JPH0426227B2 - - Google Patents
Info
- Publication number
- JPH0426227B2 JPH0426227B2 JP58171232A JP17123283A JPH0426227B2 JP H0426227 B2 JPH0426227 B2 JP H0426227B2 JP 58171232 A JP58171232 A JP 58171232A JP 17123283 A JP17123283 A JP 17123283A JP H0426227 B2 JPH0426227 B2 JP H0426227B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- magnetic
- alloy
- magnetic field
- ferromagnetic magnetoresistive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010408 film Substances 0.000 claims description 75
- 230000005294 ferromagnetic effect Effects 0.000 claims description 43
- 229910045601 alloy Inorganic materials 0.000 claims description 41
- 239000000956 alloy Substances 0.000 claims description 41
- 230000000694 effects Effects 0.000 claims description 25
- 239000010409 thin film Substances 0.000 claims description 18
- 239000000203 mixture Substances 0.000 claims description 15
- 229910002058 ternary alloy Inorganic materials 0.000 claims description 10
- 229910017061 Fe Co Inorganic materials 0.000 claims description 8
- 239000012528 membrane Substances 0.000 claims 1
- 230000005291 magnetic effect Effects 0.000 description 96
- 229910000889 permalloy Inorganic materials 0.000 description 12
- 230000004907 flux Effects 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- 238000007740 vapor deposition Methods 0.000 description 8
- 239000000758 substrate Substances 0.000 description 7
- 230000035945 sensitivity Effects 0.000 description 6
- 238000001514 detection method Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 3
- 229910000640 Fe alloy Inorganic materials 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910003271 Ni-Fe Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910001004 magnetic alloy Inorganic materials 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/10—Magnetoresistive devices
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58171232A JPS6064484A (ja) | 1983-09-19 | 1983-09-19 | 強磁性磁気抵抗効果合金膜 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58171232A JPS6064484A (ja) | 1983-09-19 | 1983-09-19 | 強磁性磁気抵抗効果合金膜 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6064484A JPS6064484A (ja) | 1985-04-13 |
| JPH0426227B2 true JPH0426227B2 (fr) | 1992-05-06 |
Family
ID=15919490
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58171232A Granted JPS6064484A (ja) | 1983-09-19 | 1983-09-19 | 強磁性磁気抵抗効果合金膜 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6064484A (fr) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0240972A (ja) * | 1988-07-29 | 1990-02-09 | Nec Corp | 磁気抵抗効果薄膜 |
| JP2610376B2 (ja) * | 1991-03-29 | 1997-05-14 | 株式会社東芝 | 磁気抵抗効果素子 |
| JP2551321B2 (ja) * | 1993-04-21 | 1996-11-06 | 日本電気株式会社 | 集積化磁気抵抗効果センサ |
| JP2776314B2 (ja) * | 1995-08-23 | 1998-07-16 | 日本電気株式会社 | 集積化磁気センサの積層膜構造 |
| TWI285885B (en) | 2001-10-17 | 2007-08-21 | Samsung Electronics Co Ltd | Disk cartridge and disk drive apparatus |
| KR100590211B1 (ko) | 2002-11-21 | 2006-06-15 | 가부시키가이샤 덴소 | 자기 임피던스 소자, 그를 이용한 센서 장치 및 그 제조방법 |
| JP4890891B2 (ja) | 2006-03-10 | 2012-03-07 | 山梨日本電気株式会社 | 磁気センサ、その製造方法および電子機器 |
-
1983
- 1983-09-19 JP JP58171232A patent/JPS6064484A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6064484A (ja) | 1985-04-13 |
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