JPH0358191B2 - - Google Patents

Info

Publication number
JPH0358191B2
JPH0358191B2 JP56017926A JP1792681A JPH0358191B2 JP H0358191 B2 JPH0358191 B2 JP H0358191B2 JP 56017926 A JP56017926 A JP 56017926A JP 1792681 A JP1792681 A JP 1792681A JP H0358191 B2 JPH0358191 B2 JP H0358191B2
Authority
JP
Japan
Prior art keywords
semiconductor
layer
semi
insulating substrate
conductivity type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56017926A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57132387A (en
Inventor
Takashi Matsuoka
Haruo Nagai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP1792681A priority Critical patent/JPS57132387A/ja
Publication of JPS57132387A publication Critical patent/JPS57132387A/ja
Publication of JPH0358191B2 publication Critical patent/JPH0358191B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/04Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
    • H01S5/042Electrical excitation ; Circuits therefor
    • H01S5/0421Electrical excitation ; Circuits therefor characterised by the semiconducting contacting layers
    • H01S5/0422Electrical excitation ; Circuits therefor characterised by the semiconducting contacting layers with n- and p-contacts on the same side of the active layer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/223Buried stripe structure
    • H01S5/2238Buried stripe structure with a terraced structure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/227Buried mesa structure ; Striped active layer
    • H01S5/2275Buried mesa structure ; Striped active layer mesa created by etching

Landscapes

  • Semiconductor Lasers (AREA)
JP1792681A 1981-02-09 1981-02-09 Semiconductor laser device Granted JPS57132387A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1792681A JPS57132387A (en) 1981-02-09 1981-02-09 Semiconductor laser device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1792681A JPS57132387A (en) 1981-02-09 1981-02-09 Semiconductor laser device

Publications (2)

Publication Number Publication Date
JPS57132387A JPS57132387A (en) 1982-08-16
JPH0358191B2 true JPH0358191B2 (ko) 1991-09-04

Family

ID=11957368

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1792681A Granted JPS57132387A (en) 1981-02-09 1981-02-09 Semiconductor laser device

Country Status (1)

Country Link
JP (1) JPS57132387A (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57198689A (en) * 1981-05-30 1982-12-06 Matsushita Electric Ind Co Ltd Semiconductor device
DE3728568A1 (de) * 1987-08-27 1989-03-16 Telefunken Electronic Gmbh Halbleiterlaseranordnung
DE102016125430A1 (de) * 2016-12-22 2018-06-28 Osram Opto Semiconductors Gmbh Oberflächenmontierbarer Halbleiterlaser, Anordnung mit einem solchen Halbleiterlaser und Betriebsverfahren hierfür

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51138394A (en) * 1975-05-26 1976-11-29 Fujitsu Ltd Semiconductor device
JPS51138393A (en) * 1975-05-26 1976-11-29 Fujitsu Ltd Semiconductor light emission device
JPS55117295A (en) * 1979-03-02 1980-09-09 Hitachi Ltd Semiconductor light emitting element and fabricating the same

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55126680U (ko) * 1979-03-05 1980-09-08

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51138394A (en) * 1975-05-26 1976-11-29 Fujitsu Ltd Semiconductor device
JPS51138393A (en) * 1975-05-26 1976-11-29 Fujitsu Ltd Semiconductor light emission device
JPS55117295A (en) * 1979-03-02 1980-09-09 Hitachi Ltd Semiconductor light emitting element and fabricating the same

Also Published As

Publication number Publication date
JPS57132387A (en) 1982-08-16

Similar Documents

Publication Publication Date Title
JP3242963B2 (ja) レーザダイオード・導波路モノリシック集積デバイス
JP2928535B2 (ja) 集積された多量子井戸光子及び電子デバイス
JPS58501567A (ja) 導電性電流マスクを有する半導体レ−ザ−
JPH05167191A (ja) 埋め込み型半導体レーザ素子
US4280108A (en) Transverse junction array laser
US5781577A (en) Semiconductor laser
JPH0358191B2 (ko)
US5003358A (en) Semiconductor light emitting device disposed in an insulating substrate
US5275968A (en) Method of producing a semiconductor light emitting device disposed in an insulating substrate
US5194399A (en) Method of producing a semiconductor light emitting device disposed in an insulating substrate
JPH05160506A (ja) 半導体レーザおよびその製造方法
JPS6126278A (ja) 光電子集積回路
JPS60123083A (ja) 半導体装置
JPH05226774A (ja) 半導体レーザ素子とその製造方法
JPS627186A (ja) 半導体レ−ザ装置
JPH0766993B2 (ja) 半導体光増幅素子
JPH0213943B2 (ko)
JPH06326399A (ja) 半導体レーザ素子およびその製造方法
JPH07297497A (ja) 半導体レ−ザ装置及びその製造方法
JPH0783157B2 (ja) 半導体レ−ザ
JPH10209568A (ja) 半導体光デバイスの製造方法
KR970054999A (ko) 레이저 다이오드의 제조방법
JPH03142985A (ja) 光半導体装置
JPH02253683A (ja) AlGaAsレーザ
JPH02151092A (ja) 集積型半導体レーザ装置