JPH02199027A - Magnetic alloy - Google Patents
Magnetic alloyInfo
- Publication number
- JPH02199027A JPH02199027A JP1020165A JP2016589A JPH02199027A JP H02199027 A JPH02199027 A JP H02199027A JP 1020165 A JP1020165 A JP 1020165A JP 2016589 A JP2016589 A JP 2016589A JP H02199027 A JPH02199027 A JP H02199027A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- alloy
- target
- magnetic alloy
- coercive force
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910001004 magnetic alloy Inorganic materials 0.000 title claims abstract description 26
- 229910052735 hafnium Inorganic materials 0.000 claims abstract description 12
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 11
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 10
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 4
- 239000000203 mixture Substances 0.000 claims description 5
- 230000000737 periodic effect Effects 0.000 claims description 4
- 229910045601 alloy Inorganic materials 0.000 abstract description 19
- 239000000956 alloy Substances 0.000 abstract description 19
- 230000004907 flux Effects 0.000 abstract description 11
- 229920006395 saturated elastomer Polymers 0.000 abstract 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 14
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 14
- 229910052760 oxygen Inorganic materials 0.000 description 13
- 239000001301 oxygen Substances 0.000 description 13
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 238000005260 corrosion Methods 0.000 description 7
- 230000007797 corrosion Effects 0.000 description 7
- 229910052707 ruthenium Inorganic materials 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 229910052742 iron Inorganic materials 0.000 description 5
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 229910000702 sendust Inorganic materials 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000696 magnetic material Substances 0.000 description 3
- 239000002131 composite material Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 230000005415 magnetization Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- -1 Fe-3i Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910001337 iron nitride Inorganic materials 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 238000001420 photoelectron spectroscopy Methods 0.000 description 1
- 238000004445 quantitative analysis Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
- H01F1/01—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
- H01F1/03—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
- H01F1/12—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials
- H01F1/34—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials non-metallic substances, e.g. ferrites
- H01F1/342—Oxides
Landscapes
- Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Compounds Of Iron (AREA)
- Soft Magnetic Materials (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、特に高密度磁気記録用の磁気ヘッドに適する
磁性合金に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a magnetic alloy particularly suitable for a magnetic head for high-density magnetic recording.
（従来の技術）
近年、磁気記録の高密度化や広帯域化の必要性が高まり
、磁気記録媒体に高い抗磁力を有する磁性材料を使用し
て記録トラック幅を狭くすることにより、高密度記録再
生を実現している。(Prior art) In recent years, the need for higher density and wider band magnetic recording has increased, and high-density recording and reproduction is possible by narrowing the recording track width by using magnetic materials with high coercive force in magnetic recording media. has been realized.
そして、この高い抗磁力を持つ磁気記録媒体に記録再生
するための磁気ヘッド材料として、飽和磁束密度の高い
磁性合金が必要とされており、センダスト合金や非晶質
合金等をコアの一部または全部に使用した磁気ヘッドが
提案されている。Magnetic alloys with high saturation magnetic flux density are required as magnetic head materials for recording and reproducing on magnetic recording media with high coercive force, and sendust alloys and amorphous alloys are used as part of the core or A magnetic head has been proposed for use in all areas.
しかしながら、磁気記録媒体の高抗磁力化が一段と進み
、抗磁力が２００００ ｅ以上になるとセンダスト合金
や非晶質合金を使用した磁気ヘッドでは良好な磁気記録
再生が困誼になった。However, as the coercive force of magnetic recording media continues to increase and the coercive force exceeds 20,000 e, it becomes difficult to achieve good magnetic recording and reproduction with magnetic heads using sendust alloys or amorphous alloys.
また、磁気記録媒体の長平方向ではなく、厚さ方向に磁
化して記録する垂直磁化記録方式も提案されているが、
この垂直磁化記録方式を良好に行うには、磁気ヘッドの
主［極の先端部の厚さを０．５μｍ以下にする必要があ
り、比較的抗磁力の低い磁気記録媒体に記録するのにも
、高い飽和磁束密度を持つ磁気ヘッドが必要とされてい
る。Additionally, a perpendicular magnetization recording method has been proposed in which the magnetic recording medium is magnetized in the thickness direction instead of in the longitudinal direction.
In order to successfully perform this perpendicular magnetization recording method, the thickness of the tip of the main pole of the magnetic head must be 0.5 μm or less, which is suitable for recording on magnetic recording media with relatively low coercive force. , a magnetic head with high saturation magnetic flux density is required.
そして、センダスト合金や非晶質合金等よりも飽和磁束
密度の高い磁気ヘッド用合金として窒化鉄、Ｆｅ−３ｉ
系合金等の鉄を主成分とした磁性合金が知られている。Iron nitride, Fe-3i, and other alloys for magnetic heads have higher saturation magnetic flux density than sendust alloys, amorphous alloys, etc.
Magnetic alloys containing iron as a main component such as alloys are known.
（発明が解決しようとする課題）
ところが、従来より知られている高飽和磁束密度の磁性
合金は、保磁力が大きくそのままでは磁気ヘッドの材料
としては不十分であるので、センダスト合金やパーマロ
イ等の保磁力の小さい磁性材料を層間膜として使用した
多層膜構造の磁気ヘッドが提案されている。(Problem to be Solved by the Invention) However, conventionally known magnetic alloys with high saturation magnetic flux density have a large coercive force and are not sufficient as materials for magnetic heads as they are. A magnetic head with a multilayer structure using a magnetic material with a low coercive force as an interlayer film has been proposed.
しかし、多層ＷＡ４Ｗ３ｆｉにするには工数やコストが
かかり、ｆ８顆性を保つのも難しいという問題があった
。特に、数μ１以上の膜厚にする為には場合によっては
１００層以上の多層膜構造にする必要があり、使用範囲
も限られていた。However, there were problems in that creating a multilayer WA4W3FI required many man-hours and costs, and it was difficult to maintain f8 condylarity. In particular, in order to obtain a film thickness of several micrometers or more, a multilayer film structure of 100 or more layers may be required, which limits the range of use.
そこで、本発明は多Ｍ構造にしなくても高飽和磁束密度
を持ち、且つ保磁力の小さい磁性合金を提供することを
、目的とする。Therefore, an object of the present invention is to provide a magnetic alloy that has a high saturation magnetic flux density without having a multi-M structure and has a small coercive force.
（課題を解決するための手段）
本発明は上記課題に鑑みてなされたものでありＦ”ｅ、
ＭｘＯ，なる組成式で表わされ、ｗ、ｘ。(Means for Solving the Problems) The present invention has been made in view of the above problems, and includes:
It is represented by the compositional formula MxO, where w, x.
ｙで示される原子％は
６５≦ｗ≦９７．５
０．５≦ｘ≦１５
２≦ｙ≦２０
ｗ ＋ｘ 十ｙ ＝ １００
なる関係を有し、但しＭは元素周期律表ＩＶ ａ族また
はＶａ族の元素であるＺｒ 、 Ｈｆ 、 Ｔａ 、
Ｎｂのいずれか１種または２種類以上含む磁性合金、ま
たは、ＦｅｖＩＭｘＯ，Ｒｕ２なる組成式で表わされ、
ｗ、ｘ、ｙ、ｚで示される原子％は６５≦ｗ≦９７．２
０．５≦ｘ≦１４．７
２≦ｙ≦２０
０．３≦Ｚ
０．８≦ｘ十ｚ≦１５
ｗ十ｘ＋ｙ＋ｚ＝１００
なる関係を有し、但しＭは元素周期律表ＩＶａ族または
Ｖａ族の元素であるＺｒ、Ｈｆ、’Ｉ’ａ、Ｎｂのいず
れか１種または２種類以上を含む磁性合金をそれぞれ提
供するものである。The atomic % indicated by y has the following relationship: 65≦w≦97.5 0.5≦x≦15 2≦y≦20 w + Group elements Zr, Hf, Ta,
A magnetic alloy containing one or more types of Nb, or represented by the composition formula FevIMxO, Ru2,
The atomic percentages indicated by w, x, y, and z are 65≦w≦97.2 0.5≦x≦14.7 2≦y≦20 0.3≦Z 0.8≦x10z≦15 w10 x+y+z=100, where M is a magnetic alloy containing one or more of Zr, Hf, 'I'a, and Nb, which are elements of Group IVa or Group Va of the Periodic Table of Elements, respectively. This is what we provide.
（実 施 例）
本発明の磁性合金を説明するに先立ってその製造装置の
一例を第１図に示す。(Example) Before explaining the magnetic alloy of the present invention, an example of a manufacturing apparatus is shown in FIG. 1.
一対のターゲット５．５は鉄（Ｆｅ）と元素周期律表Ｉ
Ｖ ａ族の元素であるジルコニウム（Ｚｒ ） 。A pair of targets 5.5 are iron (Fe) and element I of the periodic table.
Zirconium (Zr) is a group Va element.
ハフニウム（Ｈｆ）、タンタル（Ｔａ ）またはニオブ
（Ｎｂ ）のいずれかの合金ターゲットか、或いは適当
な凹部を設けた純鉄のターゲットの凹部にチップ状のＺ
ｒ 、 Ｈｆ 、 Ｔａ 、またはＮｂをはめ込んだ複
合ターゲットである。このターゲット５．５はターゲッ
トホルダー９によって支えられており、このターゲット
５とターゲットホルダー９には、直流電源１３よりマイ
ナス電位が印加され、さらにこのターゲットホルダー９
の周囲にはシールド４が取り付けである。A chip-shaped Z
It is a composite target inlaid with r, Hf, Ta, or Nb. The target 5.5 is supported by a target holder 9, and a negative potential is applied to the target 5 and the target holder 9 from a DC power supply 13.
A shield 4 is attached around the .
また、このターゲットホルダー９の内部には、両ターゲ
ット５．５間にプラズマ１４を集束するための磁石６．
６が挿入され、かつターゲット５の表面の加熱を防ぐた
めに冷却水８が流入している。Moreover, inside this target holder 9, a magnet 6.5 for focusing the plasma 14 between both targets 5.5.
6 is inserted, and cooling water 8 flows in to prevent the surface of the target 5 from heating.
そして、接地された真空槽３の左右に、２個のターゲッ
トホルダー９が絶縁体７によって絶縁されて設けられて
いる。Two target holders 9 are provided on the left and right sides of the grounded vacuum chamber 3 and are insulated by an insulator 7.
また、この真空ＷＪ３の上部より、酸素（０２）、アル
ゴン（Ａｒ）がそれぞれ流量計１〜２により、所定の流
量に調節されて導入されている。Further, oxygen (02) and argon (Ar) are introduced from the upper part of the vacuum WJ3, each of which is adjusted to a predetermined flow rate by flowmeters 1 and 2.
なお、アルゴンは、ターゲット５をスパッタすると同時
に成膜する磁性合金膜中の酸素の量を調節するためのも
のである。Note that argon is used to adjust the amount of oxygen in the magnetic alloy film formed at the same time as the target 5 is sputtered.
そして、真空槽３の下部には、基板ホルダー１２上に基
板１１が置かれ、不純物を防ぐためのシャッター１０が
基板１１を覆っている。A substrate 11 is placed on a substrate holder 12 at the bottom of the vacuum chamber 3, and a shutter 10 for preventing impurities covers the substrate 11.
このようなスパッタ装置において、直流電源１３により
、左右のターゲットボルダ−９に支えられたターゲット
５．５の間にプラズマ１４を発生させると、ターゲット
５はマイナス電位であるので、プラズマ１４中のアルゴ
ンイオン（Ａｒ ”）がターゲット５に衝突し、ターゲ
ット５の鉄原子が飛び出ず、そして、ターゲット５から
飛び出した鉄原子と、プラズマ中の酸素の原子または分
子とが結合して、基板１１の上に成長していく。In such a sputtering apparatus, when a plasma 14 is generated between the targets 5.5 supported by the left and right target boulders 9 by the DC power supply 13, the argon in the plasma 14 is generated because the target 5 has a negative potential. The ions (Ar'') collide with the target 5, the iron atoms of the target 5 do not fly out, and the iron atoms that fly out of the target 5 combine with oxygen atoms or molecules in the plasma to form a layer on the substrate 11. It grows into
なお、スパッタ開始後の数分間は、シャッター１０を閉
じて基板１１を覆うことにより、ターゲット５の表面の
不純物が基板１１の上に付かないようにし、その後でシ
ャッター１０を開けるようにする。Note that for several minutes after the start of sputtering, the shutter 10 is closed to cover the substrate 11 to prevent impurities on the surface of the target 5 from adhering to the substrate 11, and then the shutter 10 is opened.
そして、流量計１〜２にて酸素、アルゴンの導入量を調
節することにより、所望の酸素を゛含んだＦｅ Ｍ
Ｏなる組成式の合金を得ることかで ｘ ｙ
きる、（但し、ＭはＺｒ 、 Ｈｆ 、 Ｔａ 、また
はＮｂの一種類以上の元素を示す）
このようにして得たＦｅ、ＭｘＯ，なる組成式の合金の
酸素およびＺｒ 、 Ｈｆ 、 Ｔａ 、またはＮｂの
含有量と飽和磁束密度（Ｂｓ）、保磁力（Ｈｃ ）との
関係を表に示す。Then, by adjusting the amount of oxygen and argon introduced using flowmeters 1 and 2, FeM containing desired oxygen is
x y can be obtained by obtaining an alloy with the composition formula O (where M represents one or more elements of Zr, Hf, Ta, or Nb). The table shows the relationship between the content of oxygen and Zr, Hf, Ta, or Nb and the saturation magnetic flux density (Bs) and coercive force (Hc) of the alloy.
（以下、余白、）
表は酸素およびＺｒ、Ｈｆ、Ｔａ、またはＮｂの含有量
と飽和磁束密度（Ｂｓ）、保磁力（Ｈｃ）とのｒ３Ａ係
を示す表であり、含有量はＥＳＣＡ （Ｘ線光電子分光
分析法）、ＥＰＭＡＣＸ線マイクロアナライザ法）等に
よる定量分析で原子％（ａｔ％）で表している。この内
、試料番号１は鉄のみの場合の結果であり、試料番号２
は鉄に酸素のみを含有させた時の結果である。この表か
ら、鉄とＺｒ、Ｈｆ、Ｔａ、またはＮｂの合金に酸素を
適量添加することによりＨｃが低下し、優れた軟磁気特
性を示すようになっているのが判る。また、Ｚｒ 、
Ｈｆ 、 Ｔａ 、またはＮｂの含有量が増加すると磁
性合金の飽和磁束密度（Ｂｓ）が低下する。Ｚｒ 、
Ｈｆ 、 Ｔａ 、またはＮｂの含有量が１５原子％以
下であればＢｓが１０に６以上の高飽和磁束密度を持つ
磁性合金が得られる。(Hereinafter referred to as margins) The table shows the r3A relationship between the content of oxygen, Zr, Hf, Ta, or Nb, saturation magnetic flux density (Bs), and coercive force (Hc). It is expressed in atomic % (at%) by quantitative analysis by ray photoelectron spectroscopy), EPMAC X-ray microanalyzer method), etc. Among these, sample number 1 is the result for iron only, sample number 2
is the result when iron contains only oxygen. From this table, it can be seen that by adding an appropriate amount of oxygen to an alloy of iron and Zr, Hf, Ta, or Nb, Hc is lowered and the alloy exhibits excellent soft magnetic properties. Also, Zr,
As the content of Hf, Ta, or Nb increases, the saturation magnetic flux density (Bs) of the magnetic alloy decreases. Zr,
If the content of Hf, Ta, or Nb is 15 atomic % or less, a magnetic alloy having a high saturation magnetic flux density with Bs of 6 in 10 or more can be obtained.
ここで、酸素の含有量が１原子％未溝であると、顕著な
酸素の効果がみられずＨＣはほとんど低下しない。また
、酸素の含有量が２０原子％を越えると軟磁気特性が大
幅に劣化し、Ｂｓの低下とＨｃの増大が起こる。したが
って、実験値より酸素の含有量が２〜２０原子％、さら
に好ましくは３〜１２原子％であるとＢＳが高くかつＩ
Ｃの小さい磁性合金が得られる。Here, if the oxygen content is 1 atomic %, no significant effect of oxygen is observed and HC hardly decreases. Furthermore, when the oxygen content exceeds 20 at %, the soft magnetic properties are significantly deteriorated, resulting in a decrease in Bs and an increase in Hc. Therefore, according to the experimental values, when the oxygen content is 2 to 20 at%, more preferably 3 to 12 at%, the BS is high and the I
A magnetic alloy with low carbon content is obtained.
従って、ＦｅｗＭｘＯ，なる式で示される組成の合金に
おいて、ｗ、ｘ、ｙが次のような原子％の時に優れた軟
磁気特性を示す磁性合金が得られる。Therefore, in an alloy having a composition expressed by the formula FewMxO, a magnetic alloy exhibiting excellent soft magnetic properties can be obtained when w, x, and y are in the following atomic percentages.
即ち、 ６５≦ｗ≦９７．５ ０．５≦ｘ≦１５ ２≦ｙ≦２０ ｗ４−ｘ＋ｙ＝１００ なる関係を満せばよい。That is, 65≦w≦97.5 0.5≦x≦15 2≦y≦20 w4-x+y=100 All you have to do is satisfy the following relationship.
また、ターゲット５をＦｅとＲｕ（ルテニウム）とＺｒ
とＮｂ、Ｔａ、、ｉたはＨｆの合金ターゲーｙトか、或
いは適当な凹部を設けた純鉄のターゲ・ントの凹部にチ
ップ状のＲｕとＺｒ、Ｎｂ、Ｔａ。In addition, the target 5 is Fe, Ru (ruthenium), and Zr.
Chips of Ru, Zr, Nb, and Ta are placed in the recesses of a pure iron target prepared with an appropriate recess.
またはＨｆのいずれかをはめ込んだ複合ターゲ・／トを
用いて上記と同様にスパッタを行うことに・より、Ｆ
ｅ Ｍ ＯＲｕ ｚ合金を得ることができＷ
ｘ ｙ
る。Or by performing sputtering in the same manner as above using a composite target in which either Hf is embedded.
e M ORu z alloy can be obtained W
x y Ru.
上記Ｆｅ、ＭｘＯ，合金および
Ｐｃ Ｍ ＯＲｕ 合金を２％塩水に浸した後、
ｗｘｙ ｚ
これを取り出し、更に６０℃〜９０％の高温高湿中で耐
蝕試験を行った結果を第２図に示す。第２図は、本発明
の磁性合金とＲｕの含有量による耐蝕性の違いを表す図
である。なお、図中、縦軸は成膜直後のＢｓ （Ｉ３
ｓ（０） ）に対する耐蝕試験開始後のＢｓ （Ｂｓ
（ｔ））の割合を示す。After soaking the above Fe, MxO, alloy and Pc M ORu alloy in 2% salt water,
wxy z This was taken out and further subjected to a corrosion resistance test at a high temperature and high humidity of 60° C. to 90%. The results are shown in FIG. FIG. 2 is a diagram showing the difference in corrosion resistance between the magnetic alloy of the present invention and the Ru content. In addition, in the figure, the vertical axis is Bs (I3
Bs (Bs
(t)).
この第２図から、これらの合金にルテニウムを適量添加
することによって、耐蝕性が向上することが判る、さら
に、酸素が含まれている場合、ルテニウムの含有量が少
ないと耐蝕性は逆に悪くなるということを第２図は示し
ている。また、ルテニウムはＨｃを低下させる効果も認
められる。従って、Ｆｅ Ｍ ＯＲｕ２なる式で示
される組Ｗ ｘ Ｖ
成の合金において、ｗ、ｘ、ｙ、ｚが次のような原子％
の時に優れた軟磁気特性を示し、且つ耐蝕性の優れた磁
性合金が得られることが確認できた。From this figure 2, it can be seen that corrosion resistance is improved by adding an appropriate amount of ruthenium to these alloys.Furthermore, when oxygen is included, corrosion resistance becomes worse if the ruthenium content is small. Figure 2 shows that. Furthermore, ruthenium is also recognized to have the effect of lowering Hc. Therefore, in an alloy with the set W x V represented by the formula Fe M ORu2, w, x, y, and z have the following atomic %
It was confirmed that a magnetic alloy with excellent soft magnetic properties and excellent corrosion resistance could be obtained.
６５≦ｗ≦９７．２
０．５≦ｘ≦１４．７
２≦ｙ≦２０
０．３≦Ｚ
０．８≦ｘ＋Ｚ≦１５
ｗ＋ｘ＋ｙ＋ｚ＝１００
（発明の効果）
以上のような組成式の磁性合金にすることにより高飽和
磁束密度を有し、且つ低保磁力であり、更に、耐蝕性の
優れた磁気ヘッド用磁性合金が得られる。従って、本発
明の磁性合金を用いれば、高保磁力磁気媒体への良好な
記録再生が行え、高密度磁気記録再生が実現できる。65≦w≦97.2 0.5≦x≦14.7 2≦y≦20 0.3≦Z 0.8≦x+Z≦15 w+x+y+z=100 (Effect of the invention) Magnetic alloy with the above composition formula By doing so, a magnetic alloy for a magnetic head having a high saturation magnetic flux density, a low coercive force, and excellent corrosion resistance can be obtained. Therefore, by using the magnetic alloy of the present invention, it is possible to perform good recording and reproduction on a high coercive force magnetic medium, and realize high-density magnetic recording and reproduction.
また、本発明の磁性合金と、他の軟磁性材（センダスト
等）とを交互に積層して、多層１３ｆｉとすることによ
り、さらに保磁力の低下が期待できるが、本発明の磁性
合金だけの単層構造でも優れた磁気特性を有する磁性合
金が得られる。Moreover, by alternately laminating the magnetic alloy of the present invention and other soft magnetic materials (Sendust, etc.) to form a multilayer 13fi, further reduction in coercive force can be expected; Even with a single layer structure, a magnetic alloy with excellent magnetic properties can be obtained.
第１図は本発明の磁性合金の製造法の一例であるスパッ
タ装置の概略図、第２図は本発明の磁性合金のＲｕの含
有量による耐蝕性の違いを表す図である。FIG. 1 is a schematic diagram of a sputtering apparatus which is an example of the method for manufacturing the magnetic alloy of the present invention, and FIG. 2 is a diagram showing the difference in corrosion resistance depending on the Ru content of the magnetic alloy of the present invention.
Claims (1)
，ｘ，ｙで示される原子％は ６５≦ｗ≦９７．５ ０．５≦ｘ≦１５ ２≦ｙ≦２０ ｗ＋ｘ＋ｙ＝１００ なる関係を有し、但しＭは元素周期律表IVａ族またはＶ
ａ族の元素であるＺｒ，Ｈｆ，Ｔａ，Ｎｂのいずれか１
種または２種類以上含む磁性合金。 （２）Ｆｅ＿ｗＭ＿ｘＲｕ＿ｚる組成式で表わされ、ｗ
，ｘ，ｙ，ｚで示される原子％は ６５≦ｗ≦９７．２ ０．５≦ｘ≦１４．７ ２≦ｙ≦２０ ０．３≦Ｚ ０．８≦ｘ＋ｚ≦１５ ｗ＋ｘ＋ｙ＋ｚ＝１００ な関係を有し、但しＭは元素周期律表IVａ族またはＶａ
族の元素であるＺｒ，Ｈｆ，Ｔａ，Ｎｂのいずれか１種
または２種類以上を含む磁性合金。[Claims] (1) Represented by the compositional formula Fe_wM_xO_y, w
, x, y have the following relationships: 65≦w≦97.5 0.5≦x≦15 2≦y≦20 w+x+y=100, where M is an element from group IVa of the periodic table or V
Any one of group a elements Zr, Hf, Ta, and Nb
A magnetic alloy containing a species or two or more species. (2) It is expressed by the composition formula Fe_wM_xRu_z, w
, x, y, and z have the following relationships: 65≦w≦97.2 0.5≦x≦14.7 2≦y≦20 0.3≦Z 0.8≦x+z≦15 w+x+y+z=100 , where M is a group IVa of the periodic table of elements or Va
A magnetic alloy containing one or more of the group elements Zr, Hf, Ta, and Nb.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1020165A JPH02199027A (en) | 1989-01-30 | 1989-01-30 | Magnetic alloy |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1020165A JPH02199027A (en) | 1989-01-30 | 1989-01-30 | Magnetic alloy |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02199027A true JPH02199027A (en) | 1990-08-07 |
Family
ID=12019546
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1020165A Pending JPH02199027A (en) | 1989-01-30 | 1989-01-30 | Magnetic alloy |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02199027A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5302469A (en) * | 1990-05-22 | 1994-04-12 | Tdk Corporation | Soft magnetic thin film |
| US5573863A (en) * | 1993-03-05 | 1996-11-12 | Alps Electric Co., Ltd. | Soft magnetic alloy and plane magnetic element |
| US6171716B1 (en) | 1998-05-26 | 2001-01-09 | Alps Electric Co., Ltd. | Soft magnetic film, and thin film magnetic head, planer magnetic element, and filter using the soft magnetic film |
-
1989
- 1989-01-30 JP JP1020165A patent/JPH02199027A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5302469A (en) * | 1990-05-22 | 1994-04-12 | Tdk Corporation | Soft magnetic thin film |
| US5573863A (en) * | 1993-03-05 | 1996-11-12 | Alps Electric Co., Ltd. | Soft magnetic alloy and plane magnetic element |
| US6171716B1 (en) | 1998-05-26 | 2001-01-09 | Alps Electric Co., Ltd. | Soft magnetic film, and thin film magnetic head, planer magnetic element, and filter using the soft magnetic film |
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