JPH0368531B2 - - Google Patents

Info

Publication number
JPH0368531B2
JPH0368531B2 JP57142117A JP14211782A JPH0368531B2 JP H0368531 B2 JPH0368531 B2 JP H0368531B2 JP 57142117 A JP57142117 A JP 57142117A JP 14211782 A JP14211782 A JP 14211782A JP H0368531 B2 JPH0368531 B2 JP H0368531B2
Authority
JP
Japan
Prior art keywords
ray
mask
exposure
area
exposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57142117A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5932131A (ja
Inventor
Shoichi Tanimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku KK filed Critical Nippon Kogaku KK
Priority to JP57142117A priority Critical patent/JPS5932131A/ja
Publication of JPS5932131A publication Critical patent/JPS5932131A/ja
Publication of JPH0368531B2 publication Critical patent/JPH0368531B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP57142117A 1982-08-18 1982-08-18 Ｘ線露光転写法および転写用マスク Granted JPS5932131A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57142117A JPS5932131A (ja) 1982-08-18 1982-08-18 Ｘ線露光転写法および転写用マスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57142117A JPS5932131A (ja) 1982-08-18 1982-08-18 Ｘ線露光転写法および転写用マスク

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP61109500A Division JPS621231A (ja) 1986-05-15 1986-05-15 Ｘ線露光転写用マスク

Publications (2)

Publication Number Publication Date
JPS5932131A JPS5932131A (ja) 1984-02-21
JPH0368531B2 true JPH0368531B2 (en, 2012) 1991-10-28

Family

ID=15307797

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57142117A Granted JPS5932131A (ja) 1982-08-18 1982-08-18 Ｘ線露光転写法および転写用マスク

Country Status (1)

Country Link
JP (1) JPS5932131A (en, 2012)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60198726A (ja) * 1984-03-23 1985-10-08 Hitachi Ltd Ｘ線露光装置の露光量調整方法と装置
JPH04263416A (ja) * 1991-02-18 1992-09-18 Nippon Telegr & Teleph Corp <Ntt> Ｘ線マスク
JP2001007039A (ja) * 1999-06-18 2001-01-12 Hitachi Ltd 半導体集積回路装置の製造方法
WO2019087231A1 (ja) 2017-10-30 2019-05-09 三菱重工エンジン＆ターボチャージャ株式会社 ターボチャージャ

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5720434A (en) * 1980-07-11 1982-02-02 Mitsubishi Electric Corp X-ray exposure transferring method and transferring apparatus therefor
JPS5745235A (en) * 1980-09-02 1982-03-15 Fujitsu Ltd Exposure by x-ray

Also Published As

Publication number Publication date
JPS5932131A (ja) 1984-02-21

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