JP3049466B2 - Lead frame for semiconductor device - Google Patents
Lead frame for semiconductor deviceInfo
- Publication number
- JP3049466B2 JP3049466B2 JP33003093A JP33003093A JP3049466B2 JP 3049466 B2 JP3049466 B2 JP 3049466B2 JP 33003093 A JP33003093 A JP 33003093A JP 33003093 A JP33003093 A JP 33003093A JP 3049466 B2 JP3049466 B2 JP 3049466B2
- Authority
- JP
- Japan
- Prior art keywords
- lead frame
- semiconductor device
- lead
- heat radiating
- radiating plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Lead Frames For Integrated Circuits (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は半導体装置用リードフレ
ームに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a lead frame for a semiconductor device.
【0002】[0002]
【従来の技術】半導体装置は、一般にリードフレームの
パッドに半導体チップ(以下 チップという)を接着搭
載し、チップ端子とインナーリードをボンディングワイ
ヤ−で接続し、樹脂等でインナーリード以内の部分をパ
ッケージし、当該パッケージから突出しているアウター
リードを所定形状に成形して製造される。また、前記パ
ッドはリードフレームと別体に形成され両面接着絶縁テ
−プ等で接合したものがある。2. Description of the Related Art In general, a semiconductor device has a semiconductor chip (hereinafter, referred to as a chip) bonded and mounted on a pad of a lead frame, a chip terminal and an inner lead are connected by a bonding wire, and a portion within the inner lead is packaged with a resin or the like. Then, the outer leads projecting from the package are formed into a predetermined shape and manufactured. In some cases, the pad is formed separately from the lead frame and bonded with a double-sided adhesive insulating tape or the like.
【0003】半導体装置はメモリの高集積化、ロジック
の多機能化が図られるとともに、小型化を要請されてい
る。これには入出信号ピン数の増加を必須的に要求され
るから、多ピンで且つそのピッチを微細にせねばならな
い。[0003] In a semiconductor device, high integration of a memory and multi-function of a logic are achieved, and miniaturization is required. Since this requires an increase in the number of input / output signal pins, the number of pins must be increased and the pitch thereof must be fine.
【0004】また、一方では、半導体装置は使用時の信
号処理速度の高速化を強く望まれるが、これには信号が
高周波化し発熱が多くなるので、熱放散を促進し温度上
昇を抑制する必要がある。On the other hand, on the other hand, it is strongly desired that the signal processing speed of the semiconductor device be increased during use. However, since the frequency of the signal is increased and the amount of heat is increased, it is necessary to promote the heat dissipation and suppress the temperature rise. There is.
【0005】半導体装置の温度上昇を抑制する技術とし
て、熱伝導度の高い銅あるいは銅合金からなる放熱板を
パッドの下方に設けるものがある。(例えば特開昭62
−84541号公報)。As a technique for suppressing a temperature rise of a semiconductor device, there is a technique in which a heat radiating plate made of copper or a copper alloy having high thermal conductivity is provided below a pad. (For example,
-84541).
【0006】[0006]
【この発明が解決しようとする課題】放熱板の設置は温
度上昇を抑制する効果があり有用である。しかし、放熱
板は例えば特開昭63−249342号公報に記載のよ
うに絶縁性テ−プを介してインナーリードからパッドの
下方に接着しているが、該テ−プは吸湿作用があり、半
導体装置として使用時に吸湿した水分が温度上昇で気化
し、膨張しクラックを発生することがある。また、水分
はリードフレーム、チップ、ボンディングワイヤ−に腐
食作用を及ぼし、機能を低下させ寿命を短くする。The installation of a heat radiating plate is effective because it has an effect of suppressing a rise in temperature. However, the radiator plate is bonded below the pad from the inner lead through an insulating tape as described in, for example, JP-A-63-249342, but the tape has a moisture absorbing effect. When used as a semiconductor device, moisture absorbed may evaporate due to a rise in temperature, expand, and cause cracks. In addition, the moisture has a corrosive effect on the lead frame, the chip, and the bonding wire, thereby deteriorating the function and shortening the service life.
【0007】放熱板は高熱伝導性を要請されることから
前述のように銅あるいは銅合金が用いられることが多い
が、前記接着用の絶縁性テ−プに例えば半導体装置の組
立作業時に何らかの理由によりスリ疵や切込み等が生じ
た場合には、当該箇所で絶縁性が劣化し短絡を生じるお
それがある。As described above, copper or copper alloy is often used for the heat sink because of high thermal conductivity. However, for example, when assembling a semiconductor device, the insulating tape for bonding is used for some reason. If a flaw, a cut, etc. occur due to the above, there is a possibility that the insulating property is deteriorated at the place and a short circuit occurs.
【0008】本発明はリードフレームに設置する放熱板
の絶縁性が厳密に確保され、該放熱板に高熱伝導材料が
絶縁性を維持して使用でき、信号処理の高速化ができる
半導体装置用のリードフレームを得ることを目的とす
る。また放熱板の絶縁性を高くしたことで、インナーリ
ードとの接合を電気的短絡を生じることなく強固とし、
該インナーリードが多ピンでピッチが微細であってもそ
の固定が確実になされる半導体装置用リードフレームを
目的とする。According to the present invention, there is provided a semiconductor device capable of strictly securing the insulating property of a heat radiating plate installed on a lead frame, using a high heat conductive material for the heat radiating plate while maintaining the insulating property, and increasing the speed of signal processing. The purpose is to obtain a lead frame. In addition, by increasing the insulation of the heat sink, the joint with the inner lead is made strong without causing an electrical short,
It is an object of the present invention to provide a semiconductor device lead frame in which even if the inner leads have a large number of pins and a fine pitch, the inner leads are securely fixed.
【0009】[0009]
【課題を解決するための手段】本発明の要旨は、インナ
ーリードに放熱板を積層して設けた半導体装置用のリー
ドフレームにおいて、絶縁処理を施した金属板からなる
放熱板を接着剤を介してインナーリード部以内の領域に
積層した半導体装置用リードフレームにある。また、前
記金属板の絶縁処理が金属アルコキシドのゾルを付着し
乾燥し焼成して形成されたところにある。SUMMARY OF THE INVENTION The gist of the present invention is to provide a lead frame for a semiconductor device in which a heat radiating plate is laminated on inner leads, and a heat radiating plate made of an insulated metal plate is bonded through an adhesive. In the semiconductor device lead frame laminated in a region within the inner lead portion. Further, the insulation treatment of the metal plate is formed by attaching a sol of a metal alkoxide, drying and firing.
【0010】[0010]
【作用】本発明ではインナーリードの下部または上部
に、絶縁処理を施した熱伝導性の高い金属板からなる放
熱板を積層するので、放熱作用が十分生じて温度上昇が
防止されるとともに、該放熱板とインナーリードとの絶
縁が厳密に確保され誘電がなく、信号処理を高速化でき
る半導体装置が得られる。According to the present invention, a heat radiating plate made of an insulated metal plate having a high thermal conductivity is laminated on the lower or upper part of the inner lead. A semiconductor device is obtained in which the insulation between the heat sink and the inner leads is strictly secured, has no dielectric, and can speed up signal processing.
【0011】放熱板は絶縁処理が施されているからイン
ナーリードと接着積層する際、両面接着絶縁テ−プのよ
うな高価の接着材を必ずしも必要とせず、安価な接着剤
でよくコスト低下が図られる。Since the heat radiating plate is insulated, it does not necessarily require an expensive adhesive such as a double-sided adhesive tape when bonding and laminating with the inner lead. It is planned.
【0012】絶縁処理は金属アルコキシドのゾルを金属
板に付着させ、乾燥し、焼成して形成されているので、
絶縁性が高く、また金属板との密着性が強く、半導体装
置の組立て時に絶縁不良箇所が生じることがない。[0012] The insulation treatment is formed by attaching a metal alkoxide sol to a metal plate, drying and firing.
The insulating property is high, and the adhesiveness to the metal plate is strong, so that there is no occurrence of defective insulation at the time of assembling the semiconductor device.
【0013】[0013]
【実施例】次に、本発明について1実施例に基づき図面
を参照して詳細に説明する。図面において、1はインナ
ーリード、2はアウターリードで前記インナーリード1
に連続している。3はタイバ−で前記インナーリード1
とアウターリード2の境界部に設けられている。BRIEF DESCRIPTION OF THE DRAWINGS FIG. In the drawings, 1 is an inner lead, 2 is an outer lead, and
It is continuous. 3 is a tie bar for the inner lead 1
And the outer lead 2.
【0014】この実施例でのリードフレーム4はチップ
を搭載するパッドが、前記インナーリード1やアウター
リード2とともに形成されていなくて、図2に示すよう
に別体の金属板から形成された放熱板5にパッド部6を
備え、該放熱板5をリードフレーム4のインナーリード
1の下部に接着させ積層するようにしている。In the lead frame 4 of this embodiment, the pads for mounting the chips are not formed together with the inner leads 1 and the outer leads 2, and the heat radiation is formed from a separate metal plate as shown in FIG. The plate 5 is provided with a pad portion 6, and the heat radiating plate 5 is adhered to the lower portion of the inner lead 1 of the lead frame 4 so as to be laminated.
【0015】放熱板5は熱伝導性の高い金属板例えば銅
又は銅合金等の材料から作られることが望ましく、絶縁
処理が施されている。絶縁処理はSi、Zr、Ti、A
l又はYなどの金属アルコキシド、例えばSiアルコキ
シドのテトラエトキシシン、Zrテトライソプロポキシ
ド、Tiイソプロポキシド、Alイソプロポキシド等
を、水あるいはアルコ−ル等を溶媒としたゾルを、浸
漬、塗布あるいは吹き付け等で金属板に付着させ、乾燥
し、焼成して形成したものである。該処理で形成した絶
縁被膜は密着性、絶縁性が強く、またその後、温度上昇
を繰り返し受けても前記性質は劣化しない。The heat radiating plate 5 is desirably made of a metal plate having high heat conductivity, for example, a material such as copper or a copper alloy, and is subjected to an insulation treatment. Insulation treatment is Si, Zr, Ti, A
A metal alkoxide such as 1 or Y, for example, tetraethoxycin of Si alkoxide, Zr tetraisopropoxide, Ti isopropoxide, Al isopropoxide, or the like, and a sol using water or an alcohol as a solvent are immersed and coated. Alternatively, it is formed by attaching to a metal plate by spraying or the like, drying and firing. The insulating film formed by this treatment has strong adhesion and insulating properties, and the above-mentioned properties do not deteriorate even if the temperature is repeatedly increased thereafter.
【0016】該放熱板5はインナーリード1の下部に接
着剤を介して図3に示すように接着され、当該インナー
リ−ド1に積層し各リ−ドを固定する。而して、例えば
リードフレーム4は多ピン且つリ−ドピッチが狭く、機
械的強度が弱くとも変形あるいは変位するようなことが
ない。また放熱板5の中央箇所はパッド部6となり、こ
こに搭載するチップ10とインナーリード1とのワイヤ
−ボンディングが支障なく行える。The heat radiating plate 5 is bonded to the lower portion of the inner lead 1 via an adhesive as shown in FIG. 3, and is laminated on the inner lead 1 to fix each lead. Thus, for example, the lead frame 4 has a large number of pins and a narrow lead pitch, and does not deform or displace even if the mechanical strength is weak. The central portion of the radiator plate 5 becomes the pad portion 6, so that the wire bonding between the chip 10 mounted thereon and the inner lead 1 can be performed without any trouble.
【0017】7はサイドレ−ル、8はガイドホ−ルであ
る。Reference numeral 7 denotes a side rail, and reference numeral 8 denotes a guide ball.
【0018】この実施例ではリードフレーム4にパッド
をインナーリード1、アウターリード2とともに形成し
なかったが、インナーリード1、アウターリード2の形
成の際にパッド9を図4に示すように形成したものても
よい。この場合はインナーリード1とパッド9の下部に
前記絶縁処理された放熱板5が接着剤を介して積層され
る。In this embodiment, the pads were not formed on the lead frame 4 together with the inner leads 1 and the outer leads 2. However, when the inner leads 1 and the outer leads 2 were formed, the pads 9 were formed as shown in FIG. It may be. In this case, the insulated heat radiating plate 5 is laminated below the inner lead 1 and the pad 9 via an adhesive.
【0019】また、放熱板5はインナーリード1を上部
から支持固定することができ、この場合には熱を上方に
も放散させることができる。Further, the heat sink 5 can support and fix the inner lead 1 from above, and in this case, the heat can be dissipated upward.
【0020】[0020]
【発明の効果】本発明の半導体装置用リードフレーム
は、絶縁処理を予めされた金属板からなる放熱板が、イ
ンナーリード領域以内の箇所に接着し積層されるので、
当該接着には両面接着絶縁テ−プのような高価な接着材
は必ずしも使わずともなされる。また前記テ−プ類の不
要により吸湿現象がなく、機能低下や樹脂封止パッケー
ジにクラック等が生ぜず、信頼性にすぐれ長寿命とな
る。According to the lead frame for a semiconductor device of the present invention, a heat radiating plate made of a metal plate which has been subjected to insulation treatment is bonded and laminated at a position within the inner lead region.
An expensive adhesive such as a double-sided adhesive insulating tape is not necessarily used for the bonding. In addition, since the tapes are not required, there is no moisture absorption phenomenon, and there is no deterioration in function or cracks in the resin-sealed package, resulting in excellent reliability and long life.
【0021】また、インナーリードは前記放熱板で固定
支持されるから、多ピンで当該インナーリードが小ピッ
チで幅狭ても変形あるいは前ダレ、リ−ド寄り等の変位
を生じることなく確実に当該インナーリードとパッドに
搭載したチップとのワイヤ−ボンディングがなされる。Further, since the inner leads are fixed and supported by the heat radiating plate, even if the inner leads are narrow at a small pitch with a large number of pins, the inner leads are surely prevented from being deformed or displaced such as front sagging and lead shift. Wire bonding between the inner lead and the chip mounted on the pad is performed.
【0022】放熱板の絶縁処理は金属アルコキシドのゾ
ルを付着させ、乾燥、焼成して形成したものであるの
で、絶縁性が高く、また半導体装置の組立て、搬送時等
で仮に擦り力を受けても絶縁性の劣化はない。The heat-dissipating plate is formed by depositing a sol of metal alkoxide, drying and firing, so that the heat-dissipating plate has a high insulating property, and is temporarily subjected to rubbing force when assembling or transporting the semiconductor device. Also, there is no deterioration in insulation.
【図1】本発明の1実施例におけるリードフレームの平
面図。FIG. 1 is a plan view of a lead frame according to an embodiment of the present invention.
【図2】本発明の1実施例におけるリードフレームでの
放熱板を示す図。FIG. 2 is a view showing a heat sink in a lead frame according to one embodiment of the present invention.
【図3】本発明の1実施例におけるリードフレームの側
面図。FIG. 3 is a side view of the lead frame according to the embodiment of the present invention.
【図4】本発明の他の実施例におけるリードフレームの
平面図。FIG. 4 is a plan view of a lead frame according to another embodiment of the present invention.
1 インナーリード 2 アウターリード 3 タイバ− 4 リードフレーム 5 放熱板 6 パッド部 7 サイドレ−ル 8 ガイドホ−ル 9 パッド 10 チップ DESCRIPTION OF SYMBOLS 1 Inner lead 2 Outer lead 3 Tie bar 4 Lead frame 5 Heat sink 6 Pad part 7 Side rail 8 Guide hole 9 Pad 10 Chip
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) H01L 23/50 ──────────────────────────────────────────────────の Continued on front page (58) Field surveyed (Int.Cl. 7 , DB name) H01L 23/50
Claims (1)
導体装置用のリードフレームにおいて、絶縁処理を施し
た金属板からなる放熱板を接着剤を介してインナーリー
ド部以内の領域に積層し、前記金属板の絶縁処理が金属
アルコキシドのゾルを付着させ、乾燥し焼成して形成さ
れたものであることを特徴とする半導体装置用リードフ
レーム。In a lead frame for a semiconductor device in which a heat radiating plate is laminated on an inner lead portion, a heat radiating plate made of an insulated metal plate is laminated in a region within the inner lead portion via an adhesive, A lead frame for a semiconductor device, wherein the insulation treatment of a metal plate is formed by attaching a sol of a metal alkoxide, drying and firing.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33003093A JP3049466B2 (en) | 1993-11-30 | 1993-11-30 | Lead frame for semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33003093A JP3049466B2 (en) | 1993-11-30 | 1993-11-30 | Lead frame for semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH07153890A JPH07153890A (en) | 1995-06-16 |
JP3049466B2 true JP3049466B2 (en) | 2000-06-05 |
Family
ID=18227996
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP33003093A Expired - Fee Related JP3049466B2 (en) | 1993-11-30 | 1993-11-30 | Lead frame for semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3049466B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002134674A (en) | 2000-10-20 | 2002-05-10 | Hitachi Ltd | Semiconductor device and its manufacturing method |
-
1993
- 1993-11-30 JP JP33003093A patent/JP3049466B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH07153890A (en) | 1995-06-16 |
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