JPH0419544B2 - - Google Patents

Info

Publication number
JPH0419544B2
JPH0419544B2 JP57102886A JP10288682A JPH0419544B2 JP H0419544 B2 JPH0419544 B2 JP H0419544B2 JP 57102886 A JP57102886 A JP 57102886A JP 10288682 A JP10288682 A JP 10288682A JP H0419544 B2 JPH0419544 B2 JP H0419544B2
Authority
JP
Japan
Prior art keywords
ketone
ethylene glycol
methyl
dialkyl
photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57102886A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58219549A (ja
Inventor
Hisashi Nakane
Akira Yokota
Wataru Kanai
Hidekatsu Obara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP10288682A priority Critical patent/JPS58219549A/ja
Priority to DE19833321632 priority patent/DE3321632A1/de
Publication of JPS58219549A publication Critical patent/JPS58219549A/ja
Publication of JPH0419544B2 publication Critical patent/JPH0419544B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP10288682A 1982-06-15 1982-06-15 ホトレジストの現像方法 Granted JPS58219549A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP10288682A JPS58219549A (ja) 1982-06-15 1982-06-15 ホトレジストの現像方法
DE19833321632 DE3321632A1 (de) 1982-06-15 1983-06-15 Verfahren zur herstellung feingemusterter photoresistfilme auf einem substrat

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10288682A JPS58219549A (ja) 1982-06-15 1982-06-15 ホトレジストの現像方法

Publications (2)

Publication Number Publication Date
JPS58219549A JPS58219549A (ja) 1983-12-21
JPH0419544B2 true JPH0419544B2 (enrdf_load_stackoverflow) 1992-03-30

Family

ID=14339342

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10288682A Granted JPS58219549A (ja) 1982-06-15 1982-06-15 ホトレジストの現像方法

Country Status (2)

Country Link
JP (1) JPS58219549A (enrdf_load_stackoverflow)
DE (1) DE3321632A1 (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8900802B2 (en) 2013-02-23 2014-12-02 International Business Machines Corporation Positive tone organic solvent developed chemically amplified resist

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5748639B2 (enrdf_load_stackoverflow) * 1973-09-11 1982-10-16
JPS5151939A (ja) * 1974-10-31 1976-05-07 Canon Kk Saisenpataanyohotorejisutogenzoeki

Also Published As

Publication number Publication date
JPS58219549A (ja) 1983-12-21
DE3321632A1 (de) 1983-12-15

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