JPH0411518B2 - - Google Patents

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Publication number
JPH0411518B2
JPH0411518B2 JP62025301A JP2530187A JPH0411518B2 JP H0411518 B2 JPH0411518 B2 JP H0411518B2 JP 62025301 A JP62025301 A JP 62025301A JP 2530187 A JP2530187 A JP 2530187A JP H0411518 B2 JPH0411518 B2 JP H0411518B2
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JP
Japan
Prior art keywords
crystal
gallium arsenide
resistivity
gaas
heat treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62025301A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63195199A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2530187A priority Critical patent/JPS63195199A/ja
Publication of JPS63195199A publication Critical patent/JPS63195199A/ja
Publication of JPH0411518B2 publication Critical patent/JPH0411518B2/ja
Granted legal-status Critical Current

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  • Crystals, And After-Treatments Of Crystals (AREA)
JP2530187A 1987-02-05 1987-02-05 ガリウム砒素結晶の製造方法 Granted JPS63195199A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2530187A JPS63195199A (ja) 1987-02-05 1987-02-05 ガリウム砒素結晶の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2530187A JPS63195199A (ja) 1987-02-05 1987-02-05 ガリウム砒素結晶の製造方法

Publications (2)

Publication Number Publication Date
JPS63195199A JPS63195199A (ja) 1988-08-12
JPH0411518B2 true JPH0411518B2 (enrdf_load_stackoverflow) 1992-02-28

Family

ID=12162192

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2530187A Granted JPS63195199A (ja) 1987-02-05 1987-02-05 ガリウム砒素結晶の製造方法

Country Status (1)

Country Link
JP (1) JPS63195199A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0269307A (ja) * 1988-09-02 1990-03-08 Nippon Mining Co Ltd リン化インジウムおよびその製造方法
JPH0745360B2 (ja) * 1988-12-28 1995-05-17 株式会社ジャパンエナジー InP単結晶の熱処理方法
JPH03232235A (ja) * 1990-02-08 1991-10-16 Sumitomo Metal Mining Co Ltd GaAs化合物半導体単結晶基板の熱処理方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61151094A (ja) * 1984-12-26 1986-07-09 Agency Of Ind Science & Technol 化合物半導体単結晶の製造方法
JPS61201700A (ja) * 1985-03-05 1986-09-06 Sumitomo Electric Ind Ltd 高抵抗GaAs結晶およびその製造方法
JPS61275196A (ja) * 1985-05-29 1986-12-05 Toshiba Corp GaAs単結晶の製造方法
JPH07107879B2 (ja) * 1986-07-14 1995-11-15 三菱電機株式会社 荷電粒子装置

Also Published As

Publication number Publication date
JPS63195199A (ja) 1988-08-12

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Akai Basic High-Technology Laboratories, Sumitomo Electric Ind., Ltd.