JPH035645B2 - - Google Patents
Info
- Publication number
- JPH035645B2 JPH035645B2 JP17148583A JP17148583A JPH035645B2 JP H035645 B2 JPH035645 B2 JP H035645B2 JP 17148583 A JP17148583 A JP 17148583A JP 17148583 A JP17148583 A JP 17148583A JP H035645 B2 JPH035645 B2 JP H035645B2
- Authority
- JP
- Japan
- Prior art keywords
- aluminum
- film
- iron
- silicon
- alloy film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 37
- 229910045601 alloy Inorganic materials 0.000 claims description 30
- 239000000956 alloy Substances 0.000 claims description 30
- 229910052782 aluminium Inorganic materials 0.000 claims description 29
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 28
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 24
- 229910052710 silicon Inorganic materials 0.000 claims description 24
- 239000010703 silicon Substances 0.000 claims description 24
- 229910052742 iron Inorganic materials 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 18
- 230000035699 permeability Effects 0.000 claims description 15
- 238000007740 vapor deposition Methods 0.000 claims description 14
- 238000004519 manufacturing process Methods 0.000 claims description 13
- 239000000203 mixture Substances 0.000 claims description 9
- 238000010894 electron beam technology Methods 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 5
- 229910000676 Si alloy Inorganic materials 0.000 description 24
- -1 Iron-aluminum-silicon Chemical compound 0.000 description 23
- 239000000758 substrate Substances 0.000 description 11
- 238000000151 deposition Methods 0.000 description 10
- 230000008021 deposition Effects 0.000 description 7
- 238000005566 electron beam evaporation Methods 0.000 description 5
- 230000007423 decrease Effects 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 229910000640 Fe alloy Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000013590 bulk material Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000005019 vapor deposition process Methods 0.000 description 2
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910001004 magnetic alloy Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000006089 photosensitive glass Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000010301 surface-oxidation reaction Methods 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
- Thin Magnetic Films (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17148583A JPS6062105A (ja) | 1983-09-16 | 1983-09-16 | 高透磁率合金膜の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17148583A JPS6062105A (ja) | 1983-09-16 | 1983-09-16 | 高透磁率合金膜の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6062105A JPS6062105A (ja) | 1985-04-10 |
| JPH035645B2 true JPH035645B2 (enrdf_load_stackoverflow) | 1991-01-28 |
Family
ID=15923972
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17148583A Granted JPS6062105A (ja) | 1983-09-16 | 1983-09-16 | 高透磁率合金膜の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6062105A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2878654B2 (ja) * | 1996-09-13 | 1999-04-05 | 理化学研究所 | 感光性樹脂組成物 |
-
1983
- 1983-09-16 JP JP17148583A patent/JPS6062105A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6062105A (ja) | 1985-04-10 |
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