JPH0420178B2 - - Google Patents

Info

Publication number
JPH0420178B2
JPH0420178B2 JP21347283A JP21347283A JPH0420178B2 JP H0420178 B2 JPH0420178 B2 JP H0420178B2 JP 21347283 A JP21347283 A JP 21347283A JP 21347283 A JP21347283 A JP 21347283A JP H0420178 B2 JPH0420178 B2 JP H0420178B2
Authority
JP
Japan
Prior art keywords
film
mask
cellulose
photosensitive resin
mask pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP21347283A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60104938A (ja
Inventor
Shohei Nakamura
Yoshimasa Tsuji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP57079184A external-priority patent/JPS58196971A/ja
Application filed by Asahi Chemical Industry Co Ltd filed Critical Asahi Chemical Industry Co Ltd
Priority to JP21347283A priority Critical patent/JPS60104938A/ja
Priority to US06/601,825 priority patent/US4587186A/en
Publication of JPS60104938A publication Critical patent/JPS60104938A/ja
Publication of JPH0420178B2 publication Critical patent/JPH0420178B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12Production of screen printing forms or similar printing forms, e.g. stencils
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24CABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C1/00Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods
    • B24C1/04Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods for treating only selected parts of a surface, e.g. for carving stone or glass
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0011Working of insulating substrates or insulating layers
    • H05K3/0044Mechanical working of the substrate, e.g. drilling or punching
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0073Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0079Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the method of application or removal of the mask

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Decoration By Transfer Pictures (AREA)
JP21347283A 1982-05-13 1983-11-14 固体表面加工用マスク転写材 Granted JPS60104938A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP21347283A JPS60104938A (ja) 1982-05-13 1983-11-14 固体表面加工用マスク転写材
US06/601,825 US4587186A (en) 1982-05-13 1984-04-19 Mask element for selective sandblasting and a method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP57079184A JPS58196971A (ja) 1982-05-13 1982-05-13 サンドブラスト用マスクの製造方法
JP21347283A JPS60104938A (ja) 1982-05-13 1983-11-14 固体表面加工用マスク転写材

Publications (2)

Publication Number Publication Date
JPS60104938A JPS60104938A (ja) 1985-06-10
JPH0420178B2 true JPH0420178B2 (enrdf_load_stackoverflow) 1992-03-31

Family

ID=26420235

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21347283A Granted JPS60104938A (ja) 1982-05-13 1983-11-14 固体表面加工用マスク転写材

Country Status (1)

Country Link
JP (1) JPS60104938A (enrdf_load_stackoverflow)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0414799Y2 (enrdf_load_stackoverflow) * 1985-07-10 1992-04-02
JP2562954B2 (ja) * 1988-09-06 1996-12-11 アイセロ化学 株式会社 彫食刻マスク用感光性積層フイルム
JPH0811365B2 (ja) * 1989-08-17 1996-02-07 アイセロ化学株式会社 彫食刻マスク用感光性積層フイルム
ATE196200T1 (de) * 1990-10-22 2000-09-15 Aicello Chemical Co Gravierverfahren mit bildmaske und lichtempfindlicher laminatfilm für besagte bildmaske
US5629132B1 (en) * 1991-03-28 2000-02-08 Aicello Chemical Method for engraving and/or etching with image-carrying mask and photo-sensitive laminate film for use in making the mask
US5518857A (en) * 1991-03-28 1996-05-21 Aicello Chemical Co., Ltd. Image-carrying mask photo-sensitive laminate film for use in making an image carry mask
JP2901129B2 (ja) * 1994-03-14 1999-06-07 アイセロ化学株式会社 サンドブラストレジストインキ
JP4497862B2 (ja) * 2003-07-18 2010-07-07 旭化成イーマテリアルズ株式会社 サンドブラスト用感光性樹脂積層体
DE102019211858A1 (de) * 2019-08-07 2021-02-11 Audi Ag Verfahren zum Maskieren von zu mattierenden Oberflächen

Also Published As

Publication number Publication date
JPS60104938A (ja) 1985-06-10

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