JPH0353774B2 - - Google Patents
Info
- Publication number
- JPH0353774B2 JPH0353774B2 JP56190354A JP19035481A JPH0353774B2 JP H0353774 B2 JPH0353774 B2 JP H0353774B2 JP 56190354 A JP56190354 A JP 56190354A JP 19035481 A JP19035481 A JP 19035481A JP H0353774 B2 JPH0353774 B2 JP H0353774B2
- Authority
- JP
- Japan
- Prior art keywords
- gate
- forming
- pattern
- gate pattern
- insulating film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
Landscapes
- Junction Field-Effect Transistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56190354A JPS5892265A (ja) | 1981-11-27 | 1981-11-27 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56190354A JPS5892265A (ja) | 1981-11-27 | 1981-11-27 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5892265A JPS5892265A (ja) | 1983-06-01 |
| JPH0353774B2 true JPH0353774B2 (OSRAM) | 1991-08-16 |
Family
ID=16256790
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56190354A Granted JPS5892265A (ja) | 1981-11-27 | 1981-11-27 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5892265A (OSRAM) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0713976B2 (ja) * | 1984-04-05 | 1995-02-15 | 日本電信電話株式会社 | 電界効果トランジスタの製法 |
| US4792531A (en) * | 1987-10-05 | 1988-12-20 | Menlo Industries, Inc. | Self-aligned gate process |
| JPH088266B2 (ja) * | 1989-01-20 | 1996-01-29 | 住友電気工業株式会社 | 電界効果トランジスタの製造方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5860574A (ja) * | 1981-10-06 | 1983-04-11 | Nippon Telegr & Teleph Corp <Ntt> | 電界効果トランジスタの製造方法 |
-
1981
- 1981-11-27 JP JP56190354A patent/JPS5892265A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5892265A (ja) | 1983-06-01 |
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