JPH0332783B2 - - Google Patents

Info

Publication number
JPH0332783B2
JPH0332783B2 JP58015913A JP1591383A JPH0332783B2 JP H0332783 B2 JPH0332783 B2 JP H0332783B2 JP 58015913 A JP58015913 A JP 58015913A JP 1591383 A JP1591383 A JP 1591383A JP H0332783 B2 JPH0332783 B2 JP H0332783B2
Authority
JP
Japan
Prior art keywords
fluorine
hydrogen
developer
pattern
carboxylic acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58015913A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59142547A (ja
Inventor
Masami Kakuchi
Hiroshi Asakawa
Osamu Kogure
Tsuneo Fujii
Takayuki Deguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daikin Industries Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Daikin Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp, Daikin Kogyo Co Ltd filed Critical Nippon Telegraph and Telephone Corp
Priority to JP1591383A priority Critical patent/JPS59142547A/ja
Publication of JPS59142547A publication Critical patent/JPS59142547A/ja
Publication of JPH0332783B2 publication Critical patent/JPH0332783B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP1591383A 1983-02-02 1983-02-02 溶解速度差現像液の像鮮明性増大剤 Granted JPS59142547A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1591383A JPS59142547A (ja) 1983-02-02 1983-02-02 溶解速度差現像液の像鮮明性増大剤

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1591383A JPS59142547A (ja) 1983-02-02 1983-02-02 溶解速度差現像液の像鮮明性増大剤

Publications (2)

Publication Number Publication Date
JPS59142547A JPS59142547A (ja) 1984-08-15
JPH0332783B2 true JPH0332783B2 (cs) 1991-05-14

Family

ID=11902015

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1591383A Granted JPS59142547A (ja) 1983-02-02 1983-02-02 溶解速度差現像液の像鮮明性増大剤

Country Status (1)

Country Link
JP (1) JPS59142547A (cs)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6211852A (ja) * 1985-07-10 1987-01-20 Nippon Telegr & Teleph Corp <Ntt> パタ−ン形成方法
JPH0685070B2 (ja) * 1985-02-04 1994-10-26 三菱電機株式会社 レジストパターンの現像方法
KR100573560B1 (ko) 1997-10-30 2006-08-30 가오가부시끼가이샤 레지스트용현상액
TWI221946B (en) 1999-01-07 2004-10-11 Kao Corp Resist developer
JP5837812B2 (ja) * 2010-12-27 2015-12-24 Hoya株式会社 レジスト現像剤、レジストパターンの形成方法及びモールドの製造方法
JP5837811B2 (ja) * 2010-12-27 2015-12-24 Hoya株式会社 レジスト現像剤、レジストパターンの形成方法及びモールドの製造方法
JP6027779B2 (ja) * 2012-06-11 2016-11-16 メルクパフォーマンスマテリアルズマニュファクチャリング合同会社 リソグラフィー用現像またはリンス液およびそれを用いたパターン形成方法
JP2014219487A (ja) * 2013-05-02 2014-11-20 富士フイルム株式会社 パターン形成方法、電子デバイス及びその製造方法、現像液
KR102863608B1 (ko) * 2022-07-05 2025-09-22 삼성에스디아이 주식회사 금속 함유 포토레지스트 현상액 조성물, 및 이를 이용한 현상 단계를 포함하는 패턴 형성 방법
US20240393684A1 (en) * 2023-05-23 2024-11-28 Samsung Sdi Co., Ltd. Method of forming patterns
KR20250020976A (ko) * 2023-08-04 2025-02-11 삼성에스디아이 주식회사 금속 함유 레지스트의 에지 비드 제거용 조성물 또는 금속 함유 레지스트의 현상액 조성물, 및 이를 이용한 패턴 형성 방법

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5460002A (en) * 1977-10-19 1979-05-15 Fuji Photo Film Co Ltd Developer for photosensitive lithographi printing plate
JPS54135004A (en) * 1978-04-10 1979-10-19 Fuji Photo Film Co Ltd Photosensitive flat printing plate
JPS5552054A (en) * 1978-10-11 1980-04-16 Konishiroku Photo Ind Co Ltd Developing solution composition
JPS55100548A (en) * 1979-01-26 1980-07-31 Japan Synthetic Rubber Co Ltd Developer
DE3140186A1 (de) * 1981-10-09 1983-04-28 Hoechst Ag, 6230 Frankfurt Entwickler und verfahren zum entwickeln fuer belichtete negativ-arbeitende reproduktionsschichten
JPS58137836A (ja) * 1982-02-10 1983-08-16 Toshiba Corp ゴム系レジストの処理剤

Also Published As

Publication number Publication date
JPS59142547A (ja) 1984-08-15

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