JPH0346543B2 - - Google Patents
Info
- Publication number
- JPH0346543B2 JPH0346543B2 JP58208507A JP20850783A JPH0346543B2 JP H0346543 B2 JPH0346543 B2 JP H0346543B2 JP 58208507 A JP58208507 A JP 58208507A JP 20850783 A JP20850783 A JP 20850783A JP H0346543 B2 JPH0346543 B2 JP H0346543B2
- Authority
- JP
- Japan
- Prior art keywords
- hydrogen
- hydrogen storage
- alloy
- amorphous
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 77
- 239000001257 hydrogen Substances 0.000 claims description 72
- 229910052739 hydrogen Inorganic materials 0.000 claims description 72
- 239000011232 storage material Substances 0.000 claims description 20
- 239000010409 thin film Substances 0.000 claims description 19
- 239000000463 material Substances 0.000 claims description 9
- 239000007769 metal material Substances 0.000 claims description 5
- 239000005300 metallic glass Substances 0.000 claims description 4
- 239000012466 permeate Substances 0.000 claims description 4
- 229910000914 Mn alloy Inorganic materials 0.000 claims 1
- 229910045601 alloy Inorganic materials 0.000 description 17
- 239000000956 alloy Substances 0.000 description 17
- 229910052751 metal Inorganic materials 0.000 description 14
- 239000002184 metal Substances 0.000 description 14
- 230000000694 effects Effects 0.000 description 11
- 239000012535 impurity Substances 0.000 description 11
- 238000010586 diagram Methods 0.000 description 9
- 239000007789 gas Substances 0.000 description 9
- 230000006866 deterioration Effects 0.000 description 8
- 239000002245 particle Substances 0.000 description 8
- 229910001316 Ag alloy Inorganic materials 0.000 description 7
- 239000010408 film Substances 0.000 description 7
- 150000002739 metals Chemical class 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 150000002431 hydrogen Chemical class 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- 229910010389 TiMn Inorganic materials 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 238000005192 partition Methods 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 239000011800 void material Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910001252 Pd alloy Inorganic materials 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000002178 crystalline material Substances 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000003795 desorption Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000005984 hydrogenation reaction Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- YZCKVEUIGOORGS-NJFSPNSNSA-N Tritium Chemical compound [3H] YZCKVEUIGOORGS-NJFSPNSNSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/30—Hydrogen technology
- Y02E60/32—Hydrogen storage
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Hydrogen, Water And Hydrids (AREA)
- Powder Metallurgy (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58208507A JPS60100664A (ja) | 1983-11-07 | 1983-11-07 | 水素貯蔵用材料 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58208507A JPS60100664A (ja) | 1983-11-07 | 1983-11-07 | 水素貯蔵用材料 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60100664A JPS60100664A (ja) | 1985-06-04 |
| JPH0346543B2 true JPH0346543B2 (enrdf_load_html_response) | 1991-07-16 |
Family
ID=16557298
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58208507A Granted JPS60100664A (ja) | 1983-11-07 | 1983-11-07 | 水素貯蔵用材料 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60100664A (enrdf_load_html_response) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20210001191U (ko) * | 2019-11-21 | 2021-05-31 | 둥관 유나이티드 크리에이션 옵티컬 컴퍼니 리미티드 | 안경 프레임 |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6227301A (ja) * | 1985-07-26 | 1987-02-05 | Nippon Yakin Kogyo Co Ltd | 水素吸蔵合金 |
| JPH0687415B2 (ja) * | 1987-01-16 | 1994-11-02 | 三洋電機株式会社 | 水素吸蔵電極 |
| JPS6486448A (en) * | 1987-08-20 | 1989-03-31 | Sanyo Electric Co | Hydrogen absorption electrode |
| JPH01129960A (ja) * | 1987-11-16 | 1989-05-23 | Sanyo Electric Co Ltd | 水素吸蔵合金薄膜の製造方法 |
| JP3383692B2 (ja) * | 1993-02-22 | 2003-03-04 | マツダ株式会社 | 複合水素吸蔵金属部材及びその製造方法 |
| JP4753259B2 (ja) * | 2007-02-22 | 2011-08-24 | 株式会社日本製鋼所 | 圧力容器の製造方法 |
| JP5365130B2 (ja) | 2007-12-11 | 2013-12-11 | 日産自動車株式会社 | 水素貯蔵材料、水素貯蔵材料の製造方法、水素供給システム、燃料電池、内燃機関及び車両 |
| KR101867732B1 (ko) * | 2016-12-22 | 2018-06-14 | 주식회사 포스코 | 다층구조의 도금강판 및 그 제조방법 |
-
1983
- 1983-11-07 JP JP58208507A patent/JPS60100664A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20210001191U (ko) * | 2019-11-21 | 2021-05-31 | 둥관 유나이티드 크리에이션 옵티컬 컴퍼니 리미티드 | 안경 프레임 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60100664A (ja) | 1985-06-04 |
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