshio Kobayashi
Masaji Koizumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP58191626A priority Critical patent/JPS6083329A/ja
Publication of JPS6083329A publication Critical patent/JPS6083329A/ja
Publication of JPH0458169B2 publication Critical patent/JPH0458169B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58191626A 1983-10-13 1983-10-13 パタ−ン露光装置 Granted JPS6083329A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58191626A JPS6083329A (ja) 1983-10-13 1983-10-13 パタ−ン露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58191626A JPS6083329A (ja) 1983-10-13 1983-10-13 パタ−ン露光装置

Publications (2)

Publication Number Publication Date
JPS6083329A JPS6083329A (ja) 1985-05-11
JPH0458169B2 true JPH0458169B2 (enrdf_load_stackoverflow) 1992-09-16

Family

ID=16277768

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58191626A Granted JPS6083329A (ja) 1983-10-13 1983-10-13 パタ−ン露光装置

Country Status (1)

Country Link
JP (1) JPS6083329A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62212659A (ja) * 1986-03-14 1987-09-18 Tamura Seisakusho Co Ltd 露光装置における基板セツト装置
JP3201233B2 (ja) * 1995-10-20 2001-08-20 ウシオ電機株式会社 裏面にアライメント・マークが設けられたワークの投影露光方法

Also Published As

Publication number Publication date
JPS6083329A (ja) 1985-05-11

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees