JPH04196345A - Structure of metal substrate - Google Patents

Structure of metal substrate

Info

Publication number
JPH04196345A
JPH04196345A JP32649090A JP32649090A JPH04196345A JP H04196345 A JPH04196345 A JP H04196345A JP 32649090 A JP32649090 A JP 32649090A JP 32649090 A JP32649090 A JP 32649090A JP H04196345 A JPH04196345 A JP H04196345A
Authority
JP
Japan
Prior art keywords
heat
metal
base metal
wiring layer
electronic component
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP32649090A
Other languages
Japanese (ja)
Inventor
Toshihiro Kimura
俊広 木村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissan Motor Co Ltd
Original Assignee
Nissan Motor Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissan Motor Co Ltd filed Critical Nissan Motor Co Ltd
Priority to JP32649090A priority Critical patent/JPH04196345A/en
Publication of JPH04196345A publication Critical patent/JPH04196345A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/4847Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond
    • H01L2224/48472Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond the other connecting portion not on the bonding area also being a wedge bond, i.e. wedge-to-wedge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors

Abstract

PURPOSE:To contrive to improve the reliability of the structure of a metal base by a method wherein first and second metal bases are made to bond to each other in the direction vertical to the direction in which an insulating layer and a wiring layer are formed. CONSTITUTION:First and second base metal films 9 are formed into a constitution, wherein they are bonded to each other in the direction vertical to a direction, in which an insulating layer 3 and a wiring layer 4 are laminated. Accordingly, as heat generated from an electronic component generating much heat is dissipated in the air via the metal films 9 of a high heat conductivity, the heat is not accumulated at the junction part between a metal board 1 and the electronic component generating much heat. As a result, a temperature rise is not caused and a breakdown of a semiconductor element 5, which is caused by overheating, is prevented. Moreover, as the electronic component 5 generating a little heat is mounted on the metal film 9, which has little thermal expansion due to a temperature difference in the outside environment, the thermal expansion of the metal base 9 is a little and the stress can be lessened. As a result, the separation of the component 5 generating heat a little from the metal films 9 due to the thermal expansion is prevented. Thereby, the reliability of a structure consisting of the substrate 1 and the electronic component 10 can be improved.

Description

【発明の詳細な説明】 (産業上の利用分野) この発明は、金属基板の構造に関する。[Detailed description of the invention] (Industrial application field) The present invention relates to the structure of a metal substrate.

(従来の技術) 従来の金属基板の構造としては第4図に示すようなもの
があった。この金属基板1はベース金属ち 9であるアルミニュウム2の上に絶縁層台を介して配線
I4が積層されている一般的な金属基板の構造である。
(Prior Art) A conventional metal substrate has a structure as shown in FIG. This metal substrate 1 has a general metal substrate structure in which wiring I4 is laminated on aluminum 2, which is a base metal 9, with an insulating layer interposed therebetween.

前記配線層4の上には電子部品である発熱量の多い半導
体素子(パワーデバイス)6と発熱−の少ない半導体素
子5が搭載されている。
Mounted on the wiring layer 4 are a semiconductor element (power device) 6 which is an electronic component and which generates a large amount of heat, and a semiconductor element 5 which generates a small amount of heat.

前記発熱量の少ない半導体素子5はアルミニュウム2の
ワイヤー7によって配線層4と電気的に結線され、ワイ
ヤー7と配線層4の接合部は超名波接合で結ばれている
。前記パワーデバイス6は端子15によって配線層4と
電気的に結線され、端子15と配線層4の接合部はばん
だ8によって結ばれている。
The semiconductor element 5, which generates a small amount of heat, is electrically connected to the wiring layer 4 by a wire 7 made of aluminum 2, and the bonding portion between the wire 7 and the wiring layer 4 is connected by ultra-high wave bonding. The power device 6 is electrically connected to the wiring layer 4 through a terminal 15, and the joint between the terminal 15 and the wiring layer 4 is connected through a solder 8.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

しかしながら、このような従来の金属基板の構造におい
てはベース金属9をアルミニュウム2とした場合には、
パワーデバイス6による発熱および外部環境の温度差に
よる温度変化によってアルミニュウム2と発熱量の少な
い半導体素子5の接合部に熱を持ってしまい、アルミニ
ュウム2と発熱量の少ない半導体素子5とは熱膨張係数
が大きく異なるのでパワーデバイス6によって発生した
熱によって半導体素子5と金属基板1の接合部が剥離す
ることがあった。
However, in such a conventional metal substrate structure, when the base metal 9 is made of aluminum 2,
Due to heat generated by the power device 6 and temperature changes due to temperature differences in the external environment, heat is generated at the junction between the aluminum 2 and the semiconductor element 5, which generates less heat, and the coefficient of thermal expansion between the aluminum 2 and the semiconductor element 5, which generates less heat, increases. Because of the large difference between the two, the heat generated by the power device 6 may cause the bond between the semiconductor element 5 and the metal substrate 1 to separate.

そこで、特にチップ勺イズが大きく発熱量の少ない半導
体素子であるS1チツプが搭載されているときは金属基
板と81チツプとの間にストレス繻和材(バッファ材)
を挿入して、ストレスを低減する手法が取られているが
部品点数および工数の増加を招き、それでもS1チツプ
と金属基板の接合部の剥離が生じてしまう。
Therefore, especially when the S1 chip, which is a semiconductor element with a large chip size and low heat generation, is mounted, a stress-reducing material (buffer material) is used between the metal substrate and the 81 chip.
Although a method has been taken to reduce the stress by inserting an S1 chip, this increases the number of parts and man-hours, and even then, separation of the joint between the S1 chip and the metal substrate still occurs.

また、ベース金属を鉄系合金とした場合には鉄系合金の
熱膨張係数が小さくSiチップやチップ部品を鉄系合金
に接合可能であるが、鉄系合金の熱伝導率が低いために
放熱性が悪く、鉄系合金上に発熱量の多い電子部品くパ
ワーデバイス)を搭載したとき、鉄系含金と電子部品の
接合部に熱が溜まってしまい、電子部品の過熱を起こし
金属基板上の電子部品を破壊してしまうという問題点が
あった。
In addition, when the base metal is an iron-based alloy, the thermal expansion coefficient of the iron-based alloy is small, making it possible to bond Si chips and chip components to the iron-based alloy, but heat dissipation is caused by the low thermal conductivity of the iron-based alloy. When electronic components (power devices) that have poor performance and generate a large amount of heat are mounted on a ferrous alloy, heat accumulates at the joint between the ferrous alloy and the electronic component, causing overheating of the electronic component and causing damage to the metal substrate. The problem was that it destroyed the electronic components of the device.

この発明は、このような従来の問題点に着目してなされ
たもので金R基板に搭載する電子部品のスペックに合わ
せてベース金属を選定できるように異なった2種類以上
の材料で金属基板を構成することによって、金属基板の
S造の信頼性を向上させることを目的としている。
This invention was made by focusing on such conventional problems, and it is possible to select a base metal according to the specifications of electronic components to be mounted on a gold R board. The purpose of this configuration is to improve the reliability of S construction of metal substrates.

〔課題を解決するための手段〕[Means to solve the problem]

本発明においては、ベース金属の土に絶縁層をz 介して配線層を積層し、該配線層上−電子部品を搭載す
る金属基板の構造において、前記ベース金属は発熱量の
多い電子部品が搭載される熱転導案の高い材料からなる
第1のベース金属と、該第1のベース金属に搭載されて
いる電子部品より発熱量の少ない電子部品が搭載される
熱膨張係数の小さい材料からなる第2のベース金属とを
少なくとも有し、第1および第2のベース金属は前記絶
縁層および前記配線層の積層される方向(こ対して垂直
方向でお互いに接着される構成とした。
In the present invention, in the structure of a metal substrate in which a wiring layer is laminated on a base metal with an insulating layer interposed therebetween, and electronic components are mounted on the wiring layer, the base metal is mounted with electronic components that generate a large amount of heat. a first base metal made of a material with a high thermal conductivity; and a material with a small coefficient of thermal expansion on which an electronic component that generates less heat than the electronic component mounted on the first base metal is mounted. The first and second base metals are bonded to each other in the direction in which the insulating layer and the wiring layer are laminated (perpendicular to this direction).

(作用] 第1のベース金属は熱伝導率が高いため、搭載された電
子部品の熱を効果的に放熱することができ、第2のベー
ス金属は熱膨張係数が小さく、熱伝導率が低いため、発
熱量が多い電子部品からの熱がベース金属を介して伝わ
りにくい。
(Function) The first base metal has a high thermal conductivity, so it can effectively dissipate the heat of the mounted electronic components, and the second base metal has a small coefficient of thermal expansion and a low thermal conductivity. Therefore, heat from electronic components that generate a large amount of heat is difficult to be transmitted through the base metal.

(実施例) 以下、この発明を図面に基づいて説明する。(Example) The present invention will be explained below based on the drawings.

第1図は、本発明の一実施例を示す図である。FIG. 1 is a diagram showing an embodiment of the present invention.

まず、構成を説明する。First, the configuration will be explained.

金属基板1のベース金属9は鉄系合金10とアルミニュ
ウム2で構成されている。ベース金属9には絶縁層3を
介して配線層4が積層されている。
The base metal 9 of the metal substrate 1 is composed of an iron-based alloy 10 and aluminum 2. A wiring layer 4 is laminated on the base metal 9 with an insulating layer 3 interposed therebetween.

2つのベース金属9は前記絶縁層3および前記配線層4
の積層される方向(図面上下方向)に対して垂直の方向
(図面左右方向)でお互いにエポキシ系樹脂の接着剤1
1によって接着されている。
The two base metals 9 are the insulating layer 3 and the wiring layer 4.
The epoxy resin adhesive 1 is attached to each other in the direction perpendicular to the stacking direction (vertical direction in the drawing) (horizontal direction in the drawing).
1.

ベース金属9が鉄系合金10の上には絶縁層3を介して
配線層4が積層され、さらにその上に発熱量の少ない半
導体素子5が積層されている。ベース金属9がアルミニ
ュウム2の上には絶縁層3を介して配線層4が積層され
、さらにその上に発熱量の多い半導体素子(パワーデバ
イス)6が積層されている。半導体素子5はワイヤー7
によって配線@4と電気的に結線され、結線部は超音波
接合によって結ばれている。パワーデバイス6は端子1
5によって配線層4と電気的に結線され、結線部ははん
だ8によって結ばれている。
A wiring layer 4 is laminated on the iron-based alloy 10 of the base metal 9 with an insulating layer 3 interposed therebetween, and a semiconductor element 5 having a small amount of heat is further laminated thereon. A wiring layer 4 is laminated on the aluminum base metal 9 with an insulating layer 3 interposed therebetween, and a semiconductor element (power device) 6 which generates a large amount of heat is further laminated thereon. The semiconductor element 5 is the wire 7
It is electrically connected to the wiring @4, and the connection part is connected by ultrasonic bonding. Power device 6 is terminal 1
It is electrically connected to the wiring layer 4 by 5, and the connection part is connected by solder 8.

次に作用を説明する。Next, the effect will be explained.

パワーデバイス6はアルミニコウム2からなるベース金
属9の上に搭載されているので、パワーデバイス6によ
り発ケする熱は熱転11率の高いアルミニュウム2へ放
熱され、さらに空気中に放熱されるのでパワーデバイス
6と金属基板1との接合部には熱は溜まらないので温度
1胃が起こらず、過熱による素子破壊が防げる。
Since the power device 6 is mounted on the base metal 9 made of aluminum 2, the heat generated by the power device 6 is radiated to the aluminum 2, which has a high heat transfer rate of 11, and is further radiated into the air. Since no heat is accumulated at the joint between the power device 6 and the metal substrate 1, temperature rise does not occur, and element destruction due to overheating can be prevented.

発熱部の少ない半導体素子5は外部環境の温度差による
熱膨張の少ない鉄系合金10の上に搭載されているので
、発熱量の多い半導体素子(パワーデバイス)6からの
熱がベース金属9を介して伝わりにり<、鉄系合金10
の熱膨張が少なく鉄系合金10のストレスが少なくでき
るので、熱膨張による鉄系合金10と半導体素子5との
素子はがれを防げる。
Since the semiconductor element 5 with a small heat generating part is mounted on the iron-based alloy 10 which exhibits little thermal expansion due to temperature differences in the external environment, the heat from the semiconductor element (power device) 6 which generates a large amount of heat is transferred to the base metal 9. It is transmitted through <, iron-based alloy 10
Since the stress on the iron-based alloy 10 can be reduced due to less thermal expansion, peeling of the iron-based alloy 10 and the semiconductor element 5 due to thermal expansion can be prevented.

以上より、金属基板1の構造の信頼性を向上できる。As described above, the reliability of the structure of the metal substrate 1 can be improved.

第2図に、ベース金属の構成例を示す。ベース金属の形
状を搭載される電子部品の配置、部位、回路構成に応じ
て任意に設定することができる。
FIG. 2 shows an example of the structure of the base metal. The shape of the base metal can be arbitrarily set depending on the arrangement, location, and circuit configuration of the electronic components to be mounted.

発熱量の少ない半導体素子5が搭載されるベース金属9
には鉄系合金10を選定し、発熱量の多いパワーデバイ
ス6が搭載されるベース金属9にはアルミニュウム2を
選定する。
Base metal 9 on which semiconductor element 5 with low heat generation is mounted
An iron-based alloy 10 is selected for the base metal 9 on which the power device 6 that generates a large amount of heat is mounted, and aluminum 2 is selected for the base metal 9.

第3図に、他の実施例を示す。FIG. 3 shows another embodiment.

まず、構成を説明する。First, the configuration will be explained.

金属基板1のベース金属9は銅12と鉄系合金10で構
成されている。ベース金属9には絶縁層3を介して配線
層4が積層されている。2つのベース金属9は前記絶縁
1i3および前記配線層4の積層される方向(図面上下
方向)に対して垂直方向(図面左右方向)でエポキシ系
樹脂の接着剤11によって接着されている。ベース金属
9が銅12の上には絶縁層3を介して配線層4が積層さ
れ、該配線層4の上には発熱量の多いLS114が積層
されている。ベース金属9が鉄系合金10上には絶縁層
3を介して配線N4が積層され、該配線層4上には、発
熱量の少ないチップ部品13が搭載されている。LSI
IIは端子によって配線@4と電気的に結線され、結線
部ははんだ8によって結ばれている。デツプ部品13は
はんだ8によって配[114と電気的に接続されている
The base metal 9 of the metal substrate 1 is composed of copper 12 and iron-based alloy 10. A wiring layer 4 is laminated on the base metal 9 with an insulating layer 3 interposed therebetween. The two base metals 9 are bonded together with an epoxy resin adhesive 11 in a direction perpendicular to the direction in which the insulating layer 1i3 and the wiring layer 4 are laminated (vertical direction in the drawing) (in the horizontal direction in the drawing). A wiring layer 4 is laminated on the copper 12 of the base metal 9 via an insulating layer 3, and an LS 114 which generates a large amount of heat is laminated on the wiring layer 4. A wiring N4 is laminated on a base metal 9 and an iron-based alloy 10 with an insulating layer 3 interposed therebetween, and a chip component 13 with a small amount of heat is mounted on the wiring layer 4. LSI
II is electrically connected to the wiring @4 by a terminal, and the connection portion is connected by solder 8. The dip part 13 is electrically connected to the wiring 114 by solder 8.

以下、釣用を説明する。The one for fishing will be explained below.

発熱体であるLS I 14は銅12から成るベース金
属9に搭載されているので、LS r 14より発生す
る熱は熱伝導率の高い銅12に放熱され、さらに空気中
に放熱される。従って、銅12とLS114との接合部
には熱は溜まらないので温度上昇が起こらず、過熱によ
る素子破壊が防げる。
Since the LSI 14, which is a heating element, is mounted on the base metal 9 made of copper 12, the heat generated by the LS r 14 is radiated to the copper 12, which has high thermal conductivity, and is further radiated into the air. Therefore, no heat is accumulated at the joint between the copper 12 and the LS 114, so no temperature rise occurs, and element destruction due to overheating can be prevented.

発熱量の少ないチップ部品13は外部環境の温度差によ
る熱膨張の少ない鉄系合金10の上に搭載されているの
で、鉄系合金10の熱膨張が少なく鉄系合金10のスト
レスが低減できるので熱膨張による鉄系合金10とチッ
プ部品13との素子はがれを防ぐことができる。
The chip component 13, which generates a small amount of heat, is mounted on the iron-based alloy 10, which has little thermal expansion due to temperature differences in the external environment, so the thermal expansion of the iron-based alloy 10 is small, and the stress on the iron-based alloy 10 can be reduced. It is possible to prevent element peeling between the iron-based alloy 10 and the chip component 13 due to thermal expansion.

以上より、金属基板1の構造の信頼性を向上できる。As described above, the reliability of the structure of the metal substrate 1 can be improved.

〔効果〕〔effect〕

以上説明してきたように、本発明によればその構成をベ
ース金属の上に絶縁層を介して配線層を積層し、該配線
層上に電子部品を搭載する金属基板の構造において、前
記ベース金属は発熱量の多い電子部品が搭載される熱伝
導率の高い材料からなる第1のベース金属と、該第1の
ベース金属に搭載されている電子部品より発熱量の少な
い電子部品が搭載される熱膨張係数の小さい材料からな
る第2のベース金属を少なくとも有し、第1および第2
のベース金属は前記絶縁層および前記配線層の積層され
る方向に対して垂直方向でお互いに接着される構成とし
たため、発熱量の多い電子部品より発生した熱は熱伝導
率の高いベース金属を介して空気中へ放熱されるため、
金属基板と発熱量の多い電子部品との接合部には熱が溜
まらないので温度上背が起こらず、過熱による素子破壊
が防げる。発熱量の少ない電子部品は外部環境の温度差
による熱膨張の少ないベース金属上に搭載されているの
でベース金属の熱膨張が少なくストレスを少なくできる
ので、熱膨張によるベース金属と発熱量の少ない電子部
品との素子はがれを防げる。以上より、金j!基板と電
子部品の構造の信頼性を向上させることができる。
As described above, according to the present invention, in the structure of a metal substrate in which a wiring layer is laminated on a base metal via an insulating layer and electronic components are mounted on the wiring layer, the base metal A first base metal made of a material with high thermal conductivity is mounted with electronic components that generate a large amount of heat, and an electronic component that generates less heat than the electronic components mounted on the first base metal is mounted. at least a second base metal made of a material with a small coefficient of thermal expansion;
Since the base metals are bonded to each other in a direction perpendicular to the direction in which the insulating layer and the wiring layer are laminated, the heat generated by electronic components that generate a large amount of heat is transferred to the base metal that has high thermal conductivity. Because heat is radiated into the air through
Since heat does not accumulate at the joint between the metal substrate and the electronic component that generates a large amount of heat, there is no rise in temperature, and element destruction due to overheating can be prevented. Electronic components that generate less heat are mounted on base metals that have less thermal expansion due to temperature differences in the external environment, so the base metal has less thermal expansion and stress can be reduced. Prevents elements from peeling off from parts. From the above, gold j! The reliability of the structure of the board and electronic components can be improved.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、本発明の一実施例を示づ図、第2図は、ベー
ス金属の構成を示す図、第3図は、本発明の他の実施例
を示す図、第4図は、従来の金属基板の実装構造を示し
た図。 1・・・金属基板    2・・・アルミニュウム3・
・・絶縁層     4・・・配線層5・・・発熱量の
少ない半導体素子 6・・・発熱量の多い半導体素子 (パワーデバイス) 7・・・ワイヤー    8・・・はんだ9・・・ベー
ス金1iE   10・・・鉄系合金11・・・エポキ
シ系樹脂の接着剤 12・・・銅      13・・・チップ部品14・
・・LSI     15・・・端子特許出願人   
 日産自動車株式会社1−1−/Lザ     4
FIG. 1 shows one embodiment of the present invention, FIG. 2 shows the structure of the base metal, FIG. 3 shows another embodiment of the invention, and FIG. 4 shows the structure of the base metal. A diagram showing a conventional mounting structure of a metal substrate. 1... Metal substrate 2... Aluminum 3.
...Insulating layer 4...Wiring layer 5...Semiconductor element with low heat value 6...Semiconductor element (power device) with high heat value 7...Wire 8...Solder 9...Base gold 1iE 10... Iron alloy 11... Epoxy resin adhesive 12... Copper 13... Chip parts 14.
...LSI 15...terminal patent applicant
Nissan Motor Co., Ltd. 1-1-/L the 4

Claims (1)

【特許請求の範囲】[Claims] ベース金属の上に絶縁層を介して配線層を積層し、該配
線層上に電子部品を搭載する金属基板の構造において、
前記ベース金属は発熱量の多い電子部品が搭載される熱
伝導率の高い材料からなる第1のベース金属と、該第1
のベース金属に搭載されている電子部品より発熱量の少
ない電子部品が搭載される熱膨張係数の小さい材料から
なる第2のベース金属とを少なくとも有し、第1および
第2のベース金属は前記絶縁層および前記配線層の積層
される方向に対して垂直方向でお互いに接着されること
を特徴とする金属基板の構造。
In the structure of a metal substrate in which a wiring layer is laminated on a base metal via an insulating layer, and electronic components are mounted on the wiring layer,
The base metal includes a first base metal made of a material with high thermal conductivity on which electronic components that generate a large amount of heat are mounted;
at least a second base metal made of a material with a small coefficient of thermal expansion on which an electronic component that generates less heat than the electronic component mounted on the base metal is mounted, and the first and second base metal are A structure of a metal substrate, characterized in that the insulating layer and the wiring layer are bonded to each other in a direction perpendicular to the direction in which they are laminated.
JP32649090A 1990-11-28 1990-11-28 Structure of metal substrate Pending JPH04196345A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32649090A JPH04196345A (en) 1990-11-28 1990-11-28 Structure of metal substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32649090A JPH04196345A (en) 1990-11-28 1990-11-28 Structure of metal substrate

Publications (1)

Publication Number Publication Date
JPH04196345A true JPH04196345A (en) 1992-07-16

Family

ID=18188408

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32649090A Pending JPH04196345A (en) 1990-11-28 1990-11-28 Structure of metal substrate

Country Status (1)

Country Link
JP (1) JPH04196345A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0633609A3 (en) * 1993-07-05 1995-09-13 Mitsubishi Electric Corp Composite board, and method of fabricating a composite board.
JPH11307720A (en) * 1998-04-21 1999-11-05 Toyota Autom Loom Works Ltd Semiconductor device
JP2008047843A (en) * 2006-07-20 2008-02-28 Sanyo Electric Co Ltd Circuit device, manufacturing method thereof, wiring board, and manufacturing method thereof

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0633609A3 (en) * 1993-07-05 1995-09-13 Mitsubishi Electric Corp Composite board, and method of fabricating a composite board.
US5521437A (en) * 1993-07-05 1996-05-28 Mitsubishi Denki Kabushiki Kaisha Semiconductor power module having an improved composite board and method of fabricating the same
JPH11307720A (en) * 1998-04-21 1999-11-05 Toyota Autom Loom Works Ltd Semiconductor device
JP2008047843A (en) * 2006-07-20 2008-02-28 Sanyo Electric Co Ltd Circuit device, manufacturing method thereof, wiring board, and manufacturing method thereof

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