JPH035080Y2 - - Google Patents

Info

Publication number
JPH035080Y2
JPH035080Y2 JP1982185079U JP18507982U JPH035080Y2 JP H035080 Y2 JPH035080 Y2 JP H035080Y2 JP 1982185079 U JP1982185079 U JP 1982185079U JP 18507982 U JP18507982 U JP 18507982U JP H035080 Y2 JPH035080 Y2 JP H035080Y2
Authority
JP
Japan
Prior art keywords
charged beam
charged
detection element
hole
scattered
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1982185079U
Other languages
English (en)
Japanese (ja)
Other versions
JPS5988857U (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP18507982U priority Critical patent/JPS5988857U/ja
Publication of JPS5988857U publication Critical patent/JPS5988857U/ja
Application granted granted Critical
Publication of JPH035080Y2 publication Critical patent/JPH035080Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)
JP18507982U 1982-12-07 1982-12-07 荷電ビ−ム測定装置 Granted JPS5988857U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18507982U JPS5988857U (ja) 1982-12-07 1982-12-07 荷電ビ−ム測定装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18507982U JPS5988857U (ja) 1982-12-07 1982-12-07 荷電ビ−ム測定装置

Publications (2)

Publication Number Publication Date
JPS5988857U JPS5988857U (ja) 1984-06-15
JPH035080Y2 true JPH035080Y2 (cs) 1991-02-08

Family

ID=30400124

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18507982U Granted JPS5988857U (ja) 1982-12-07 1982-12-07 荷電ビ−ム測定装置

Country Status (1)

Country Link
JP (1) JPS5988857U (cs)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2008174C2 (en) * 2012-01-24 2013-08-21 Mapper Lithography Ip Bv Device for spot size measurement at wafer level using a knife edge and a method for manufacturing such a device.

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5780730A (en) * 1980-11-07 1982-05-20 Hitachi Ltd Semiconductor observing device

Also Published As

Publication number Publication date
JPS5988857U (ja) 1984-06-15

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