JPH0373133B2 - - Google Patents

Info

Publication number
JPH0373133B2
JPH0373133B2 JP57148817A JP14881782A JPH0373133B2 JP H0373133 B2 JPH0373133 B2 JP H0373133B2 JP 57148817 A JP57148817 A JP 57148817A JP 14881782 A JP14881782 A JP 14881782A JP H0373133 B2 JPH0373133 B2 JP H0373133B2
Authority
JP
Japan
Prior art keywords
manufacturing equipment
semiconductor manufacturing
oxygen gas
cleaning
treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57148817A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5939029A (ja
Inventor
Kiichi Kono
Hidetoshi Yada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP57148817A priority Critical patent/JPS5939029A/ja
Publication of JPS5939029A publication Critical patent/JPS5939029A/ja
Publication of JPH0373133B2 publication Critical patent/JPH0373133B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P50/00—

Landscapes

  • Drying Of Semiconductors (AREA)
JP57148817A 1982-08-27 1982-08-27 半導体製造装置の清浄化方法 Granted JPS5939029A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57148817A JPS5939029A (ja) 1982-08-27 1982-08-27 半導体製造装置の清浄化方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57148817A JPS5939029A (ja) 1982-08-27 1982-08-27 半導体製造装置の清浄化方法

Publications (2)

Publication Number Publication Date
JPS5939029A JPS5939029A (ja) 1984-03-03
JPH0373133B2 true JPH0373133B2 (cg-RX-API-DMAC10.html) 1991-11-20

Family

ID=15461375

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57148817A Granted JPS5939029A (ja) 1982-08-27 1982-08-27 半導体製造装置の清浄化方法

Country Status (1)

Country Link
JP (1) JPS5939029A (cg-RX-API-DMAC10.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0234910A (ja) * 1988-07-25 1990-02-05 Nec Kansai Ltd 化合物半導体気相成長方法
JPH02214121A (ja) * 1989-02-15 1990-08-27 Toshiba Ceramics Co Ltd 半導体用ＳｉＣ質治具等のクリーニング方法
JP2698298B2 (ja) * 1992-09-28 1998-01-19 松下電子工業株式会社 熱処理炉の炉心管のトリクロルエタンクリーニング方法

Also Published As

Publication number Publication date
JPS5939029A (ja) 1984-03-03

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