JPH02298238A - Magnetic alloy - Google Patents
Magnetic alloyInfo
- Publication number
- JPH02298238A JPH02298238A JP2019480A JP1948090A JPH02298238A JP H02298238 A JPH02298238 A JP H02298238A JP 2019480 A JP2019480 A JP 2019480A JP 1948090 A JP1948090 A JP 1948090A JP H02298238 A JPH02298238 A JP H02298238A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- alloy
- magnetic alloy
- formula
- recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910001004 magnetic alloy Inorganic materials 0.000 title claims abstract description 35
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 15
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 14
- 239000000203 mixture Substances 0.000 claims abstract description 12
- 229910052707 ruthenium Inorganic materials 0.000 claims abstract description 9
- 229910052796 boron Inorganic materials 0.000 claims abstract description 6
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 6
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 6
- 229910052802 copper Inorganic materials 0.000 claims abstract description 6
- 229910052733 gallium Inorganic materials 0.000 claims abstract description 6
- 229910052735 hafnium Inorganic materials 0.000 claims abstract description 6
- 229910052763 palladium Inorganic materials 0.000 claims abstract description 6
- 229910052703 rhodium Inorganic materials 0.000 claims abstract description 6
- 229910052709 silver Inorganic materials 0.000 claims abstract description 6
- 229910052718 tin Inorganic materials 0.000 claims abstract description 6
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 6
- 229910052720 vanadium Inorganic materials 0.000 claims abstract description 6
- 229910052787 antimony Inorganic materials 0.000 claims abstract description 5
- 229910052745 lead Inorganic materials 0.000 claims abstract description 5
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 5
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 5
- 229910052762 osmium Inorganic materials 0.000 claims abstract description 5
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 5
- 229910052702 rhenium Inorganic materials 0.000 claims abstract description 5
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 5
- 229910052741 iridium Inorganic materials 0.000 claims abstract description 4
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 4
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 3
- 229910052737 gold Inorganic materials 0.000 claims abstract description 3
- 229910052760 oxygen Inorganic materials 0.000 abstract description 12
- 230000004907 flux Effects 0.000 abstract description 6
- 238000004544 sputter deposition Methods 0.000 abstract description 5
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 239000000463 material Substances 0.000 abstract description 3
- 238000005275 alloying Methods 0.000 abstract 1
- 230000001105 regulatory effect Effects 0.000 abstract 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 13
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 13
- 229910045601 alloy Inorganic materials 0.000 description 13
- 239000000956 alloy Substances 0.000 description 13
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 11
- 239000010955 niobium Substances 0.000 description 11
- 239000001301 oxygen Substances 0.000 description 11
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 7
- 238000005260 corrosion Methods 0.000 description 6
- 230000007797 corrosion Effects 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 229910052742 iron Inorganic materials 0.000 description 5
- 229910000979 O alloy Inorganic materials 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 229910001337 iron nitride Inorganic materials 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229910020641 Co Zr Inorganic materials 0.000 description 2
- 229910020520 Co—Zr Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 230000005415 magnetization Effects 0.000 description 2
- 229910000702 sendust Inorganic materials 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 229910001199 N alloy Inorganic materials 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 1
- -1 argon ions Chemical class 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 230000002747 voluntary effect Effects 0.000 description 1
Landscapes
- Compounds Of Iron (AREA)
- Soft Magnetic Materials (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、特に高密度磁気記録用の磁気ヘッドに適する
磁性合金に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a magnetic alloy particularly suitable for a magnetic head for high-density magnetic recording.
（従来の技術）
近年、磁気記録の高密度化や広帯域化の必要性が高まり
、磁気記録媒体に高い抗磁力を何する磁性材料を使用し
て記録トラック幅を狭くすることにより、高密度磁気記
録再生を実現している。(Prior art) In recent years, the need for higher density and wider band magnetic recording has increased, and high-density magnetic Realizes recording and playback.
そして、この高い抗磁力をもつ磁気記録媒体に記録再生
するするための磁気ヘッド材料として、飽和磁束密度Ｂ
ｓの高い磁性合金が必要とされており、センダスト合金
やＣｏ−Ｚｒ系非晶質合金等をコアの一部または全部に
使用した磁気ヘッドが提案されている。The saturation magnetic flux density B
Magnetic alloys with high s are required, and magnetic heads using Sendust alloys, Co-Zr amorphous alloys, etc. for part or all of the core have been proposed.
然しながら、これらの合金のＢｓはｌ ＯＩ（Ｇ程度か
或いはそれ以下であり、磁気記録媒体の高抗磁力化が一
段と進み抗磁力が２００００ ｅ以上になるとセンダス
ト合金やＣｏ−Ｚｒ系非晶質合金を使用した磁気ヘッド
では良好な磁気記録再生が困難になった。However, the Bs of these alloys is about 1 OI (G or less), and as the coercive force of magnetic recording media progresses further and the coercive force exceeds 20,000 e, Sendust alloy and Co-Zr amorphous alloy It has become difficult to achieve good magnetic recording and reproduction with magnetic heads using magnetic heads.
又、磁気記録媒体の長手方向ではなく、厚さ方向に磁化
して記録する垂直磁化記録方式も提案さねているが、こ
の垂直磁化記録方式を良好に行う（−は、磁気ヘッドの
主磁極先端部の厚さを０．５μｍ以下にする必要があり
、比較的抗磁力の低い磁気記録媒体に記録するにも、高
い飽和磁束密度を持つ磁気ヘッド用磁性合金が必要にな
る。Also, we have not proposed a perpendicular magnetization recording method in which the magnetic recording medium is magnetized in the thickness direction rather than in the longitudinal direction, but this perpendicular magnetization recording method can be successfully implemented (- indicates the main magnetic pole of the magnetic head). The thickness of the tip must be 0.5 μm or less, and a magnetic alloy for a magnetic head with a high saturation magnetic flux density is required even for recording on a magnetic recording medium with relatively low coercive force.
そして、センダスト合金やＣｏ−Ｚｒ系非晶質合金より
も飽和磁束密度の高い磁性合金として、窒化鉄やＦｅ−
Ｓｉ系合金等の鉄を主成分とした磁性合金が知られてい
る。Iron nitride and Fe-
Magnetic alloys containing iron as a main component, such as Si-based alloys, are known.
（発明が解決しようとする課題）
ところが、従来より知られているこれらの高Ｂｓ磁性合
金は、保磁力Ｈｅが大きくそのままでは磁気ヘッドの材
料としては不十分であるので、センダスト合金やパーマ
ロイ等の保磁力の小さい磁性材料か、或いはＳｉＯ２等
の非磁性材料を中間層とした多層構造の磁気ヘッドが提
案されている。 然しながら、このように異なる系の物
質を多層化するには工数やコストがかかり、信頼性を保
つのも暮しいという問題があった。(Problem to be Solved by the Invention) However, these conventionally known high Bs magnetic alloys have a large coercive force He and are not sufficient as materials for magnetic heads as they are. A multilayer magnetic head has been proposed in which the intermediate layer is made of a magnetic material with a low coercive force or a non-magnetic material such as SiO2. However, creating multiple layers of different types of materials in this way requires a lot of man-hours and costs, and it is difficult to maintain reliability.
特に、数μ畷以上の膜厚にするためには、場合によって
は１００層以上の多層構造にする必要があり、使用範囲
も限られていた。In particular, in order to obtain a film thickness of several μm or more, it is necessary to have a multilayer structure of 100 or more layers in some cases, which limits the range of use.
この問題を解決するために、本発明式等はＦｅ−Ｎ−０
合金によって単層で高Ｂｓで、かつ低Ｈｅの磁性合金が
得られることを提案したが、熱安定性の面からガラスモ
ールド工程には適さないという問題があった。In order to solve this problem, the present invention formula etc.
Although it was proposed that a single layer magnetic alloy with high Bs and low He could be obtained by using an alloy, there was a problem that it was not suitable for the glass molding process from the viewpoint of thermal stability.
そこで、本発明は多層構造にしなくても高飽和磁束密度
を持ち、且つ、保磁力の小さい熱安定性に優れた磁性合
金を提供することを目的とする。Therefore, an object of the present invention is to provide a magnetic alloy that has a high saturation magnetic flux density without having a multilayer structure, has a small coercive force, and has excellent thermal stability.
（課題を解決するための手段）
本発明は上記の課題を解決するためになされたものであ
り、 Ｆ ｅｙ ＮＷ ＯＸ ＭＹなる組成式で表わさ
れ、ｖ、ｗ、ｘ、ｙで示される原子％は１≦ｗ≦２０
１５ｘ≦２０
０．５≦ｙ≦６
ｖ ＋ ｗ ＋ ｘ ＋ ｙ ＝ １００なる関係を有
する磁性合金、（但しＭはＴａ。(Means for Solving the Problems) The present invention has been made to solve the above problems, and is represented by the composition formula F ey NW OX MY, and atoms represented by v, w, x, and y. % is a magnetic alloy having the following relationships: 1≦w≦20 15x≦20 0.5≦y≦6 v + w + x + y = 100 (where M is Ta).
Ｎｂ、またはＴａとＮｂの混合物）または、Ｆｅｖ Ｎ
ｗＯｘＭ、Ｌ２なる組成式で表わされ、ｖ、ｗ、ｘ、ｙ
、ｚで示される原子％は１≦ｗ≦２０
１≦ｘ≦２０
０．５≦ｙ≦６
０．３≦２≦３
ｖ＋ｗ＋ｘ＋ｙ＋ｚ−１００
なる関係を有する磁性合金、（但しＭはＴａまたはＮｂ
またはＴａとＮｂの混合物であり、ＬはＴｉ、Ｃｒ、Ｃ
ｏ、Ｃｕ、Ｇ−ａ、Ｍｏ、Ｒｕ。Nb or a mixture of Ta and Nb) or Fev N
It is represented by the composition formula wOxM, L2, and v, w, x, y
, z is a magnetic alloy having the following relationship: 1≦w≦20 1≦x≦20 0.5≦y≦6 0.3≦2≦3 v+w+x+y+z−100 (where M is Ta or Nb
or a mixture of Ta and Nb, where L is Ti, Cr, C
o, Cu, Ga, Mo, Ru.
Ｒｈ、Ｐｄ、Ａｇ、Ｓｎ、Ｗ、Ｒ’ｅ、Ｏｓ、 Ｉ
ｒ。Rh, Pd, Ag, Sn, W, R'e, Os, I
r.
Ｐｔ、Ａｕ、ＡＩ、 Ｓｉ、 Ｃ，Ｖ、Ｎｉ、
Ｚｒ。Pt, Au, AI, Si, C, V, Ni,
Zr.
Ｈｆ、Ｂ、Ｇｅ、Ｙ、Ｓｂ、Ｐｂなる群の中カラ選ばれ
た少なくとも１種類以上の元素）を提供するも、のであ
る。It also provides at least one element selected from the group consisting of Hf, B, Ge, Y, Sb, and Pb.
（実施例） 本発明の磁性合金の製造装置の一例を第１図に示す。(Example) An example of the manufacturing apparatus for the magnetic alloy of the present invention is shown in FIG.
一対のターゲット５．５は鉄（Ｆｅ）とタンタル（Ｔａ
） 、ニオブ（Ｎｂ）、例えばルテニウム（Ｒｕ）等の
添加元素の合金ターゲットか、或いは適当な四部を設け
た純鉄のターゲットの四部にチップ状のＴａ５Ｎｂまた
はＲｕ等をはめ込んだ複合ターゲットである。このター
ゲット５．５はターゲットホルダー９によって支えられ
ており、このターゲット５とターゲットホルダー９には
、直流電源１３よりマナス電位が印加され、更にこのタ
ーゲットホルダー９の周囲にはシールド４が取り付けで
ある。A pair of targets 5.5 are iron (Fe) and tantalum (Ta).
), niobium (Nb), eg, ruthenium (Ru), and other additive elements, or a composite target in which chip-shaped Ta5Nb or Ru is inserted into the four parts of a pure iron target provided with appropriate four parts. This target 5.5 is supported by a target holder 9, a manas potential is applied to this target 5 and target holder 9 from a DC power supply 13, and a shield 4 is attached around this target holder 9. .
また、このターゲットホルダー９の内部には、両ターゲ
ット５．５間にプラズマ１４を集束するための磁石６．
６が挿入され、且つターゲット５の表面の加熱を防ぐた
めに冷却水８が流入している。Moreover, inside this target holder 9, a magnet 6.5 for focusing the plasma 14 between both targets 5.5.
6 is inserted, and cooling water 8 flows in to prevent the surface of the target 5 from heating.
そして、接地された真空槽１５の左右に、２個のターゲ
ットホルダー９が絶縁体７によって絶縁されて設けられ
ている。Two target holders 9 are provided on the left and right sides of the grounded vacuum chamber 15 and are insulated by an insulator 7.
また、この真空槽１５の上部より、酸素（０２）、窒素
（Ｎ２ ） 、アルゴン（Ａ「）がそれぞれ流量計１〜
３により、所定の流量に調節されて導入されている。In addition, from the upper part of this vacuum chamber 15, oxygen (02), nitrogen (N2), and argon (A') are supplied to the flowmeters 1 to 1, respectively.
3, the flow rate is adjusted to a predetermined value and introduced.
なお、アルゴンは、ターゲット５をスパッタすると同時
に成膜する磁性合金膜中の酸素と窒素の量を調節するた
めのものである。Note that argon is used to adjust the amount of oxygen and nitrogen in the magnetic alloy film formed at the same time as the target 5 is sputtered.
そして、真空槽１５の下部には、基板ホルダー１２上に
基板１が置かれ、不純物を防ぐためのシャッター１０が
基板１１を覆っている。The substrate 1 is placed on a substrate holder 12 at the bottom of the vacuum chamber 15, and a shutter 10 for preventing impurities covers the substrate 11.
このようなスパッタ装置において、直流電源１３により
、左右のターゲットホルダー９に支えられたターゲット
５．５の間にプラズマ１４を発生させると、ターゲット
５はマイナス電位であるので、プラズマ１４中のアルゴ
ンイオン（ＡＲ”″）がターゲット５に衝突し、ターゲ
ット５の鉄原子およびＴａ、ＮｂまたはＲｕ等の原子が
飛び出ず。In such a sputtering apparatus, when a plasma 14 is generated between the targets 5.5 supported by the left and right target holders 9 by the DC power supply 13, the argon ions in the plasma 14 are generated because the target 5 has a negative potential. (AR"") collides with the target 5, and the iron atoms and atoms of Ta, Nb, Ru, etc. of the target 5 do not fly out.
そして、ターゲット５から飛び出した鉄原子と、プラズ
マ中の酸素の原子または分子とが結合して、基板１１の
上に成長していく。Then, the iron atoms ejected from the target 5 combine with oxygen atoms or molecules in the plasma, and grow on the substrate 11.
なお、スパッタ開始後の数分間は、シャッター１０を閉
じて基板１１を覆うことにより、ターゲット５の表面の
不純物が基板１１の上に付かないようにし、その後でシ
ャッター１０を開けるようにする。Note that for several minutes after the start of sputtering, the shutter 10 is closed to cover the substrate 11 to prevent impurities on the surface of the target 5 from adhering to the substrate 11, and then the shutter 10 is opened.
そして、流量計１〜３にて酸素、窒素、アルゴンの導入
量を調節することにより、所望の酸素を含んだＦ ｅｖ
ＮＷ ＯＸ Ｍｙなる組成式の合金を得ることができ
る。（但し、ＭはＴａ、Ｎｂ、 またはＴａとＮｂの混
合物）を示す）
このようにして得たＦｅｖＮｗＯｘＭｖ及びＦｅｖＮｗ
ＯｘＭＶＬｚなる組成式の合金の窒素、酸素およびＴａ
、Ｎｂ、Ｒｕなどの添加元素の含有量と回転磁場中で３
００°Ｃの熱処理を行った後の飽和磁束密度（Ｂｓ）、
保磁力（Ｈｃ）との関表１は酸素およびＴａ ＳＮ ｂ
ＳＲｕの含有量と飽和磁束密度（Ｂｓ）、保磁力（Ｈ
ｅ）との関係を示す表であり、含有量はＥＳＣＡ（Ｘ線
光電子分光分析法） 、ＥＰＭＡ （Ｘ線マイクロアナ
ライザ法）等による定量分析で原子％で表わしているが
、±２０％程度の誤差が見込まれる。保磁力は真空中で
の熱処理を行った時の値であり、熱処理温度は３０Ｇ
＠Ｃである。この内、試料番号１は鉄のみの場合の結果
であり、試料番号２は鉄に酸素のみを含有させた時の結
果、試料番号３は鉄に窒素のみを含有させた時の結果で
ある。試料番号５〜１３は本発明の磁性合金である。Then, by adjusting the amount of oxygen, nitrogen, and argon introduced using flowmeters 1 to 3, F ev containing desired oxygen is
An alloy having the composition formula NW OX My can be obtained. (However, M represents Ta, Nb, or a mixture of Ta and Nb) FevNwOxMv and FevNw obtained in this way
Nitrogen, oxygen and Ta in an alloy with the composition formula OxMVLz
, the content of additive elements such as Nb, Ru, etc. and 3 in a rotating magnetic field.
Saturation magnetic flux density (Bs) after heat treatment at 00°C,
Relationship with coercive force (Hc) Table 1 shows oxygen and Ta SN b
SRu content, saturation magnetic flux density (Bs), coercive force (H
This is a table showing the relationship between Errors are expected. The coercive force is the value when heat treatment is performed in vacuum, and the heat treatment temperature is 30G.
@C. Among these, sample number 1 is the result when only iron is used, sample number 2 is the result when iron contains only oxygen, and sample number 3 is the result when iron is made to contain only nitrogen. Sample numbers 5 to 13 are magnetic alloys of the present invention.
ここで、酸素の含有量が１原子％未満であると、顕著な
酸素の効果がみられず、Ｈｅはほとんど低下しない。ま
た、酸素の含有量が２０原子％を越えると、軟磁気特性
が大幅に劣化し、Ｂｓの低下とＨｃの増大が起こる。従
って、酸素の含有量が１〜２０原子％、更に好ましくは
１〜ｌＯ原子％であるとＢｓが高く且つＨｃの小さい磁
性合金が得られる。窒素の含有量は１原子％未満である
と顕著な磁気特性の向上は見られず、２０原子％を越え
るとＢｓの低下とＨｃの増大、特にＢｓが本発明の［１
的である高Ｂｓを達成できなくなる。従って、窒素の含
有量が１〜２０原子％、更に好ましくは１〜１０原子％
である時、Ｂｓが高く■つＨｅの小さい磁性合金が？”
Ｊられる。Here, if the oxygen content is less than 1 atomic %, no significant effect of oxygen is observed, and He hardly decreases. Furthermore, when the oxygen content exceeds 20 at %, the soft magnetic properties are significantly deteriorated, resulting in a decrease in Bs and an increase in Hc. Therefore, when the oxygen content is 1 to 20 atomic %, more preferably 1 to 10 atomic %, a magnetic alloy with high Bs and low Hc can be obtained. If the nitrogen content is less than 1 atomic %, no significant improvement in magnetic properties is observed, and if it exceeds 20 atomic %, Bs decreases and Hc increases.
It becomes impossible to achieve the target high Bs. Therefore, the nitrogen content is 1 to 20 at%, more preferably 1 to 10 at%.
When , is there a magnetic alloy with high Bs and low He? ”
J is done.
したがって、Ｆ ｅｙ ＮＷＯＸ ＭＹなる式で示され
る川底の合金において、ｖ、ｗ、ｘ、ｙが次のような原
子％の時に優れた軟磁気特性を示す磁性合金が得られる
。Therefore, in Kawasoko's alloy represented by the formula F ey NWOX MY, a magnetic alloy exhibiting excellent soft magnetic properties can be obtained when v, w, x, and y are in the following atomic percentages.
即ち、
１≦ｗ≦２０
１≦ｘ≦２０
０．５ ≦ｙ≦６
ｖ ＋ ｗ ＋ ｘ ＋ ”ｆ −１００なる関係を満
たせばよい。That is, it is sufficient to satisfy the following relationships: 1≦w≦20 1≦x≦20 0.5≦y≦6 v + w + x + “f −100.
また、第２図には本発明の磁性合金と従来例である窒化
鉄合金の熱処理温度による保磁力（Ｈｅ）の変化を示す
。Further, FIG. 2 shows the change in coercive force (He) of the magnetic alloy of the present invention and a conventional iron nitride alloy depending on the heat treatment temperature.
この第２図から、本発明の磁性合金は、Ｈｃが小さく熱
安定性にも優れていることが分かる。From FIG. 2, it can be seen that the magnetic alloy of the present invention has a small Hc and excellent thermal stability.
ここで、ＴａおよびＮｂの含有量が０．５原子％未満で
あると、低Ｈｃ化と熱安定性の向上に対する顕著な効果
は見られず、６原子％を越えると高Ｂｓで且つ低Ｈｅで
あり熱安定性に優れた磁性合金を得ることができない。Here, when the content of Ta and Nb is less than 0.5 at%, no remarkable effect on lowering Hc and improving thermal stability is observed, and when it exceeds 6 at%, high Bs and low He Therefore, it is not possible to obtain a magnetic alloy with excellent thermal stability.
また、Ｔｔ、Ｃｒ、Ｃｏ、Ｃｕ、Ｇａ、Ｍｏ。Also, Tt, Cr, Co, Cu, Ga, Mo.
Ｒｕ、Ｒｈ、Ｐｄ、Ａｇ、Ｓｎ、Ｗ、Ｒｅ、Ｏｓ。Ru, Rh, Pd, Ag, Sn, W, Re, Os.
Ｉｒ、Ｐｔ、Ａｕ，Ａｌ，Ｓｉ，Ｃ，Ｖ、Ｎｉ。Ir, Pt, Au, Al, Si, C, V, Ni.
Ｚｒ、Ｈｆ、Ｂ、Ｇｅ、Ｙ、Ｓｂ、Ｐｂの合計の含有量
が０３原子％未満であると、これらの元素の顕著な効果
が見られず、３原子％を越えると高Ｂｓと低Ｈｅを達成
できなくなる。If the total content of Zr, Hf, B, Ge, Y, Sb, and Pb is less than 0.3 at%, no significant effects of these elements will be observed, and if it exceeds 3 at%, high Bs and low He becomes impossible to achieve.
すなわち、その点をＦｅ−Ｔａ−Ｎ−０合金とＦｅ−Ｔ
ａ−Ｎ−０合金にＴｉ、Ｃｒ、Ｃｏ。That is, this point can be compared with Fe-Ta-N-0 alloy and Fe-T.
a-N-0 alloy with Ti, Cr, and Co.
Ｃｕ、Ｇａ、Ｍｏ、Ｒｕ、Ｒｈ、Ｐｄ、Ａｇ。Cu, Ga, Mo, Ru, Rh, Pd, Ag.
Ｓｎ、Ｗ、Ｒｅ、Ｏｓ、Ｉｒ、Ｐｔ、Ａｕ、ＡＩ。Sn, W, Re, Os, Ir, Pt, Au, AI.
Ｓｔ、Ｃ，Ｖ、Ｎｉ、Ｚｒ、Ｈｆ、Ｂ、Ｇｅ、Ｙ。St, C, V, Ni, Zr, Hf, B, Ge, Y.
ｓｂ、ｐｂを添加した時の耐蝕性の実験により確認した
。This was confirmed by an experiment of corrosion resistance when sb and pb were added.
表２はその実験結果である。なお。この実験は磁性合金
を６０’Ｃ−９０％の高温高湿中に放置し、１０００時
間経過後に腐蝕痕が見られないものを○、腐蝕痕が生じ
たものを×として耐蝕性を表わした。Table 2 shows the experimental results. In addition. In this experiment, magnetic alloys were left in a high temperature and high humidity environment at 60'C and 90%, and corrosion resistance was expressed as ○ if no corrosion marks were observed after 1000 hours, and × if corrosion marks were formed.
この表中、試料番号２１は比較例であるＦｅ−Ｎ合金、
試料番号２２はＦｅ−Ｔａ−Ｎ−０合金、試料番号２３
〜５１はＦｅ−Ｔａ−Ｎ−０合金に、Ｔ１、−Ｃｒ等の
元素を添加した合金であり、試料番号２２〜５１が本発
明磁性合金である。In this table, sample number 21 is a comparative example of Fe-N alloy,
Sample number 22 is Fe-Ta-N-0 alloy, sample number 23
-51 are alloys in which elements such as T1 and -Cr are added to the Fe-Ta-N-0 alloy, and sample numbers 22 to 51 are the magnetic alloys of the present invention.
（以下、余白） 表 ２ 従って、Ｔ ｉ、Ｃｒ、Ｃｏ、Ｃｕ、Ｇａ、ＭＯ。(Hereafter, margin) Table 2 Therefore, Ti, Cr, Co, Cu, Ga, MO.
Ｒｕ、 Ｒｈ、 Ｐｄ、 Ａｇ、 Ｓｎ、
Ｗ、 Ｒｅ、 Ｏｓ。Ru, Rh, Pd, Ag, Sn,
W, Re, Os.
Ｉｒ、 Ｐｔ、 Ａｕ、 ＡＩ、 Ｓｔ、
Ｃ，Ｖ、 Ｎｉ。Ir, Pt, Au, AI, St,
C, V, Ni.
Ｚｒ、Ｈｆ、Ｂ、Ｇｅ、Ｙ、Ｓｂ、Ｐｂの含有量は０．
３原子％〜３原子％の範囲であると良いことが分かる。The contents of Zr, Hf, B, Ge, Y, Sb, and Pb are 0.
It can be seen that a range of 3 atomic % to 3 atomic % is good.
従って、Ｆ ｅＶ Ｎｗ Ｏｘ Ｍｖ Ｌｚなる式て示
される組成の合金において、Ｖ 、 Ｗ ＳＸ ｓ Ｖ
ＳＺが次のような原子％の時に優れた軟磁気特性を示
し、１つ耐蝕性の優れた磁性合金が得られる。Therefore, in an alloy with a composition represented by the formula F eV Nw Ox Mv Lz, V , W SX s V
When SZ is in the following atomic %, a magnetic alloy exhibiting excellent soft magnetic properties and excellent corrosion resistance can be obtained.
１≦ｗ≦２０
１≦ｘ≦２０
０．５≦ｙ≦６
０．３≦２≦３
ｖ ＋ｗ＋ ｘ ＋ ｙ ＋ ｚ瑠１００また、本発明
の磁性合金と、他の軟磁性材（センダスト等）とを交互
に積層して、多層構造とすることにより、更に保磁力の
低下が期待できるが、本発明になる磁性合金だけの単層
構造でも優れた磁気特性を有する磁性合金が得られる。1≦w≦20 1≦x≦20 0.5≦y≦6 0.3≦2≦3 v +w+ ) can be expected to further reduce the coercive force by alternately laminating them to form a multilayer structure, but even with a single layer structure of only the magnetic alloy of the present invention, a magnetic alloy with excellent magnetic properties can be obtained.
（発明の効果）
本発明は、以上のような組成式の磁性合金にすることに
より、更に、耐蝕性と熱安定性の優れた磁気ヘッド用磁
性合金が得られる。従って、本発明の磁性合金を用いれ
ば、高保磁力磁気媒体への良好な記録再生が行え、高密
度磁気記録再生が実現できる。(Effects of the Invention) According to the present invention, by using a magnetic alloy having the compositional formula as described above, a magnetic alloy for a magnetic head having further excellent corrosion resistance and thermal stability can be obtained. Therefore, by using the magnetic alloy of the present invention, it is possible to perform good recording and reproduction on a high coercive force magnetic medium, and realize high-density magnetic recording and reproduction.
第１図は本発明の磁性合金を製造する装置の一例である
スパッタ装置の概略図、第２図は本発明の磁性合金と従
来例である窒化鉄合金の熱処理温度によるＨｃの変化を
示す図である。
特許出願人 日本ビクター株式会社
代表者 板木 邦人
１ＵｉＪ
實
〜〔
さハ
ど＼
＜Ｊ（１
第Ｑ
手続補正書
平成２年５月／Ｉ ｌ−１
１、事件の表示
平成２年特許願第１．９４８０号
２、発明の名称
磁性合金
３、補正をする者
事件との関係 特許出願人
住所 神奈川県横浜市神奈用区守屋町３丁口１２番地４
、補正命令の日付
自発補正
５、補正の対象
明細書の発明の詳細な説明の欄
６、補正の内容
（１）明細書第１２頁第１２行〜第１３行記載の「高Ｂ
ｓと」を削除する。
以上Fig. 1 is a schematic diagram of a sputtering apparatus which is an example of an apparatus for manufacturing the magnetic alloy of the present invention, and Fig. 2 is a diagram showing the change in Hc depending on the heat treatment temperature of the magnetic alloy of the present invention and a conventional iron nitride alloy. It is. Patent Applicant Representative of Victor Japan Co., Ltd. Itaki Japanese 1UiJ Real ~ [ Sahad \ <J (1. 1.9480 No. 2, Name of the invention Magnetic alloy 3, Relationship to the amended case Patent applicant address 3-12-4 Moriya-cho, Kanayō-ku, Yokohama-shi, Kanagawa Prefecture
, Date of amendment order Voluntary amendment 5, Detailed explanation of the invention column 6 of the specification subject to amendment, Contents of amendment (1) "High B" stated in lines 12 to 13 of page 12 of the specification
Delete "s and". that's all
Claims (1)
れ、ｖ，ｗ，ｘ，ｙで示される原子％は １≦ｗ≦２０ １≦ｘ≦２０ ０．５≦ｙ≦６ ｖ＋ｗ＋ｘ＋ｙ＝１００ なる関係を有する磁性合金。（但しＭはＴａ，Ｎｂ，ま
たはＴａとＮｂの混合物） （２）Ｆｅ＿ＶＮ＿ＷＯ＿ＸＭ＿ＹＬ＿Ｚなる組成式で
表わされ、ｖ，ｗ，ｘ，ｙ，ｚで示される原子％は１≦
ｗ≦２０ １≦ｘ≦２０ ０．５≦ｙ≦６ ０．３≦ｚ≦３ ｖ＋ｗ＋ｘ＋ｙ＋ｚ＝１００ なる関係を有する磁性合金。（但しＭはＴａまたはＮｂ
またはＴａとＮｂの混合物であり、ＬはＴｉ，Ｃｒ，Ｃ
ｏ，Ｃｕ，Ｇａ，Ｍｏ，Ｒｕ，Ｒｈ，Ｐｄ，Ａｇ，Ｓｎ
，Ｗ，Ｒｅ，Ｏｓ，Ｉｒ，Ｐｔ，Ａｕ，Ａｌ，Ｓｉ，Ｃ
，Ｖ，Ｎｉ，Ｚｒ，Ｈｆ，Ｂ，Ｇｅ，Ｙ，Ｓｂ，Ｐｂな
る群の中から選ばれた少なくとも１種類以上の元素）[Claims] (1) It is represented by the compositional formula Fe_VN_WO_XM_Y, and the atomic % represented by v, w, x, and y is 1≦w≦20 1≦x≦20 0.5≦y≦6 v+w+x+y= A magnetic alloy having a relationship of 100. (However, M is Ta, Nb, or a mixture of Ta and Nb) (2) It is represented by the composition formula Fe_VN_WO_XM_YL_Z, and the atomic % represented by v, w, x, y, and z is 1≦
A magnetic alloy having the following relationships: w≦20 1≦x≦20 0.5≦y≦6 0.3≦z≦3 v+w+x+y+z=100. (However, M is Ta or Nb
Or it is a mixture of Ta and Nb, and L is Ti, Cr, C
o, Cu, Ga, Mo, Ru, Rh, Pd, Ag, Sn
, W, Re, Os, Ir, Pt, Au, Al, Si, C
, V, Ni, Zr, Hf, B, Ge, Y, Sb, Pb)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019480A JPH07113140B2 (en) | 1989-02-16 | 1990-01-30 | Magnetic alloy |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1-35071 | 1989-02-16 | ||
| JP3507189 | 1989-02-16 | ||
| JP2019480A JPH07113140B2 (en) | 1989-02-16 | 1990-01-30 | Magnetic alloy |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02298238A true JPH02298238A (en) | 1990-12-10 |
| JPH07113140B2 JPH07113140B2 (en) | 1995-12-06 |
Family
ID=26356308
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019480A Expired - Lifetime JPH07113140B2 (en) | 1989-02-16 | 1990-01-30 | Magnetic alloy |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07113140B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03232206A (en) * | 1989-04-12 | 1991-10-16 | Sony Corp | Soft magnetic thin film |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62158306A (en) * | 1986-01-07 | 1987-07-14 | Hitachi Ltd | High density iron system magnetic material film and manufacture thereof |
-
1990
- 1990-01-30 JP JP2019480A patent/JPH07113140B2/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62158306A (en) * | 1986-01-07 | 1987-07-14 | Hitachi Ltd | High density iron system magnetic material film and manufacture thereof |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03232206A (en) * | 1989-04-12 | 1991-10-16 | Sony Corp | Soft magnetic thin film |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH07113140B2 (en) | 1995-12-06 |
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