JPH0427684B2 - - Google Patents
Info
- Publication number
- JPH0427684B2 JPH0427684B2 JP58067031A JP6703183A JPH0427684B2 JP H0427684 B2 JPH0427684 B2 JP H0427684B2 JP 58067031 A JP58067031 A JP 58067031A JP 6703183 A JP6703183 A JP 6703183A JP H0427684 B2 JPH0427684 B2 JP H0427684B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- resist
- gold
- composite material
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58067031A JPS59193455A (ja) | 1983-04-18 | 1983-04-18 | X線リソグラフイ−用マスクの製造法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58067031A JPS59193455A (ja) | 1983-04-18 | 1983-04-18 | X線リソグラフイ−用マスクの製造法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59193455A JPS59193455A (ja) | 1984-11-02 |
JPH0427684B2 true JPH0427684B2 (enrdf_load_stackoverflow) | 1992-05-12 |
Family
ID=13333096
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58067031A Granted JPS59193455A (ja) | 1983-04-18 | 1983-04-18 | X線リソグラフイ−用マスクの製造法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59193455A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022145143A1 (ja) | 2020-12-28 | 2022-07-07 | 日本電気株式会社 | 情報処理システム、情報処理装置、情報処理方法及び記録媒体 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07104594B2 (ja) * | 1986-11-29 | 1995-11-13 | 新技術開発事業団 | 光リソグラフイ−用マスク及びその製造方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS541625A (en) * | 1977-06-06 | 1979-01-08 | Mitsubishi Electric Corp | Electrostatic recording head pressing mechanism |
JPS54157277A (en) * | 1978-06-01 | 1979-12-12 | Nippon Electric Co | Method of printed board for microwave |
-
1983
- 1983-04-18 JP JP58067031A patent/JPS59193455A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022145143A1 (ja) | 2020-12-28 | 2022-07-07 | 日本電気株式会社 | 情報処理システム、情報処理装置、情報処理方法及び記録媒体 |
Also Published As
Publication number | Publication date |
---|---|
JPS59193455A (ja) | 1984-11-02 |
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