JPS59193455A - Ｘ線リソグラフイ−用マスクの製造法 - Google Patents
Ｘ線リソグラフイ−用マスクの製造法Info
- Publication number
- JPS59193455A JPS59193455A JP58067031A JP6703183A JPS59193455A JP S59193455 A JPS59193455 A JP S59193455A JP 58067031 A JP58067031 A JP 58067031A JP 6703183 A JP6703183 A JP 6703183A JP S59193455 A JPS59193455 A JP S59193455A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- composite material
- gold
- resist
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 4
- 238000001015 X-ray lithography Methods 0.000 title abstract description 5
- 238000000034 method Methods 0.000 claims abstract description 41
- 239000002131 composite material Substances 0.000 claims abstract description 24
- 238000010894 electron beam technology Methods 0.000 claims abstract description 13
- 239000000758 substrate Substances 0.000 claims abstract description 12
- 239000000463 material Substances 0.000 claims abstract description 9
- 229910052751 metal Inorganic materials 0.000 claims abstract description 8
- 239000002184 metal Substances 0.000 claims abstract description 8
- 238000001020 plasma etching Methods 0.000 claims abstract description 5
- 238000001883 metal evaporation Methods 0.000 claims abstract description 3
- 238000006116 polymerization reaction Methods 0.000 claims description 7
- 238000001459 lithography Methods 0.000 claims description 4
- 238000009792 diffusion process Methods 0.000 claims description 3
- 238000001704 evaporation Methods 0.000 claims description 3
- 239000010419 fine particle Substances 0.000 claims description 3
- 238000011161 development Methods 0.000 claims description 2
- 239000011230 binding agent Substances 0.000 claims 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 abstract description 40
- 239000010931 gold Substances 0.000 abstract description 40
- 229910052737 gold Inorganic materials 0.000 abstract description 40
- 239000002245 particle Substances 0.000 abstract description 17
- 239000011358 absorbing material Substances 0.000 abstract description 3
- 238000000151 deposition Methods 0.000 abstract 2
- 239000011859 microparticle Substances 0.000 abstract 2
- 239000006185 dispersion Substances 0.000 abstract 1
- 229920005596 polymer binder Polymers 0.000 abstract 1
- 239000002491 polymer binding agent Substances 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 description 9
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- 239000002904 solvent Substances 0.000 description 5
- 239000006096 absorbing agent Substances 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000010884 ion-beam technique Methods 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000002923 metal particle Substances 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 229920005575 poly(amic acid) Polymers 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- -1 2: v Substances 0.000 description 1
- 241000208140 Acer Species 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001903 differential pulse voltammetry Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 210000003127 knee Anatomy 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical compound [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58067031A JPS59193455A (ja) | 1983-04-18 | 1983-04-18 | Ｘ線リソグラフイ−用マスクの製造法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58067031A JPS59193455A (ja) | 1983-04-18 | 1983-04-18 | Ｘ線リソグラフイ−用マスクの製造法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59193455A true JPS59193455A (ja) | 1984-11-02 |
| JPH0427684B2 JPH0427684B2 (enrdf_load_stackoverflow) | 1992-05-12 |
Family
ID=13333096
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58067031A Granted JPS59193455A (ja) | 1983-04-18 | 1983-04-18 | Ｘ線リソグラフイ−用マスクの製造法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59193455A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63137231A (ja) * | 1986-11-29 | 1988-06-09 | Res Dev Corp Of Japan | 光リソグラフイ−用マスク及びその製造方法 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7605228B2 (ja) | 2020-12-28 | 2024-12-24 | 日本電気株式会社 | 情報処理システム、情報処理装置、情報処理方法及び記録媒体 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS541625A (en) * | 1977-06-06 | 1979-01-08 | Mitsubishi Electric Corp | Electrostatic recording head pressing mechanism |
| JPS54157277A (en) * | 1978-06-01 | 1979-12-12 | Nippon Electric Co | Method of printed board for microwave |
-
1983
- 1983-04-18 JP JP58067031A patent/JPS59193455A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS541625A (en) * | 1977-06-06 | 1979-01-08 | Mitsubishi Electric Corp | Electrostatic recording head pressing mechanism |
| JPS54157277A (en) * | 1978-06-01 | 1979-12-12 | Nippon Electric Co | Method of printed board for microwave |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63137231A (ja) * | 1986-11-29 | 1988-06-09 | Res Dev Corp Of Japan | 光リソグラフイ−用マスク及びその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0427684B2 (enrdf_load_stackoverflow) | 1992-05-12 |
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