JPH0348500B2 - - Google Patents

Info

Publication number
JPH0348500B2
JPH0348500B2 JP55085277A JP8527780A JPH0348500B2 JP H0348500 B2 JPH0348500 B2 JP H0348500B2 JP 55085277 A JP55085277 A JP 55085277A JP 8527780 A JP8527780 A JP 8527780A JP H0348500 B2 JPH0348500 B2 JP H0348500B2
Authority
JP
Japan
Prior art keywords
layer
substrate
substance
diacetylene
photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP55085277A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5642229A (en
Inventor
Furanku Gyarito Ansonii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University Patents Inc
Original Assignee
University Patents Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University Patents Inc filed Critical University Patents Inc
Publication of JPS5642229A publication Critical patent/JPS5642229A/ja
Publication of JPH0348500B2 publication Critical patent/JPH0348500B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP8527780A 1979-06-25 1980-06-25 New photooresist composition Granted JPS5642229A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US5200779A 1979-06-25 1979-06-25

Publications (2)

Publication Number Publication Date
JPS5642229A JPS5642229A (en) 1981-04-20
JPH0348500B2 true JPH0348500B2 (show.php) 1991-07-24

Family

ID=21974808

Family Applications (2)

Application Number Title Priority Date Filing Date
JP8527780A Granted JPS5642229A (en) 1979-06-25 1980-06-25 New photooresist composition
JP8527880A Pending JPS5643220A (en) 1979-06-25 1980-06-25 Method of using novel nonlinear optical substance and diacetylenes

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP8527880A Pending JPS5643220A (en) 1979-06-25 1980-06-25 Method of using novel nonlinear optical substance and diacetylenes

Country Status (1)

Country Link
JP (2) JPS5642229A (show.php)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5962608A (ja) * 1982-10-02 1984-04-10 Agency Of Ind Science & Technol 薄膜状ポリジアセチレンの製造方法
FR2553531B1 (fr) * 1983-10-14 1995-12-29 Canon Kk Monomere photopolymerisable pour milieu d'enregistrement optique et milieu le contenant
JPH0610734B2 (ja) * 1984-05-15 1994-02-09 キヤノン株式会社 表示媒体
JPS6194041A (ja) * 1984-10-16 1986-05-12 Matsushita Electric Ind Co Ltd パタ−ン形成方法
JPS6194042A (ja) * 1984-10-16 1986-05-12 Matsushita Electric Ind Co Ltd 分子構築体およびその製造方法
JPS61148432A (ja) * 1984-12-21 1986-07-07 Agency Of Ind Science & Technol 光処理方法
JPS61180437A (ja) * 1985-02-05 1986-08-13 Matsushita Electric Ind Co Ltd パタ−ン形成方法
JPS61203448A (ja) * 1985-03-05 1986-09-09 Mitsubishi Petrochem Co Ltd 光記録媒体
JPS622175A (ja) * 1985-06-28 1987-01-08 Nippon Telegr & Teleph Corp <Ntt> ケ−ブル試験器
JPS6221151A (ja) * 1985-07-19 1987-01-29 Matsushita Electric Ind Co Ltd パタ−ン形成方法
JPH0675194B2 (ja) * 1986-03-31 1994-09-21 キヤノン株式会社 重合性薄膜
JPH0727215B2 (ja) * 1986-05-09 1995-03-29 松下電器産業株式会社 単分子累積膜パタ−ン形成方法
JPS6396655A (ja) * 1986-10-14 1988-04-27 Matsushita Electric Ind Co Ltd パタ−ン形成方法
JPS62293242A (ja) * 1986-06-12 1987-12-19 Matsushita Electric Ind Co Ltd パターン形成方法およびパターン形成材料
JPH0766189B2 (ja) * 1986-09-26 1995-07-19 住友化学工業株式会社 レジスト材料
JPH0670697B2 (ja) * 1989-09-11 1994-09-07 理化学研究所 有機非線形光学材料
JP2787234B2 (ja) * 1989-09-14 1998-08-13 株式会社日立製作所 電源装置及び加速器
JP3019506B2 (ja) * 1991-08-13 2000-03-13 東レ株式会社 二層構造感放射線性レジストおよびその製造方法
DE60213265T2 (de) 2001-08-27 2007-06-14 Japan Science And Technology Agency, Kawaguchi Photoreaktives polymer, diacetylen-aufbaupolymer, ammoniumcarboxylatkristalle und verfahren zu deren herstellung
JP4590611B2 (ja) * 2004-08-30 2010-12-01 独立行政法人産業技術総合研究所 ジアセチレンジアミド化合物
GB0801440D0 (en) * 2008-01-25 2008-03-05 Datalase Ltd Polychromic substances and their use
JP7238698B2 (ja) * 2019-08-28 2023-03-14 セイコーエプソン株式会社 量子干渉装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1525738A (fr) * 1966-06-06 1968-05-17 Battelle Development Corp élément photosensible et procédé de formation d'image au moyen de cet élément
DE1940690A1 (de) * 1969-08-09 1971-02-25 Basf Ag Verfahren zur Herstellung von bildmaessigen Aufzeichnungen
US4125534A (en) * 1977-02-25 1978-11-14 Allied Chemical Corporation Carbazolyl diacetylenic compounds

Also Published As

Publication number Publication date
JPS5642229A (en) 1981-04-20
JPS5643220A (en) 1981-04-21

Similar Documents

Publication Publication Date Title
JPH0348500B2 (show.php)
US4439514A (en) Photoresistive compositions
US4581315A (en) Photoresistive compositions
EP0021695B1 (en) Novel nonlinear optical materials and processes employing diacetylenes
US4536450A (en) Nonlinear optical materials and processes employing diacetylenes
US4883740A (en) Radiation-sensitive mixture for photosensitive coating materials
CN101522613B (zh) 锍盐光引发剂
KR950008287B1 (ko) 티타노센 및 그의 용도
BE1010726A5 (fr) Sulfonates d&#39;oximes et leur utilisation comme acides sulfoniques latents.
US5310581A (en) Photocurable compositions
JPH0548270B2 (show.php)
JP2818968B2 (ja) 新規窒素含有チタノセン、及びその使用方法
CA1158598A (en) Photoresistive compositions
JPH10500169A (ja) ビニルベンジルチミン単量体およびそれから造られた重合体および製品
DE69024661T2 (de) Anionisch polymerisierbare monomere, daraus hergestellte polymere und die verwendung der polymere in photowiderständen
Aoki et al. Micrometer-scale patterning of multiple dyes on hyperbranched polymer thin films using photoacid-based lithography
JPH0136609B2 (show.php)
US5464538A (en) Reverse osmosis membrane
Guo et al. Preparation of poly (n-alkylmethacrylamide) Langmuir− Blodgett films for the application to a novel dry-developed positive deep UV resist
US4965316A (en) Radiation sensitive polymers and use thereof
EP0236261A2 (de) Neue organometallhaltige Polymere
JPH07281426A (ja) 屈折率変調画像形成用感光性樹脂組成物
US5998089A (en) Photosensitive resin composition comprising fullerene
JPS61167941A (ja) 高感度ポリアミドエステルホトレジスト組成物
JPS5825683B2 (ja) コウカキヨウセイジユウゴウタイノ セイゾウホウホウ