JPH0327895B2 - - Google Patents
Info
- Publication number
- JPH0327895B2 JPH0327895B2 JP59237202A JP23720284A JPH0327895B2 JP H0327895 B2 JPH0327895 B2 JP H0327895B2 JP 59237202 A JP59237202 A JP 59237202A JP 23720284 A JP23720284 A JP 23720284A JP H0327895 B2 JPH0327895 B2 JP H0327895B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- base
- pattern
- printing plate
- transparent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59237202A JPS61172148A (ja) | 1984-11-10 | 1984-11-10 | 樹脂刷版の製版方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59237202A JPS61172148A (ja) | 1984-11-10 | 1984-11-10 | 樹脂刷版の製版方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61172148A JPS61172148A (ja) | 1986-08-02 |
| JPH0327895B2 true JPH0327895B2 (cs) | 1991-04-17 |
Family
ID=17011887
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59237202A Granted JPS61172148A (ja) | 1984-11-10 | 1984-11-10 | 樹脂刷版の製版方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61172148A (cs) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2515521B2 (ja) * | 1986-11-12 | 1996-07-10 | 旭化成工業株式会社 | 改良されたマスキング露光方法及びそれを用いた製版方法 |
| EP0402789A3 (en) * | 1989-06-10 | 1991-09-18 | Nitto Denko Corporation | Process for producing display element, pattern sheet therefor, and process for producing pattern sheet |
| FR2735717B1 (fr) * | 1995-06-22 | 1997-08-08 | Photomeca Egg | Procede de fabrication de plaques photopolymeres par double irradiation par le dessous |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5248844B2 (cs) * | 1972-05-02 | 1977-12-13 | ||
| JPS5054404A (cs) * | 1973-09-17 | 1975-05-14 | ||
| JPS59154611A (ja) * | 1983-02-22 | 1984-09-03 | Fujitsu Ltd | デ−タ読取装置 |
-
1984
- 1984-11-10 JP JP59237202A patent/JPS61172148A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61172148A (ja) | 1986-08-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |