JPH0418284B2 - - Google Patents

Info

Publication number

JPH0418284B2

JPH0418284B2 JP56067997A JP6799781A JPH0418284B2 JP H0418284 B2 JPH0418284 B2 JP H0418284B2 JP 56067997 A JP56067997 A JP 56067997A JP 6799781 A JP6799781 A JP 6799781A JP H0418284 B2 JPH0418284 B2 JP H0418284B2

Authority

JP

Japan

Prior art keywords

metal

insulating film

transparent

electrode

liquid crystal

Prior art date

1981-05-06

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Expired - Lifetime

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• 229910052751 metal Inorganic materials 0.000 claims description 31
• 239000002184 metal Substances 0.000 claims description 31
• 239000004973 liquid crystal related substance Substances 0.000 claims description 17
• 239000000758 substrate Substances 0.000 claims description 14
• 239000011159 matrix material Substances 0.000 claims description 2
• 229910044991 metal oxide Inorganic materials 0.000 claims description 2
• 229910004298 SiO 2 Inorganic materials 0.000 description 9
• VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
• 238000010586 diagram Methods 0.000 description 6
• 229910006404 SnO 2 Inorganic materials 0.000 description 5
• 239000000463 material Substances 0.000 description 5
• 229910052715 tantalum Inorganic materials 0.000 description 5
• GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 5
• 238000009413 insulation Methods 0.000 description 3
• 238000004519 manufacturing process Methods 0.000 description 3
• 235000012239 silicon dioxide Nutrition 0.000 description 3
• 239000000377 silicon dioxide Substances 0.000 description 3
• 238000004544 sputter deposition Methods 0.000 description 3
• 229910052681 coesite Inorganic materials 0.000 description 2
• 230000008878 coupling Effects 0.000 description 2
• 238000010168 coupling process Methods 0.000 description 2
• 238000005859 coupling reaction Methods 0.000 description 2
• 229910052906 cristobalite Inorganic materials 0.000 description 2
• 238000000034 method Methods 0.000 description 2
• 230000002093 peripheral effect Effects 0.000 description 2
• 229910052682 stishovite Inorganic materials 0.000 description 2
• 229910052905 tridymite Inorganic materials 0.000 description 2
• 239000000853 adhesive Substances 0.000 description 1
• 230000001070 adhesive effect Effects 0.000 description 1
• 230000003796 beauty Effects 0.000 description 1
• 230000006866 deterioration Effects 0.000 description 1
• 238000002845 discoloration Methods 0.000 description 1
• 230000000694 effects Effects 0.000 description 1
• 238000002474 experimental method Methods 0.000 description 1
• PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
• 239000010931 gold Substances 0.000 description 1
• 229910052737 gold Inorganic materials 0.000 description 1
• 229910003437 indium oxide Inorganic materials 0.000 description 1
• PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
• 239000007769 metal material Substances 0.000 description 1
• 150000002739 metals Chemical class 0.000 description 1
• 229910001120 nichrome Inorganic materials 0.000 description 1
• BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
• 229910001936 tantalum oxide Inorganic materials 0.000 description 1
• XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
• 229910001887 tin oxide Inorganic materials 0.000 description 1