JPH038536B2 - - Google Patents

Info

Publication number
JPH038536B2
JPH038536B2 JP57189536A JP18953682A JPH038536B2 JP H038536 B2 JPH038536 B2 JP H038536B2 JP 57189536 A JP57189536 A JP 57189536A JP 18953682 A JP18953682 A JP 18953682A JP H038536 B2 JPH038536 B2 JP H038536B2
Authority
JP
Japan
Prior art keywords
chlorine
group
substituted
atom
bromine atom
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57189536A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5978339A (ja
Inventor
Masayuki Iwasaki
Minoru Maeda
Fumiaki Shinozaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP57189536A priority Critical patent/JPS5978339A/ja
Priority to GB08328774A priority patent/GB2132212B/en
Priority to DE3339228A priority patent/DE3339228C2/de
Publication of JPS5978339A publication Critical patent/JPS5978339A/ja
Priority to US06/741,721 priority patent/US4584260A/en
Publication of JPH038536B2 publication Critical patent/JPH038536B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/124—Carbonyl compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/126—Halogen compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
JP57189536A 1982-10-28 1982-10-28 光重合性組成物 Granted JPS5978339A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP57189536A JPS5978339A (ja) 1982-10-28 1982-10-28 光重合性組成物
GB08328774A GB2132212B (en) 1982-10-28 1983-10-27 Photopolymerizable composition
DE3339228A DE3339228C2 (de) 1982-10-28 1983-10-28 Photopolymerisierbare Zusammensetzung
US06/741,721 US4584260A (en) 1982-10-28 1985-06-06 Photopolymerizable compositions with combined photoinitiators

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57189536A JPS5978339A (ja) 1982-10-28 1982-10-28 光重合性組成物

Publications (2)

Publication Number Publication Date
JPS5978339A JPS5978339A (ja) 1984-05-07
JPH038536B2 true JPH038536B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-02-06

Family

ID=16242944

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57189536A Granted JPS5978339A (ja) 1982-10-28 1982-10-28 光重合性組成物

Country Status (4)

Country Link
US (1) US4584260A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS5978339A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3339228C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
GB (1) GB2132212B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59148784A (ja) * 1983-02-10 1984-08-25 Konishiroku Photo Ind Co Ltd ５―置換―２―ハロメチル―１，３，４―オキサジアゾール化合物及び該化合物を含有する光反応開始剤
EP0130599B1 (en) * 1983-06-29 1988-08-10 Fuji Photo Film Co., Ltd. Photosolubilizable composition
JPS6063532A (ja) * 1983-08-16 1985-04-11 Fuji Photo Film Co Ltd 光重合性組成物
DE3532055A1 (de) * 1985-09-09 1987-03-12 Teves Gmbh Alfred Schalter mit schlagartiger umschaltung
DE3606155A1 (de) * 1986-02-26 1987-08-27 Basf Ag Photopolymerisierbares gemisch, dieses enthaltendes lichtempfindliches aufzeichnungselement sowie verfahren zur herstellung einer flachdruckform mittels dieses lichtempfindlichen aufzeichnungselements
AU590671B2 (en) * 1986-02-28 1989-11-09 Minnesota Mining And Manufacturing Company One-part visible light-curable dentin and enamel adhesive
JPS6358440A (ja) * 1986-08-29 1988-03-14 Fuji Photo Film Co Ltd 感光性組成物
US4945027A (en) * 1987-10-23 1990-07-31 Hoechst Celanese Corporation 1,4 or 9,10 dimethoxyanthracene triggers for 2-tri(chloro or bromo)methyl-4(1H)-quinazolimone polymerization initiators
US4845011A (en) * 1987-10-23 1989-07-04 Hoechst Celanese Corporation Visible light photoinitiation compositions
JPH0820733B2 (ja) * 1988-08-11 1996-03-04 富士写真フイルム株式会社 ドライフイルムレジスト用光重合性組成物
DE3830914A1 (de) * 1988-09-10 1990-03-22 Hoechst Ag Photopolymerisierbares gemisch, daraus hergestelltes aufzeichnungsmaterial und verfahren zur herstellung von kopien
BR9709761A (pt) * 1996-05-20 2000-01-11 First Chemical Corp Compostos fotoativos para uso com sistemas de cura ultravioleta (uv) de faixa de comprimento de ona estreita.
US6479706B1 (en) 1997-02-04 2002-11-12 Albemarle Corporation Aminobenzophenones and photopolymerizable compositions including the same
CA2353685A1 (en) * 1998-09-28 2000-04-06 Kimberly-Clark Worldwide, Inc. Chelates comprising chinoid groups as photoinitiators
JP4344638B2 (ja) * 2004-03-26 2009-10-14 富士フイルム株式会社 反射防止フィルム及びその製造方法、製造装置
CN102504055B (zh) * 2011-11-11 2013-10-16 江西科技师范学院 一种水性反应性的二苯甲酮类光引发剂及其合成方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE759041A (fr) * 1969-11-18 1971-05-17 Du Pont Compositions photopolymerisables contenant des aminophenylcetones et des adjuvants
US4113592A (en) * 1975-04-14 1978-09-12 Celanese Corporation Trihalogenated hydrocarbons as co-photoinitiators
US4040922A (en) * 1975-10-06 1977-08-09 Eastman Kodak Company Photopolymerizable polymeric compositions containing halogen containing heterocyclic compound
US4097994A (en) * 1975-11-24 1978-07-04 Monsanto Company Dental restorative composition containing oligomeric BIS-GMA resin and Michler's ketone
JPS591401B2 (ja) * 1976-04-26 1984-01-12 東洋インキ製造株式会社 紫外線硬化性組成物
US4065315A (en) * 1976-04-26 1977-12-27 Dynachem Corporation Phototropic dye system and photosensitive compositions containing the same
JPS5994B2 (ja) * 1976-09-14 1984-01-05 富士写真フイルム株式会社 感光性組成物
US4043887A (en) * 1977-01-17 1977-08-23 Eastman Kodak Company Benzophenone initiators for the photopolymerization of unsaturated compounds
US4189323A (en) * 1977-04-25 1980-02-19 Hoechst Aktiengesellschaft Radiation-sensitive copying composition
DE2730897A1 (de) * 1977-07-08 1979-02-01 Basf Ag Photopolymerisierbare bindemittel
US4080275A (en) * 1977-07-18 1978-03-21 Stauffer Chemical Company Photopolymerizable benzoyl benzoate compositions
JPS5928328B2 (ja) * 1977-11-29 1984-07-12 富士写真フイルム株式会社 光重合性組成物
GB2029423A (en) * 1978-08-25 1980-03-19 Agfa Gevaert Nv Photo-polymerisable materials and recording method
JPS5577742A (en) * 1978-12-08 1980-06-11 Fuji Photo Film Co Ltd Photosensitive composition
CA1153369A (en) * 1979-12-28 1983-09-06 Mobil Oil Corporation Halo-alkyl substituted halogenated polynuclear ketone photoinitiators
US4329419A (en) * 1980-09-03 1982-05-11 E. I. Du Pont De Nemours And Company Polymeric heat resistant photopolymerizable composition for semiconductors and capacitors

Also Published As

Publication number Publication date
GB2132212A (en) 1984-07-04
DE3339228C2 (de) 1994-10-27
US4584260A (en) 1986-04-22
JPS5978339A (ja) 1984-05-07
GB8328774D0 (en) 1983-11-30
DE3339228A1 (de) 1984-05-03
GB2132212B (en) 1986-06-11

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