JPH0341820B2 - - Google Patents

Info

Publication number
JPH0341820B2
JPH0341820B2 JP14027183A JP14027183A JPH0341820B2 JP H0341820 B2 JPH0341820 B2 JP H0341820B2 JP 14027183 A JP14027183 A JP 14027183A JP 14027183 A JP14027183 A JP 14027183A JP H0341820 B2 JPH0341820 B2 JP H0341820B2
Authority
JP
Japan
Prior art keywords
resin
present
compound
photosensitive
sulfonic acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP14027183A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6031138A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP14027183A priority Critical patent/JPS6031138A/ja
Publication of JPS6031138A publication Critical patent/JPS6031138A/ja
Publication of JPH0341820B2 publication Critical patent/JPH0341820B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP14027183A 1983-07-30 1983-07-30 感光性組成物 Granted JPS6031138A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14027183A JPS6031138A (ja) 1983-07-30 1983-07-30 感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14027183A JPS6031138A (ja) 1983-07-30 1983-07-30 感光性組成物

Publications (2)

Publication Number Publication Date
JPS6031138A JPS6031138A (ja) 1985-02-16
JPH0341820B2 true JPH0341820B2 (en, 2012) 1991-06-25

Family

ID=15264888

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14027183A Granted JPS6031138A (ja) 1983-07-30 1983-07-30 感光性組成物

Country Status (1)

Country Link
JP (1) JPS6031138A (en, 2012)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62161146A (ja) * 1986-01-10 1987-07-17 Mitsubishi Petrochem Co Ltd ホトレジスト組成物
JPH0656487B2 (ja) * 1986-05-02 1994-07-27 東京応化工業株式会社 ポジ型ホトレジスト用組成物
JPH0654387B2 (ja) * 1986-05-02 1994-07-20 東京応化工業株式会社 ポジ型ホトレジスト組成物
JPH0654388B2 (ja) * 1986-05-02 1994-07-20 東京応化工業株式会社 ポジ型ホトレジスト組成物
JPH0293651A (ja) * 1988-09-30 1990-04-04 Fuji Photo Film Co Ltd ポジ形フオトレジスト組成物
JPH0296164A (ja) * 1988-10-03 1990-04-06 Konica Corp 感光性組成物
DE69032744T2 (de) * 1989-09-08 1999-06-02 Olin Microelectronic Chemicals, Inc., Norwalk, Conn. Vollständig substituierte novalak-polymere enthaltende strahlungsempfindliche zusammensetzungen

Also Published As

Publication number Publication date
JPS6031138A (ja) 1985-02-16

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