JPH0424878B2 - - Google Patents
Info
- Publication number
- JPH0424878B2 JPH0424878B2 JP58151405A JP15140583A JPH0424878B2 JP H0424878 B2 JPH0424878 B2 JP H0424878B2 JP 58151405 A JP58151405 A JP 58151405A JP 15140583 A JP15140583 A JP 15140583A JP H0424878 B2 JPH0424878 B2 JP H0424878B2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor
- type
- silicon
- type semiconductor
- semiconductor layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/6729—Thin-film transistors [TFT] characterised by the electrodes
- H10D30/673—Thin-film transistors [TFT] characterised by the electrodes characterised by the shapes, relative sizes or dispositions of the gate electrodes
- H10D30/6732—Bottom-gate only TFTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/6704—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device
- H10D30/6713—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device characterised by the properties of the source or drain regions, e.g. compositions or sectional shapes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/674—Thin-film transistors [TFT] characterised by the active materials
- H10D30/6741—Group IV materials, e.g. germanium or silicon carbide
- H10D30/6743—Silicon
- H10D30/6745—Polycrystalline or microcrystalline silicon
Landscapes
- Photovoltaic Devices (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58151405A JPS6043869A (ja) | 1983-08-19 | 1983-08-19 | 半導体装置 |
JP1274697A JPH0669096B2 (ja) | 1983-08-19 | 1989-10-20 | 絶縁ゲート型電界効果トランジスタ |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58151405A JPS6043869A (ja) | 1983-08-19 | 1983-08-19 | 半導体装置 |
Related Child Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1274696A Division JPH0340470A (ja) | 1989-10-20 | 1989-10-20 | 絶縁ゲイト型電界効果トランジスタ |
JP1274697A Division JPH0669096B2 (ja) | 1983-08-19 | 1989-10-20 | 絶縁ゲート型電界効果トランジスタ |
JP3352883A Division JPH05267700A (ja) | 1991-12-17 | 1991-12-17 | 半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6043869A JPS6043869A (ja) | 1985-03-08 |
JPH0424878B2 true JPH0424878B2 (enrdf_load_stackoverflow) | 1992-04-28 |
Family
ID=15517867
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58151405A Granted JPS6043869A (ja) | 1983-08-19 | 1983-08-19 | 半導体装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6043869A (enrdf_load_stackoverflow) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63245964A (ja) * | 1987-03-31 | 1988-10-13 | Kanegafuchi Chem Ind Co Ltd | 集積型太陽電池 |
EP0445535B1 (en) | 1990-02-06 | 1995-02-01 | Sel Semiconductor Energy Laboratory Co., Ltd. | Method of forming an oxide film |
JPH03278466A (ja) * | 1990-03-27 | 1991-12-10 | Toshiba Corp | 薄膜トランジスタおよびその製造方法 |
EP0459763B1 (en) | 1990-05-29 | 1997-05-02 | Semiconductor Energy Laboratory Co., Ltd. | Thin-film transistors |
US5172485A (en) * | 1991-10-17 | 1992-12-22 | Mitutoyo Corporation | Precision linear measuring suspension system having sliding contact between the scale and the pick-off |
JPH05267700A (ja) * | 1991-12-17 | 1993-10-15 | Semiconductor Energy Lab Co Ltd | 半導体装置 |
KR100291971B1 (ko) | 1993-10-26 | 2001-10-24 | 야마자끼 순페이 | 기판처리장치및방법과박막반도체디바이스제조방법 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3032158A1 (de) * | 1979-08-30 | 1981-04-02 | Plessey Overseas Ltd., Ilford, Essex | Solarzelle |
-
1983
- 1983-08-19 JP JP58151405A patent/JPS6043869A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6043869A (ja) | 1985-03-08 |
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