JPH03239312A - Magnetic alloy - Google Patents
Magnetic alloyInfo
- Publication number
- JPH03239312A JPH03239312A JP2035762A JP3576290A JPH03239312A JP H03239312 A JPH03239312 A JP H03239312A JP 2035762 A JP2035762 A JP 2035762A JP 3576290 A JP3576290 A JP 3576290A JP H03239312 A JPH03239312 A JP H03239312A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- magnetic alloy
- atoms
- targets
- expressed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910001004 magnetic alloy Inorganic materials 0.000 title claims abstract description 33
- 230000000737 periodic effect Effects 0.000 claims abstract 3
- 229910052804 chromium Inorganic materials 0.000 claims description 6
- 229910052787 antimony Inorganic materials 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 229910052735 hafnium Inorganic materials 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229910052758 niobium Inorganic materials 0.000 claims description 3
- 229910052763 palladium Inorganic materials 0.000 claims description 3
- 229910052703 rhodium Inorganic materials 0.000 claims description 3
- 229910052707 ruthenium Inorganic materials 0.000 claims description 3
- 229910052718 tin Inorganic materials 0.000 claims description 3
- 229910052727 yttrium Inorganic materials 0.000 claims description 3
- 229910052726 zirconium Inorganic materials 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract description 25
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 abstract description 16
- 229910052757 nitrogen Inorganic materials 0.000 abstract description 12
- 230000004907 flux Effects 0.000 abstract description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 abstract description 8
- 239000000758 substrate Substances 0.000 abstract description 7
- 229910052786 argon Inorganic materials 0.000 abstract description 5
- 239000000203 mixture Substances 0.000 abstract description 5
- 229910052742 iron Inorganic materials 0.000 abstract description 4
- 238000000034 method Methods 0.000 abstract description 4
- -1 argon ions Chemical class 0.000 abstract description 2
- 229910045601 alloy Inorganic materials 0.000 description 15
- 239000000956 alloy Substances 0.000 description 15
- 238000005260 corrosion Methods 0.000 description 7
- 230000007797 corrosion Effects 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000035699 permeability Effects 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 229910001337 iron nitride Inorganic materials 0.000 description 3
- 239000000696 magnetic material Substances 0.000 description 3
- 229910000702 sendust Inorganic materials 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 229910018229 Al—Ga Chemical group 0.000 description 2
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229910052741 iridium Inorganic materials 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 229910052745 lead Inorganic materials 0.000 description 2
- 230000005415 magnetization Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 229910052762 osmium Inorganic materials 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229910052702 rhenium Inorganic materials 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910020641 Co Zr Inorganic materials 0.000 description 1
- 229910020520 Co—Zr Inorganic materials 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000004453 electron probe microanalysis Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
Landscapes
- Soft Magnetic Materials (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、高密度磁気記録用の磁気ヘッドに適する磁性
合金に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a magnetic alloy suitable for a magnetic head for high-density magnetic recording.
（従来の技術）
近年、磁気記録の高密度化や広帯域化の必要性が高まり
、磁気記録媒体に高い抗磁力を有する磁性材料を使用し
て記録トラック幅を狭くすることにより、高密度磁気記
録再生を実現している。(Prior art) In recent years, the need for higher density and wider band magnetic recording has increased, and high-density magnetic recording has been achieved by narrowing the recording track width by using magnetic materials with high coercive force in magnetic recording media. Achieving regeneration.
そして、この高い抗磁力をもつ磁気記録媒体に記録再生
するするための磁気ヘッド飼料として、飽和磁束密度Ｂ
ｓの高い磁性合金が必要とされており、センダスト合金
やｃｏ−Ｚｒ系非晶質合金等をコアの一部または全部に
使用した磁気ヘッドが提案されている。The saturation magnetic flux density B
Magnetic alloys with high s are required, and magnetic heads using Sendust alloys, co-Zr amorphous alloys, etc. for part or all of the core have been proposed.
然しなから、磁気記録媒体の高抗磁力化が一段と進み、
磁気記録媒体の抗磁力が２００００ ｅ以上になるとセ
ンダスト合金やＣｏ−Ｚ ｒ系非晶質合金を使用した磁
気ヘッドでは良好な磁気記録再生が困難になった。又、
磁気記録媒体の長手方向ではなく、厚さ方向に磁化して
記録する垂直磁化記録方式も提案されているがこの垂直
磁化記録方式を良好に行うには、磁気ヘッドの主磁極の
先端部の厚さを０．５μｍ以下にする必要があり、比較
的抗磁力の低い磁気記録媒体に記録するにも、高い飽和
磁束密度を持つ磁気ヘッド用磁性合金が必要になる。However, as the coercive force of magnetic recording media continues to increase,
When the coercive force of the magnetic recording medium exceeds 20,000 e, it becomes difficult to perform good magnetic recording and reproduction with magnetic heads using Sendust alloys or Co-Zr amorphous alloys. or,
A perpendicular magnetization recording method has also been proposed in which the magnetic recording medium is magnetized in the thickness direction rather than in the longitudinal direction.In order to perform this perpendicular magnetization recording method well, it is necessary to adjust the thickness of the tip of the main pole of the magnetic head. It is necessary to keep the magnetic head thickness to 0.5 μm or less, and even for recording on a magnetic recording medium with relatively low coercive force, a magnetic alloy for a magnetic head with a high saturation magnetic flux density is required.
そして、センダスト合金やＣｏ−Ｚｒ系非晶質合金より
も飽和磁束密度の高い磁性合金として、窒化鉄やＦｅ−
８ｉ系合金等の鉄を主成分とした磁性合金が知られてい
る。Iron nitride and Fe-
Magnetic alloys containing iron as a main component, such as 8i-based alloys, are known.
（発明が解決しようとする課題）
ところが、従来より知られている、これらの高Ｂｓ磁性
合金は保磁力Ｈｃが大きく、そのままでは磁気ヘッドの
材料としては不十分であるのでセンダスト合金やパーマ
ロイ等の保磁力の小さい磁性材料か、或いは５ｉ０２等
の非磁性飼料を中間層とした多層構造の磁気ヘッドが提
案されている。(Problem to be solved by the invention) However, these conventionally known high Bs magnetic alloys have a large coercive force Hc and are not sufficient as materials for magnetic heads as they are, so sendust alloys, permalloy, etc. A multilayer magnetic head has been proposed in which the intermediate layer is made of a magnetic material with a low coercive force or a non-magnetic material such as 5i02.
然しなから、多層構造にするには工数やコストがかかり
、信頼性を保つのも難しいという問題点かあった。特に
、数μｍ以上の膜厚にする７＞には場合によっては１０
０層以」−の多層構造にする必要かあり、使用範囲も限
られていた。However, creating a multilayer structure requires a lot of man-hours and costs, and it is difficult to maintain reliability. In particular, for 7> where the film thickness is several μm or more, in some cases 10
It is necessary to have a multilayer structure with 0 or more layers, and the scope of use is also limited.
この問題点を解決するために、本発明穴等はＦｅＮ−０
合金によって、単層で高ＢＳ・低Ｈｃの磁性合金か得ら
れることを提案したが、熱安定性の面から、ガラスモー
ルド上程には適さないという問題があった。In order to solve this problem, the holes etc. of the present invention are made of FeN-0
Although it was proposed that a single layer magnetic alloy with high BS and low Hc could be obtained by using an alloy, there was a problem in that it was not suitable for use in upper glass molds from the viewpoint of thermal stability.
そこで本発明は多層構造にしなくても高飽和磁束密度を
持ち、保磁力が小さく、熱安定性に優れた磁性合金を提
供することを目的とする。Therefore, an object of the present invention is to provide a magnetic alloy that has a high saturation magnetic flux density without having a multilayer structure, has a small coercive force, and has excellent thermal stability.
（課題を解決するための手段）
本発明は上記の課題を解決するためになされたものであ
り、ＦｅＸＮｙＭｚなる組成式で表され、Ｘ 、 ｙ、
７．で示される原子％が１≦ｙ≦１０
０．５≦２≦１０
Ｘ ＋ｙ ＋ｚ ＝１００
は、Ｆ ｅ ＸＮｙ Ｍｚ Ｌｖなる組成式で表され、
Ｘ ｓ Ｙ ％ Ｚ ｓ Ｖて示される原子％が１≦ｙ
＊ｉ。(Means for Solving the Problems) The present invention has been made to solve the above problems, and is represented by the composition formula FeXNyMz, with X, y,
7. The atomic % represented by 1≦y≦10 0.5≦2≦10 X +y +z =100 is expressed by the composition formula Fe XNy Mz Lv,
X s Y % Z s V atomic % is 1≦y
*i.
０．５≦ｚ≦１０ ０．８≦Ｖ≦１０ Ｘ ＋３／ ＋ｚ ＋ｖ ＝ＬＯ０ はＴｉ、Ｖ、Ｃｒ、Ｃｏ、Ｎｉ、Ｃｕ、Ｙ、Ｚｒ。0.5≦z≦10 0.8≦V≦10 X+3/+z+v=LO0 are Ti, V, Cr, Co, Ni, Cu, Y, and Zr.
Ｎｂ、 Ｍｏ、 Ｒｕ、 Ｒｈ、 Ｐｄ、
Ａ ｇ、 Ｓｎ、 Ｓｂ Ｈｆ、 Ｔａ、
Ｗ、 Ｒｅ、 Ｏｓ、 Ｉ ｒ、 Ｐｔ。Nb, Mo, Ru, Rh, Pd,
A g, Sn, Sb Hf, Ta,
W, Re, Os, Ir, Pt.
Ａｕ、Ｐｂなる群の中から選ばれた少なくとも１種以上
の元素）をそれぞれ提供するものである。At least one element selected from the group consisting of Au and Pb).
（実施例）
本発明になる磁性合金の製造装置の一実施例を第１図に
示す。(Example) An example of the magnetic alloy manufacturing apparatus according to the present invention is shown in FIG.
一対のターゲット５．５は鉄（Ｆｅ）とＡｌＧａ等の合
金ターゲットか、或いは適当な四部を設けた純鉄のター
ゲットの凹部にチップ状のＡ１等をはめ込んだ複合ター
ゲットである。このターゲット５．５はターゲットホル
ダ９によって支えられており、このターゲット５とター
ゲットホルダ９には、直流電源１３よりマイナス電位が
印加され、更にこのターゲットホルダ９の周囲にはシー
ルド４が取り付けである。又、このターゲットボルダ９
の内部には、両ターゲット５．５間にプラズマ１４を集
束するための磁石６．６が挿入され、かつターゲット５
の表面の加熱を防ぐために冷却水８が流入している。The pair of targets 5.5 is an alloy target of iron (Fe) and AlGa, or a composite target in which a chip-shaped A1 or the like is fitted into a concave part of a pure iron target provided with four appropriate parts. This target 5.5 is supported by a target holder 9, a negative potential is applied to the target 5 and the target holder 9 from a DC power supply 13, and a shield 4 is attached around the target holder 9. . Also, this target boulder 9
A magnet 6.6 for focusing the plasma 14 is inserted between both targets 5.5, and
Cooling water 8 flows in to prevent the surface from heating.
そ］２て、接地された真空槽１５の左右に、２個のター
ゲットホルダ９が絶縁体７によって絶縁されて設けられ
ている。Two target holders 9 are provided on the left and right sides of the grounded vacuum chamber 15 and are insulated by an insulator 7.
又、この真空槽１５の上部より、窒素（Ｎ２）アルゴン
（Ａｒ）がそれぞれ流量計１．２により、所定の流量に
調節されて導入されている。Further, nitrogen (N2) and argon (Ar) are introduced from the upper part of the vacuum chamber 15, each being adjusted to a predetermined flow rate by a flow meter 1.2.
なお、アルゴンはターゲット５をスパッタすると同時に
成膜する磁性合金膜中の窒素の量を調節するためのもの
である。Note that argon is used to adjust the amount of nitrogen in the magnetic alloy film formed at the same time as the target 5 is sputtered.
そして、真空槽１５の下部には基板ホルダ１２上に基板
１１が置かれ、不純物を防ぐためのシャッタ１０が基板
１１を覆っている。A substrate 11 is placed on a substrate holder 12 at the bottom of the vacuum chamber 15, and a shutter 10 for preventing impurities covers the substrate 11.
このようなスパッタ装置において、直流電源１３により
、左右のターゲットホルダ９に支えられたターゲット５
．５の間にプラズマ１４を発生させると、ターゲット５
はマイナス電位であるので、プラズマ１４中のアルゴン
イオン（Ａｒ”）がターゲッット５に衝突し、ターゲッ
ト５の鉄原子及びＡｌ−Ｇａ等の原子が飛び出ず。In such a sputtering apparatus, the target 5 supported by the left and right target holders 9 is powered by the DC power supply 13.
．． When the plasma 14 is generated between 5 and 5, the target 5
Since is at a negative potential, argon ions (Ar'') in the plasma 14 collide with the target 5, and atoms such as iron atoms and Al-Ga atoms of the target 5 do not fly out.
そして、ターゲット５から飛び出した鉄とＡＩ・Ｇａ等
の原子と、プラズマ中の窒素の原子または分子とが結合
して、基板１１の上に成長ｌ−でいく。Then, atoms of iron, AI, Ga, etc. ejected from the target 5 are combined with nitrogen atoms or molecules in the plasma, and grow on the substrate 11 as l-.
なお、スパッタ開始後の数分間はシャッタ１０を閉じて
基板１１を覆うことにより、ターゲット５の表面の不純
物が基板］１−の上に付かないようにし、その後でシャ
ッタ１０を開けるようにする。Note that the shutter 10 is closed to cover the substrate 11 for several minutes after the start of sputtering to prevent impurities on the surface of the target 5 from adhering to the substrate 1-, and then the shutter 10 is opened.
そして、流量羽１．２により窒素及びアルゴンの導入量
を調節することにより、所望の窒素を含んだＦｅＸＮｙ
Ｍｚ合金または、ＦｅｘＮＹＭ２Ｌｖ合金を得ることが
できる。Then, by adjusting the amount of nitrogen and argon introduced with the flow blades 1.2, FeXNy containing the desired nitrogen is obtained.
Mz alloy or FexNYM2Lv alloy can be obtained.
この様にして得たＦｅｘＮｙＭｚ合金の窒素及びＡｌ−
Ｇａ等の含有量と飽和磁束密度（Ｂｓ）保磁力（Ｈｅ）
との関係を表１に示す。Nitrogen and Al- of the FexNyMz alloy thus obtained
Content of Ga etc. and saturation magnetic flux density (Bs) coercive force (He)
Table 1 shows the relationship between
表１は窒素・ＡＩ及びＧａ等の含有量と飽和磁束密度（
Ｂｓ）、保磁力（Ｈｃ）との関係を示すものであり、含
有量はＥＳＣＡ（Ｘ線光電子分光分析法） 、ＥＰＭＡ
（Ｘ線マイクロアナライザ法）等による定量分析で原
子％て表しているが、±２０％程度の誤差が見込まれる
。保磁力は真空中での熱処理をおこなった時の値であり
、熱処理温度はここでは３００°Ｃである。この内、試
料番号１はＦｅに窒素のみを含有させた時の結果であり
、試料番号２はＦｅにＡ１のみを含有させた時の結果で
ある。試料番号３〜８は本発明の磁性合金である。Table 1 shows the contents of nitrogen, AI, Ga, etc. and the saturation magnetic flux density (
Bs), shows the relationship with coercive force (Hc), and the content is ESCA (X-ray photoelectron spectroscopy), EPMA
(X-ray microanalyzer method), etc., and it is expressed as atomic %, but an error of about ±20% is expected. The coercive force is the value when heat treatment is performed in vacuum, and the heat treatment temperature is 300°C here. Among these, sample number 1 is the result when Fe contains only nitrogen, and sample number 2 is the result when Fe contains only A1. Sample numbers 3 to 8 are magnetic alloys of the present invention.
窒素の含有量が１原子％未満であると、顕著な窒素の効
果が見られずＨｃはほとんど低下しない。When the nitrogen content is less than 1 atomic %, no significant effect of nitrogen is observed and Hc hardly decreases.
また、図４に示したように窒素の含有量が１０原子％以
下であると、Ｂｓは１５ｋＧ以上となる。従って、窒素
の含有量がｌ〜１０原子％である時、高Ｂｓで低Ｈｅの
磁性合金が得られる。Further, as shown in FIG. 4, when the nitrogen content is 10 atomic % or less, Bs becomes 15 kG or more. Therefore, when the nitrogen content is 1 to 10 atomic %, a high Bs and low He magnetic alloy can be obtained.
図２には本発明になる磁性合金と従来例である窒化鉄（
ＦｅＮ）合金の、熱処理温度による保磁力（Ｈｅ）の変
化を示す。窒化鉄は熱処理温度３００″′ Ｃの時は比
較的Ｈｃが低いが３００ ” ｃ以上にすると急激にＨ
ｃが増大する。これに対し本発明になる磁性合金は、Ｈ
ｃが小さく熱安定性にも優れていることが解る。ここで
、Ａ１・Ｇａ等の合計の含有量が０．５原子％未満であ
ると、低Ｈｃ化と熱安定性の向上に対する顕著な効果は
見られず、ＩＯ原子％を越えるとＢｓが１５ｋＧ以上の
磁性合金が得られなくなる。従って、Ａｌ−Ｇａ等の合
計の含有量が０．５〜１０原子％の時、高Ｂｓ・低Ｈｅ
で熱安定性にも優れた磁性合金を得ることができる。Figure 2 shows the magnetic alloy of the present invention and the conventional example of iron nitride (
2 shows the change in coercive force (He) of the FeN) alloy depending on the heat treatment temperature. Iron nitride has a relatively low Hc when the heat treatment temperature is 300''C, but when the heat treatment temperature exceeds 300''C, the Hc rapidly decreases.
c increases. On the other hand, the magnetic alloy of the present invention has H
It can be seen that c is small and thermal stability is excellent. Here, if the total content of A1, Ga, etc. is less than 0.5 atomic%, no remarkable effect on lowering Hc and improving thermal stability is observed, and if it exceeds IO atomic%, Bs increases by 15 kG. The above magnetic alloy cannot be obtained. Therefore, when the total content of Al-Ga, etc. is 0.5 to 10 at%, high Bs and low He
It is possible to obtain a magnetic alloy with excellent thermal stability.
また、図３には膜厚を２μｍとした時の本発明になる磁
性合金の透磁率μと周波数の関係を示す。Further, FIG. 3 shows the relationship between the magnetic permeability μ and frequency of the magnetic alloy according to the present invention when the film thickness is 2 μm.
本発明になる磁性合金は透磁率が３０００と高く、磁気
ヘッドとして十分な再生効率が得られることが解る。It can be seen that the magnetic alloy according to the present invention has a high magnetic permeability of 3000 and can obtain sufficient reproduction efficiency as a magnetic head.
表 ２
１
２
表２はＴｉ、Ｃｒ等の元素が耐蝕性の向」二に寄り、す
ることを示したものである。Table 2 Table 2 shows that elements such as Ti and Cr contribute to corrosion resistance.
実験は試料を６０’ｃ −９０％の恒温恒湿中に放置し
１０００時間経過後に腐蝕痕が見られないものを○、腐
蝕痕が生じたものを×として耐蝕性を示した。In the experiment, the samples were left in a constant temperature and humidity environment of 60'C -90%, and after 1000 hours, the samples with no corrosion marks were rated as ○, and the samples with corrosion marks were graded as x, indicating corrosion resistance.
試料番号２１は比較例であるＦｅＮ合金、試料番号２２
はＦｅ−Ｎ−Ａｌ合金、試料番号２３−４７はＦｅＮ−
Ａ Ｉ合金にＴｉ、Ｃｒ等の元素を添加した合金であり
、試料番号２２〜４７が本発明になる磁性合金である。Sample number 21 is a comparative example of FeN alloy, sample number 22
is Fe-N-Al alloy, sample number 23-47 is FeN-
These are alloys in which elements such as Ti and Cr are added to the AI alloy, and sample numbers 22 to 47 are magnetic alloys according to the present invention.
ここで、Ｔｉ、Ｃｒ等の合計の含有量が０．３原子％未
満であると、耐蝕性に対する顕著な効果が見られず、１
０原子％を越えると１．５ｋＧ以上のＢｓが得られなく
なる。従って、Ｔｉ、Ｖ。Here, if the total content of Ti, Cr, etc. is less than 0.3 at%, no significant effect on corrosion resistance is observed, and 1
If it exceeds 0 atomic %, Bs of 1.5 kG or more cannot be obtained. Therefore, Ti, V.
Ｃｒ、Ｃｏ、Ｎｉ、Ｃｕ、Ｙ、Ｚｒ、Ｎｂ、Ｍｏ。Cr, Co, Ni, Cu, Y, Zr, Nb, Mo.
Ｒｕ、Ｒｈ、Ｐｄ、Ａｇ、Ｓｎ、Ｓｂ、Ｈｆ。Ru, Rh, Pd, Ag, Sn, Sb, Hf.
Ｔａ、、Ｗ、Ｒｅ、Ｏｓ、Ｉ ｒ、Ｐｔ、Ａｕ、Ｐｂの
合計の含有量が０．３〜１０原子％である時、磁気特性
と耐蝕性に優れた磁性合金が得られる。When the total content of Ta, W, Re, Os, Ir, Pt, Au, and Pb is 0.3 to 10 atomic %, a magnetic alloy with excellent magnetic properties and corrosion resistance can be obtained.
（発明の効果）
本発明は、以上のような組成の磁性合金とすることによ
り、高飽和磁束密度を有し、保磁力が小さく、透磁率が
大きく、更に熱安定性と耐蝕性に優れた磁気ヘッド等の
磁気デバイス用磁性合金が得られる。従って、本発明の
磁性合金を用いれば、高保磁力媒体への良好な記録再生
が行える他、高性能の薄膜磁気ヘッド等を作成すること
ができ、高密度磁気記録再生が実現できる。(Effects of the Invention) The present invention provides a magnetic alloy having the composition described above, which has high saturation magnetic flux density, low coercive force, high magnetic permeability, and excellent thermal stability and corrosion resistance. A magnetic alloy for magnetic devices such as magnetic heads is obtained. Therefore, by using the magnetic alloy of the present invention, it is possible to perform good recording and reproducing on a high coercive force medium, and also to create a high-performance thin film magnetic head and the like, and realize high-density magnetic recording and reproducing.
第１図は、本発明になる磁性合金を製造する装置の一実
施例であるスパッタ装置の概略図、第２図は熱処理温度
によるＨｃの変化を表す図、第３図は透磁率μと周波数
の関係を示す図、第４図は窒素含有量と飽和磁束密度の
関係（Ｂｓ）を示す図である。Fig. 1 is a schematic diagram of a sputtering apparatus which is an embodiment of the apparatus for manufacturing the magnetic alloy according to the present invention, Fig. 2 is a diagram showing changes in Hc depending on heat treatment temperature, and Fig. 3 is a diagram showing magnetic permeability μ and frequency. FIG. 4 is a diagram showing the relationship (Bs) between nitrogen content and saturation magnetic flux density.
Claims (1)
ｙ、ｚで示される原子％が １≦ｙ≦１０ ０．５≦ｚ≦１０ ｘ＋ｙ＋ｚ＝１００ なる関係を有する磁性合金。（但しＭは周期律表IIIｂ
族の中の少なくとも１種類以上の元素） （２）ＭがＡｌである特許請求の範囲第１項記載の磁性
合金。 （３）ＭがＧａである特許請求の範囲第１項記載の磁性
合金。 （４）Ｆｅ＿ｘＮ＿ｙＭ＿ｚＬ＿ｖなる組成式で表され
、ｘ、ｙ、ｚ、ｖで示される原子％が １≦ｙ≦１０ ０．５≦ｚ≦１０ ０．３≦ｖ≦１０ ｘ＋ｙ＋ｚ＋ｖ＝１００ なる関係を有する磁性合金。（但しＭは周期律表IIIｂ
族の中の少なくとも１種類以上の元素であり、ＬはＴｉ
，Ｖ，Ｃｒ，Ｃｏ，Ｎｉ，Ｃｕ，Ｙ，Ｚｒ，Ｎｂ，Ｍｏ
，Ｒｕ，Ｒｕ，Ｒｈ，Ｐｄ，Ａｇ，Ｓｎ，Ｓｂ，Ｈｆ，
Ｔａ，Ｗ，Ｒｅ，Ｏｓ，Ｉｒ，Ｐｔ，Ａｕ，Ｐｂなる群
の中から選ばれた少なくとも１種以上の元素） （５）ＭがＡｌである特許請求の範囲第４項記載の磁性
合金。 （６）ＭがＧａである特許請求の範囲第４項記載の磁性
合金。[Claims] (1) Represented by the compositional formula Fe_xN_YM_z, x,
A magnetic alloy in which the atomic % represented by y and z has the following relationship: 1≦y≦10 0.5≦z≦10 x+y+z=100. (However, M is periodic table IIIb
(2) The magnetic alloy according to claim 1, wherein M is Al. (3) The magnetic alloy according to claim 1, wherein M is Ga. (4) It is represented by the compositional formula Fe_xN_yM_zL_v, and the atomic percentages represented by x, y, z, and v have the following relationships: 1≦y≦10 0.5≦z≦10 0.3≦v≦10 x+y+z+v=100 magnetic alloy. (However, M is periodic table IIIb
At least one element in the group, L is Ti
, V, Cr, Co, Ni, Cu, Y, Zr, Nb, Mo
, Ru, Ru, Rh, Pd, Ag, Sn, Sb, Hf,
(5) The magnetic alloy according to claim 4, wherein M is Al. (6) The magnetic alloy according to claim 4, wherein M is Ga.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2035762A JPH03239312A (en) | 1990-02-16 | 1990-02-16 | Magnetic alloy |
| US07/598,515 US5154983A (en) | 1989-10-18 | 1990-10-16 | Magnetic alloy |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2035762A JPH03239312A (en) | 1990-02-16 | 1990-02-16 | Magnetic alloy |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03239312A true JPH03239312A (en) | 1991-10-24 |
Family
ID=12450866
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2035762A Pending JPH03239312A (en) | 1989-10-18 | 1990-02-16 | Magnetic alloy |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03239312A (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6286146A (en) * | 1985-10-14 | 1987-04-20 | Nippon Yakin Kogyo Co Ltd | High permeability amorphous alloy having high corrosion resistance, strength and wear resistance and method for modifying magnetic characteristic of said alloy |
| JPS6365604A (en) * | 1986-09-05 | 1988-03-24 | Hitachi Ltd | Iron magnetic film |
| JPS63299219A (en) * | 1987-05-29 | 1988-12-06 | Sony Corp | Magnetically soft thin film |
| JPS6432607A (en) * | 1987-04-23 | 1989-02-02 | Matsushita Electric Ind Co Ltd | Magnetic alloy film |
| JPS6442108A (en) * | 1987-08-10 | 1989-02-14 | Hitachi Ltd | Heat-resisting magnetic film |
| JPH0199203A (en) * | 1987-10-13 | 1989-04-18 | Sony Corp | Soft magnetic laminated layer film |
-
1990
- 1990-02-16 JP JP2035762A patent/JPH03239312A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6286146A (en) * | 1985-10-14 | 1987-04-20 | Nippon Yakin Kogyo Co Ltd | High permeability amorphous alloy having high corrosion resistance, strength and wear resistance and method for modifying magnetic characteristic of said alloy |
| JPS6365604A (en) * | 1986-09-05 | 1988-03-24 | Hitachi Ltd | Iron magnetic film |
| JPS6432607A (en) * | 1987-04-23 | 1989-02-02 | Matsushita Electric Ind Co Ltd | Magnetic alloy film |
| JPS63299219A (en) * | 1987-05-29 | 1988-12-06 | Sony Corp | Magnetically soft thin film |
| JPS6442108A (en) * | 1987-08-10 | 1989-02-14 | Hitachi Ltd | Heat-resisting magnetic film |
| JPH0199203A (en) * | 1987-10-13 | 1989-04-18 | Sony Corp | Soft magnetic laminated layer film |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5154983A (en) | Magnetic alloy | |
| JP2668590B2 (en) | Magnetic alloy for magnetic head | |
| JPH03239312A (en) | Magnetic alloy | |
| JPH03270203A (en) | Magnetic alloy | |
| JPH07116564B2 (en) | Magnetic alloy | |
| JPH03270202A (en) | Magnetic alloy | |
| JPH03288410A (en) | Magnetic alloy | |
| JP2569828B2 (en) | Magnetic alloys for magnetic devices | |
| JPH04187745A (en) | Magnetic alloy | |
| JPH03270204A (en) | Magnetic alloy | |
| JPH03116910A (en) | Magnetic alloy film | |
| JPH03240209A (en) | Magnetic alloy | |
| JPH02298238A (en) | Magnetic alloy | |
| JPH02199027A (en) | Magnetic alloy | |
| JP2689512B2 (en) | Magnetic alloy for magnetic head | |
| JP3087265B2 (en) | Magnetic alloy | |
| JPH02175618A (en) | Magnetic alloy | |
| JPS59157828A (en) | Magnetic recording medium | |
| JPH03134138A (en) | Magnetic alloy | |
| JPH01146312A (en) | Soft magnetic thin film | |
| JPS6289312A (en) | Magnetically soft thin film | |
| JPH06240417A (en) | Magnetic alloy | |
| JPH03166704A (en) | Magnetic alloy | |
| JPH03129805A (en) | Magnetic alloy film | |
| JPH02175619A (en) | Magnetic alloy |