JPH0356626B2 - - Google Patents

Info

Publication number
JPH0356626B2
JPH0356626B2 JP6921985A JP6921985A JPH0356626B2 JP H0356626 B2 JPH0356626 B2 JP H0356626B2 JP 6921985 A JP6921985 A JP 6921985A JP 6921985 A JP6921985 A JP 6921985A JP H0356626 B2 JPH0356626 B2 JP H0356626B2
Authority
JP
Japan
Prior art keywords
silicone rubber
parts
rubber layer
printing
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP6921985A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61230151A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6921985A priority Critical patent/JPS61230151A/ja
Publication of JPS61230151A publication Critical patent/JPS61230151A/ja
Publication of JPH0356626B2 publication Critical patent/JPH0356626B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/075Silicon-containing compounds
    • G03F7/0752Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP6921985A 1985-04-03 1985-04-03 水なし平版印刷用原板 Granted JPS61230151A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6921985A JPS61230151A (ja) 1985-04-03 1985-04-03 水なし平版印刷用原板

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6921985A JPS61230151A (ja) 1985-04-03 1985-04-03 水なし平版印刷用原板

Publications (2)

Publication Number Publication Date
JPS61230151A JPS61230151A (ja) 1986-10-14
JPH0356626B2 true JPH0356626B2 (enrdf_load_html_response) 1991-08-28

Family

ID=13396388

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6921985A Granted JPS61230151A (ja) 1985-04-03 1985-04-03 水なし平版印刷用原板

Country Status (1)

Country Link
JP (1) JPS61230151A (enrdf_load_html_response)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0980746A (ja) * 1995-09-14 1997-03-28 Fuji Photo Film Co Ltd 湿し水不要平版印刷版
JP6930145B2 (ja) * 2016-03-15 2021-09-01 東レ株式会社 印刷版用シリコーン組成物、並びに平版印刷版原版、平版印刷版および印刷物の製造方法

Also Published As

Publication number Publication date
JPS61230151A (ja) 1986-10-14

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term