JPH0411518B2 - - Google Patents
Info
- Publication number
- JPH0411518B2 JPH0411518B2 JP62025301A JP2530187A JPH0411518B2 JP H0411518 B2 JPH0411518 B2 JP H0411518B2 JP 62025301 A JP62025301 A JP 62025301A JP 2530187 A JP2530187 A JP 2530187A JP H0411518 B2 JPH0411518 B2 JP H0411518B2
- Authority
- JP
- Japan
- Prior art keywords
- crystal
- gallium arsenide
- resistivity
- gaas
- heat treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2530187A JPS63195199A (ja) | 1987-02-05 | 1987-02-05 | ガリウム砒素結晶の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2530187A JPS63195199A (ja) | 1987-02-05 | 1987-02-05 | ガリウム砒素結晶の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63195199A JPS63195199A (ja) | 1988-08-12 |
JPH0411518B2 true JPH0411518B2 (enrdf_load_stackoverflow) | 1992-02-28 |
Family
ID=12162192
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2530187A Granted JPS63195199A (ja) | 1987-02-05 | 1987-02-05 | ガリウム砒素結晶の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63195199A (enrdf_load_stackoverflow) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0269307A (ja) * | 1988-09-02 | 1990-03-08 | Nippon Mining Co Ltd | リン化インジウムおよびその製造方法 |
JPH0745360B2 (ja) * | 1988-12-28 | 1995-05-17 | 株式会社ジャパンエナジー | InP単結晶の熱処理方法 |
JPH03232235A (ja) * | 1990-02-08 | 1991-10-16 | Sumitomo Metal Mining Co Ltd | GaAs化合物半導体単結晶基板の熱処理方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61151094A (ja) * | 1984-12-26 | 1986-07-09 | Agency Of Ind Science & Technol | 化合物半導体単結晶の製造方法 |
JPS61201700A (ja) * | 1985-03-05 | 1986-09-06 | Sumitomo Electric Ind Ltd | 高抵抗GaAs結晶およびその製造方法 |
JPS61275196A (ja) * | 1985-05-29 | 1986-12-05 | Toshiba Corp | GaAs単結晶の製造方法 |
JPH07107879B2 (ja) * | 1986-07-14 | 1995-11-15 | 三菱電機株式会社 | 荷電粒子装置 |
-
1987
- 1987-02-05 JP JP2530187A patent/JPS63195199A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS63195199A (ja) | 1988-08-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0503816B1 (en) | Heat treatment of Si single crystal | |
JP5772553B2 (ja) | シリコン単結晶の評価方法およびシリコン単結晶の製造方法 | |
US20070113778A1 (en) | Epitaxial silicon wafer | |
KR20030022322A (ko) | 질소도프 어닐웨이퍼의 제조방법 및 질소도프 어닐웨이퍼 | |
US5385115A (en) | Semiconductor wafer heat treatment method | |
JPH0411518B2 (enrdf_load_stackoverflow) | ||
US4585511A (en) | Method of growing gallium arsenide crystals using boron oxide encapsulant | |
US4578126A (en) | Liquid phase epitaxial growth process | |
EP0334684B1 (en) | A method for heat-treating gallium arsenide monocrystals | |
JPS58161999A (ja) | 半絶縁性砒化ガリウム単結晶の製造方法 | |
JPH0557239B2 (enrdf_load_stackoverflow) | ||
JPH04298042A (ja) | 半導体の熱処理方法 | |
JP3793934B2 (ja) | 半絶縁性InP単結晶の製造方法 | |
JP2881759B2 (ja) | 酸素濃度の均一なシリコンウェーハ及びその製造方法 | |
JPH0543679B2 (enrdf_load_stackoverflow) | ||
KR100500394B1 (ko) | 에피택셜 실리콘웨이퍼의 제조 방법 | |
JPS61286300A (ja) | 均一な特性を有するGaAs単結晶の製造方法 | |
JPH0380199A (ja) | p型GaAs単結晶基板およびその製造方法並びにそれを用いた半導体装置 | |
JPH0784360B2 (ja) | 半絶縁性GaAs基板の製造方法 | |
JPH01215799A (ja) | 半絶縁性GaAs化合物半導体単結晶及びその製造方法 | |
JP3171451B2 (ja) | GaAs単結晶の熱処理方法 | |
JP2737990B2 (ja) | 化合物半導体単結晶製造装置 | |
JP2770572B2 (ja) | 半絶縁性GaAs単結晶の製造方法 | |
JPH07115999B2 (ja) | 化合物半導体単結晶の熱処理方法 | |
Akai | Basic High-Technology Laboratories, Sumitomo Electric Ind., Ltd. |