JPH0370214B2 - - Google Patents

Info

Publication number
JPH0370214B2
JPH0370214B2 JP60165293A JP16529385A JPH0370214B2 JP H0370214 B2 JPH0370214 B2 JP H0370214B2 JP 60165293 A JP60165293 A JP 60165293A JP 16529385 A JP16529385 A JP 16529385A JP H0370214 B2 JPH0370214 B2 JP H0370214B2
Authority
JP
Japan
Prior art keywords
photosensitive
printing
plate
printing plate
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60165293A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6225750A (ja
Inventor
Kunihiro Ichimura
Teruhiko Yonezawa
Hideo Kikuchi
Tetsuaki Tochisawa
Keiichi Hayashi
Hitoshi Sugiura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Toyo Gosei Co Ltd
Original Assignee
Agency of Industrial Science and Technology
Toyo Gosei Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology, Toyo Gosei Co Ltd filed Critical Agency of Industrial Science and Technology
Priority to JP16529385A priority Critical patent/JPS6225750A/ja
Publication of JPS6225750A publication Critical patent/JPS6225750A/ja
Publication of JPH0370214B2 publication Critical patent/JPH0370214B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP16529385A 1985-07-26 1985-07-26 平凹版用感光性印刷版材 Granted JPS6225750A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16529385A JPS6225750A (ja) 1985-07-26 1985-07-26 平凹版用感光性印刷版材

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16529385A JPS6225750A (ja) 1985-07-26 1985-07-26 平凹版用感光性印刷版材

Publications (2)

Publication Number Publication Date
JPS6225750A JPS6225750A (ja) 1987-02-03
JPH0370214B2 true JPH0370214B2 (da) 1991-11-06

Family

ID=15809575

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16529385A Granted JPS6225750A (ja) 1985-07-26 1985-07-26 平凹版用感光性印刷版材

Country Status (1)

Country Link
JP (1) JPS6225750A (da)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2604770B2 (ja) * 1987-12-28 1997-04-30 工業技術院長 感光性樹脂組成物
JPH0713099B2 (ja) 1988-12-14 1995-02-15 工業技術院長 感光性ポリビニルアルコール誘導体
JPH06102833B2 (ja) * 1990-04-02 1994-12-14 新日本製鐵株式会社 すべり性と密着性に優れた電磁鋼板の電気絶縁皮膜処理方法
EP1058154A1 (en) * 1999-06-04 2000-12-06 Toyo Gosei Kogyo Co., Ltd. Composition comprising photosensitive saponified poly(vinyl acetate) and pattern formation method making use of the composition

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57185035A (en) * 1981-05-11 1982-11-15 Agency Of Ind Science & Technol Photosensitive resin composition

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57185035A (en) * 1981-05-11 1982-11-15 Agency Of Ind Science & Technol Photosensitive resin composition

Also Published As

Publication number Publication date
JPS6225750A (ja) 1987-02-03

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term