JPH0374803B2 - - Google Patents
Info
- Publication number
- JPH0374803B2 JPH0374803B2 JP1501685A JP1501685A JPH0374803B2 JP H0374803 B2 JPH0374803 B2 JP H0374803B2 JP 1501685 A JP1501685 A JP 1501685A JP 1501685 A JP1501685 A JP 1501685A JP H0374803 B2 JPH0374803 B2 JP H0374803B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- pattern
- etching
- photoresist
- polyimide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000005530 etching Methods 0.000 claims description 22
- 239000004642 Polyimide Substances 0.000 claims description 17
- 229920001721 polyimide Polymers 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 16
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 14
- 229920002120 photoresistant polymer Polymers 0.000 claims description 13
- 238000010884 ion-beam technique Methods 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 5
- 238000001020 plasma etching Methods 0.000 claims 2
- 239000010931 gold Substances 0.000 description 25
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 15
- 229910052737 gold Inorganic materials 0.000 description 13
- 230000005540 biological transmission Effects 0.000 description 9
- 238000009713 electroplating Methods 0.000 description 7
- 238000007747 plating Methods 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 239000002253 acid Substances 0.000 description 1
- 238000004380 ashing Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- 150000002343 gold Chemical class 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 239000011265 semifinished product Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60015016A JPS61174546A (ja) | 1985-01-29 | 1985-01-29 | アスペクト比の大きい微細パタ−ンの製作法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60015016A JPS61174546A (ja) | 1985-01-29 | 1985-01-29 | アスペクト比の大きい微細パタ−ンの製作法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61174546A JPS61174546A (ja) | 1986-08-06 |
| JPH0374803B2 true JPH0374803B2 (enrdf_load_stackoverflow) | 1991-11-28 |
Family
ID=11877070
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60015016A Granted JPS61174546A (ja) | 1985-01-29 | 1985-01-29 | アスペクト比の大きい微細パタ−ンの製作法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61174546A (enrdf_load_stackoverflow) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63240502A (ja) * | 1987-03-27 | 1988-10-06 | Shimadzu Corp | Ａｕ透過型グレ−テイングの製作法 |
| JPH01283515A (ja) * | 1988-05-11 | 1989-11-15 | Stanley Electric Co Ltd | カラーフィルタを有する液晶表示装置の製造方法 |
| JP2636658B2 (ja) * | 1993-01-29 | 1997-07-30 | 株式会社島津製作所 | Ａｕ透過型グレーティングの製作法 |
| JP3703483B2 (ja) * | 1993-09-15 | 2005-10-05 | カール−ツァイス−スチフツング | 位相コントラスト−ｘ線顕微鏡 |
| JP4608679B2 (ja) * | 2005-03-17 | 2011-01-12 | 財団法人新産業創造研究機構 | Ｘ線タルボ干渉計に用いられる位相型回折格子と振幅型回折格子の製造方法 |
| JP6245794B2 (ja) * | 2011-07-29 | 2017-12-13 | キヤノン株式会社 | 遮蔽格子の製造方法 |
-
1985
- 1985-01-29 JP JP60015016A patent/JPS61174546A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61174546A (ja) | 1986-08-06 |
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