JPH039328Y2 - - Google Patents
Info
- Publication number
- JPH039328Y2 JPH039328Y2 JP16437886U JP16437886U JPH039328Y2 JP H039328 Y2 JPH039328 Y2 JP H039328Y2 JP 16437886 U JP16437886 U JP 16437886U JP 16437886 U JP16437886 U JP 16437886U JP H039328 Y2 JPH039328 Y2 JP H039328Y2
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- semiconductor wafer
- turntable
- nozzle
- wall
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004140 cleaning Methods 0.000 claims description 76
- 239000004065 semiconductor Substances 0.000 claims description 48
- 235000012431 wafers Nutrition 0.000 claims description 35
- 239000007788 liquid Substances 0.000 claims description 26
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 238000011084 recovery Methods 0.000 description 18
- 238000000926 separation method Methods 0.000 description 14
- 229920002120 photoresistant polymer Polymers 0.000 description 10
- 238000000034 method Methods 0.000 description 7
- 238000011109 contamination Methods 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 239000007921 spray Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005192 partition Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16437886U JPH039328Y2 (US06826419-20041130-M00005.png) | 1986-10-27 | 1986-10-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16437886U JPH039328Y2 (US06826419-20041130-M00005.png) | 1986-10-27 | 1986-10-27 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6370144U JPS6370144U (US06826419-20041130-M00005.png) | 1988-05-11 |
| JPH039328Y2 true JPH039328Y2 (US06826419-20041130-M00005.png) | 1991-03-08 |
Family
ID=31093445
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16437886U Expired JPH039328Y2 (US06826419-20041130-M00005.png) | 1986-10-27 | 1986-10-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH039328Y2 (US06826419-20041130-M00005.png) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2748324B2 (ja) * | 1988-09-16 | 1998-05-06 | 大日本印刷株式会社 | 印刷機部品用洗浄装置 |
| JP3876059B2 (ja) * | 1997-09-29 | 2007-01-31 | 大日本スクリーン製造株式会社 | 基板処理装置および周辺部材の洗浄方法 |
-
1986
- 1986-10-27 JP JP16437886U patent/JPH039328Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6370144U (US06826419-20041130-M00005.png) | 1988-05-11 |
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