JPH0351787B2 - - Google Patents

Info

Publication number
JPH0351787B2
JPH0351787B2 JP58171217A JP17121783A JPH0351787B2 JP H0351787 B2 JPH0351787 B2 JP H0351787B2 JP 58171217 A JP58171217 A JP 58171217A JP 17121783 A JP17121783 A JP 17121783A JP H0351787 B2 JPH0351787 B2 JP H0351787B2
Authority
JP
Japan
Prior art keywords
boron
substrate
ions
ion
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58171217A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6063372A (ja
Inventor
Mamoru Sato
Takeshi Sadahiro
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Tungaloy Corp
Original Assignee
Agency of Industrial Science and Technology
Toshiba Tungaloy Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology, Toshiba Tungaloy Co Ltd filed Critical Agency of Industrial Science and Technology
Priority to JP58171217A priority Critical patent/JPS6063372A/ja
Publication of JPS6063372A publication Critical patent/JPS6063372A/ja
Publication of JPH0351787B2 publication Critical patent/JPH0351787B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
JP58171217A 1983-09-19 1983-09-19 高硬度窒化ホウ素薄膜の製造方法 Granted JPS6063372A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58171217A JPS6063372A (ja) 1983-09-19 1983-09-19 高硬度窒化ホウ素薄膜の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58171217A JPS6063372A (ja) 1983-09-19 1983-09-19 高硬度窒化ホウ素薄膜の製造方法

Publications (2)

Publication Number Publication Date
JPS6063372A JPS6063372A (ja) 1985-04-11
JPH0351787B2 true JPH0351787B2 (enrdf_load_stackoverflow) 1991-08-07

Family

ID=15919206

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58171217A Granted JPS6063372A (ja) 1983-09-19 1983-09-19 高硬度窒化ホウ素薄膜の製造方法

Country Status (1)

Country Link
JP (1) JPS6063372A (enrdf_load_stackoverflow)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60152677A (ja) * 1984-01-20 1985-08-10 Sumitomo Electric Ind Ltd 立方晶窒化硼素被覆硬質体の製造方法
JPS61157674A (ja) * 1984-12-29 1986-07-17 Agency Of Ind Science & Technol 高硬度窒化ホウ素膜の製造方法
JP2603919B2 (ja) * 1985-10-18 1997-04-23 日新電機株式会社 立方晶系窒化ホウ素の結晶粒を含む窒化ホウ素膜の作製方法
JP2593441B2 (ja) * 1986-01-16 1997-03-26 日新電機株式会社 高硬度膜被覆工具材料とその製造方法
JPH0742571B2 (ja) * 1986-07-11 1995-05-10 三菱重工業株式会社 Ｃｂｎ被覆法
JPH0819523B2 (ja) * 1986-11-22 1996-02-28 住友電気工業株式会社 高硬度窒化硼素の合成法
JPH01225767A (ja) * 1988-03-07 1989-09-08 Nissin Electric Co Ltd 窒化ケイ素膜の製造方法
JPH0685962B2 (ja) * 1988-12-07 1994-11-02 工業技術院長 鍛造用金型及びその製法
JPH02159362A (ja) * 1988-12-13 1990-06-19 Mitsubishi Heavy Ind Ltd 薄膜製造方法および装置
JP2761026B2 (ja) * 1989-03-31 1998-06-04 三菱重工業株式会社 窒化ホウ素膜の製造方法
EP0429993B1 (en) * 1989-11-17 1995-08-02 Nissin Electric Company, Limited Method of forming thin film containing boron nitride, magnetic head and method of preparing said magnetic head
JP2611521B2 (ja) * 1990-09-12 1997-05-21 日新電機株式会社 窒化ホウ素薄膜の形成方法
JP2611522B2 (ja) * 1990-09-12 1997-05-21 日新電機株式会社 窒化ホウ素薄膜の形成方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5282699A (en) * 1975-12-29 1977-07-11 Youichi Murayama Hard boronnitride c0ating

Also Published As

Publication number Publication date
JPS6063372A (ja) 1985-04-11

Similar Documents

Publication Publication Date Title
US4657774A (en) Method for thin film formation
US5306530A (en) Method for producing high quality thin layer films on substrates
US4656052A (en) Process for production of high-hardness boron nitride film
Haberland et al. Energetic cluster impact (ECI): A new method for thin-film formation.
JPS60195094A (ja) ダイヤモンド薄膜の製造方法
JPH0751752B2 (ja) プラズマ付勢マグネトロンスパッター蒸着方法および装置
JPH0351787B2 (enrdf_load_stackoverflow)
US5650201A (en) Method for producing carbon nitride films
JPH0259862B2 (enrdf_load_stackoverflow)
Amano Direct ion beam deposition for thin film formation
JPS6134173A (ja) 高硬度窒化ホウ素膜の製造方法
JPH0259863B2 (enrdf_load_stackoverflow)
JPS62161952A (ja) 立方晶窒化硼素薄膜の形成方法
JPS6326349A (ja) 立方晶窒化硼素被膜の形成方法
JP2611521B2 (ja) 窒化ホウ素薄膜の形成方法
JPH0515788B2 (enrdf_load_stackoverflow)
JPS5920465A (ja) 超硬質工具及びその製造方法
JPS61227163A (ja) 高硬度窒化ホウ素膜の製法
JP2603919B2 (ja) 立方晶系窒化ホウ素の結晶粒を含む窒化ホウ素膜の作製方法
JPH0397847A (ja) 窒化ホウ素膜の形成方法
JP2504255B2 (ja) 窒化ホウ素薄膜の形成方法
JPH0663087B2 (ja) 窒化チタン膜の形成方法
JP2611522B2 (ja) 窒化ホウ素薄膜の形成方法
JP2600092B2 (ja) 金属系材料の表面改質方法
JPS60197305A (ja) ダイヤモンドコ−ト付刃具