JPH03270204A - Magnetic alloy - Google Patents
Magnetic alloyInfo
- Publication number
- JPH03270204A JPH03270204A JP2071287A JP7128790A JPH03270204A JP H03270204 A JPH03270204 A JP H03270204A JP 2071287 A JP2071287 A JP 2071287A JP 7128790 A JP7128790 A JP 7128790A JP H03270204 A JPH03270204 A JP H03270204A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- coercive force
- magnetic alloy
- alloy
- atomic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910001004 magnetic alloy Inorganic materials 0.000 title abstract description 29
- 230000004907 flux Effects 0.000 abstract description 10
- 239000000203 mixture Substances 0.000 abstract description 5
- 230000035699 permeability Effects 0.000 abstract description 5
- 238000005260 corrosion Methods 0.000 abstract description 3
- 230000007797 corrosion Effects 0.000 abstract description 3
- 239000010409 thin film Substances 0.000 abstract description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 25
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 12
- 229910052757 nitrogen Inorganic materials 0.000 description 12
- 229910045601 alloy Inorganic materials 0.000 description 11
- 239000000956 alloy Substances 0.000 description 11
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 9
- 239000001301 oxygen Substances 0.000 description 9
- 229910052760 oxygen Inorganic materials 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 3
- 229910001337 iron nitride Inorganic materials 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910000702 sendust Inorganic materials 0.000 description 3
- 229910020641 Co Zr Inorganic materials 0.000 description 2
- 229910020520 Co—Zr Inorganic materials 0.000 description 2
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 230000005415 magnetization Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052702 rhenium Inorganic materials 0.000 description 2
- 229910000979 O alloy Inorganic materials 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- -1 argon ions Chemical class 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000004453 electron probe microanalysis Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 229940110728 nitrogen / oxygen Drugs 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000004445 quantitative analysis Methods 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- Compounds Of Iron (AREA)
- Soft Magnetic Materials (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、高密度磁気記録用の磁気ヘッドに適する磁性
合金に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a magnetic alloy suitable for a magnetic head for high-density magnetic recording.
（従来の技術）
近年、磁気記録の高密度化や広帯域化の必要性が高まり
、磁気記録媒体に高い抗磁力を有する磁性材料を使用し
て記録トラック幅を狭くすることにより、高密度磁気記
録再生を実現している。そして、この高い抗磁力をもつ
磁気記録媒体に記録再生するするための磁気ヘッド材料
として、飽和磁束密度Ｂｓの高い磁、性合金が必要とさ
れており、センダスト合金やＣｏ−Ｚｒ系非晶質合金等
をコアの一部または全部に使用した磁気ヘッドが提案さ
れている。(Prior art) In recent years, the need for higher density and wider band magnetic recording has increased, and high-density magnetic recording has been achieved by narrowing the recording track width by using magnetic materials with high coercive force in magnetic recording media. Achieving regeneration. As magnetic head materials for recording and reproducing information on magnetic recording media with high coercive force, magnetic alloys with high saturation magnetic flux density Bs are required, and sendust alloys and Co-Zr amorphous materials are needed. Magnetic heads using alloys or the like for part or all of the core have been proposed.
然しなから、磁気記録媒体の高抗磁力化が一段と進み、
磁気記録媒体の抗磁力が２００００ ｅ以上になると、
センダスト合金やＣｏ−Ｚｒ系非晶質合金を使用した磁
気ヘッドでは良好な磁気記録再生が困難になった。However, as the coercive force of magnetic recording media continues to increase,
When the coercive force of the magnetic recording medium becomes 20,000 e or more,
It has become difficult to achieve good magnetic recording and reproduction with magnetic heads using sendust alloys or Co-Zr amorphous alloys.
又、磁気記録媒体の長手方向ではなく、厚さ方向に磁化
して記録する垂直磁化記録方式も提案されているが、こ
の垂直磁化記録方式を良好に行うには、磁気ヘッドの主
磁極の先端部の厚さを０．５μｍ以下にする必要があり
、比較的抗磁力の低い磁気記録媒体に記録するにも、高
い飽和磁束密度を持つ磁気ヘッド用磁性合金が必要にな
る。Also, a perpendicular magnetization recording method has been proposed in which the magnetic recording medium is magnetized in the thickness direction rather than in the longitudinal direction, but in order to perform well with this perpendicular magnetization recording method, the tip of the main pole of the magnetic head must be The thickness of the magnetic head must be 0.5 μm or less, and a magnetic alloy for a magnetic head with a high saturation magnetic flux density is required even for recording on a magnetic recording medium with relatively low coercive force.
そして、センダスト合金やＣｏ−Ｚｒ系非晶質合金より
も飽和磁束密度Ｂｓの高い磁性合金として、窒化鉄やＦ
ｅ−８ｉ系合金等の鉄を主成分とした磁性合金が知られ
ている。Iron nitride and F
Magnetic alloys containing iron as a main component, such as e-8i alloys, are known.
（発明が解決しようとする課題）
ところが、従来より知られている、これらの高Ｂｓ磁性
合金は保磁力Ｈｅが大きく、そのままでは磁気ヘッドの
材料としては不十分であるので、センダスト合金やパー
マロイ等の保磁力の小さい磁性材料を層間膜として使用
した多層構造の磁気ヘッドが提案されている。(Problem to be Solved by the Invention) However, these conventionally known high Bs magnetic alloys have a large coercive force He and are not sufficient as materials for magnetic heads as they are, so sendust alloys, permalloy, etc. A magnetic head with a multilayer structure using a magnetic material with a small coercive force as an interlayer film has been proposed.
然しなから、多層構造にするには工数やコストがかかり
、信頼性を保つのも難しいという問題点があった。特に
、数μｍ以上の膜厚にする為には、場合によっては１０
０層以上の多層構造にする必要があり、使用範囲も限ら
れていた。However, creating a multilayer structure requires a lot of man-hours and costs, and it is difficult to maintain reliability. In particular, in order to obtain a film thickness of several μm or more, it may be necessary to
It was necessary to have a multilayer structure with zero or more layers, and the range of use was also limited.
この問題点を解決するために、本発明穴等はＦｅ−Ｎ−
０合金によって、多層構造にしない単層でも高飽和磁束
密度を有し、さらに低保磁力である磁性合金が得られる
ことを提案したが、熱安定性の面から、ガラスモールド
工程には適さないという問題点があった。In order to solve this problem, the holes etc. of the present invention are made of Fe-N-
It was proposed that a magnetic alloy with high saturation magnetic flux density and low coercive force could be obtained even in a single layer without a multilayer structure by using the 0 alloy, but it is not suitable for the glass molding process from the viewpoint of thermal stability. There was a problem.
そこで、本発明は、多層構造にしなくても高飽和磁束密
度を持ち、保磁力が小さく、熱安定性に優れた磁性合金
を提供することを目的とする。Therefore, an object of the present invention is to provide a magnetic alloy that has a high saturation magnetic flux density without having a multilayer structure, has a small coercive force, and has excellent thermal stability.
（課題を解決するための手段）
本発明は上記の課題を解決するためになされたものであ
り、
Ｆｅｖ ＮＷ ＯＸ Ｒｅｙなる組成式で表され、ｖ、
ｗ、ｘ、ｙで示される原子％は
ｌ≦Ｗ≦２０１≦ｘ≦１０
０．５≦ｙ≦６
ｖ ＋ｗ＋ ｘ ＋ ｙ ＝１００
なる関係を有する磁性合金を提供するものである。(Means for Solving the Problems) The present invention has been made to solve the above problems, and is represented by the composition formula Fev NW OX Rey, v,
The atomic % represented by w, x, and y provides a magnetic alloy having the following relationships: l≦W≦201≦x≦10 0.5≦y≦6 v + w+ x + y =100.
（実施例）
本発明になる磁性合金の製造装置の一実施例を第１図に
示す。(Example) An example of the magnetic alloy manufacturing apparatus according to the present invention is shown in FIG.
一対のターゲット５．５は鉄（Ｆｅ）とレニウム（Ｒｅ
）の合金ターゲットか、或いは適当な凹部を設けた純鉄
のターゲットの凹部にチップ状のＲｅをはめ込んた複合
ターゲットである。このターゲット５．５はターゲット
ホルダ９によって支えられており、このターゲット５と
ターゲットホルダ９には、直流電源１３よりマイナス電
位が印加され、更にこのターゲットホルダ９の周囲には
シールド４が取り付けである。A pair of targets 5.5 are made of iron (Fe) and rhenium (Re).
) alloy target, or a composite target in which Re chips in the form of chips are fitted into the recesses of a pure iron target with appropriate recesses. This target 5.5 is supported by a target holder 9, a negative potential is applied to the target 5 and the target holder 9 from a DC power supply 13, and a shield 4 is attached around the target holder 9. .
又、このターゲットホルダリの内部には、両ターゲット
５．５間にプラズマ１４を集束するための磁石６．６が
挿入され、かつターゲット５の表面の加熱を防ぐために
冷却水８が流入している。Further, inside this target holder, a magnet 6.6 for focusing the plasma 14 is inserted between both targets 5.5, and cooling water 8 is introduced to prevent the surface of the target 5 from being heated. There is.
そして、接地された真空槽１５の左右に、２個のターゲ
ットホルダ９が絶縁体７によって絶縁されて設けられて
いる。Two target holders 9 are provided on the left and right sides of the grounded vacuum chamber 15 and are insulated by an insulator 7.
又、この真空槽１５の上部より、窒素（Ｎ２）酸素（０
２）・アルゴン（Ａｒ）がそれぞれ流量計１〜３により
、所定の流量に調節されて導入されている。Also, from the upper part of this vacuum chamber 15, nitrogen (N2) and oxygen (0
2) Argon (Ar) is introduced at a predetermined flow rate by flowmeters 1 to 3, respectively.
なお、アルゴンはターゲット５をスパッタすると同時に
成膜する磁性合金膜中の窒素と酸素の量を調節するため
のものである。Note that argon is used to adjust the amount of nitrogen and oxygen in the magnetic alloy film formed at the same time as sputtering the target 5.
そして、真空槽１５の下部には、基板ホルダ１２上に基
板１１が置かれ、不純物を防ぐためのシャッタ１０が基
板１１を覆っている。A substrate 11 is placed on a substrate holder 12 at the bottom of the vacuum chamber 15, and a shutter 10 for preventing impurities covers the substrate 11.
このようなスパッタ装置において、直流電源１３により
、左右のターゲットホルダ９に支えられたターゲット５
．５の間にプラズマ１４を発生させると、ターゲット５
はマイナス電位であるので、プラズマ１４中のアルゴン
イオン（Ａｒ”）がターゲッット５に衝突し、ターゲッ
ト５の鉄原子及びＲｅ等の原子が飛び出す。In such a sputtering apparatus, the target 5 supported by the left and right target holders 9 is powered by the DC power supply 13.
．． When the plasma 14 is generated between 5 and 5, the target 5
Since is at a negative potential, argon ions (Ar'') in the plasma 14 collide with the target 5, and atoms such as iron atoms and Re atoms of the target 5 fly out.
そして、ターゲット５から飛び出した鉄とＲｅの原子と
プラズマ中の窒素および酸素の原子または分子とが結合
して基板１１の上に成長していく。Then, the iron and Re atoms ejected from the target 5 combine with nitrogen and oxygen atoms or molecules in the plasma and grow on the substrate 11.
なお、スパッタ開始後の数分間は、シャッタ１０を閉じ
て基板１１を覆うことにより、ターゲット５の表面の不
純物が基板１１の上に付かないようにし、その後でシャ
ッタ１０を開けるようにする。Note that for several minutes after the start of sputtering, the shutter 10 is closed to cover the substrate 11 to prevent impurities on the surface of the target 5 from adhering to the substrate 11, and then the shutter 10 is opened.
そして、流量計１〜３にて窒素、酸素及びアルゴンの導
入量を調整することにより、所望の窒素及び酸素を含ん
だ’ｆ” ｅｖ ＮｗＯＸ Ｒｅｙ合金を得ることがで
きる。By adjusting the amounts of nitrogen, oxygen, and argon introduced using the flowmeters 1 to 3, it is possible to obtain a desired 'f'' ev NwOX Rey alloy containing nitrogen and oxygen.
このようにして得たＦｅｖ Ｎｗ Ｏｘ Ｒｅｙ合金の
窒素・酸素及びＲｅの含有量と、飽和磁束密度（Ｂｓ）
、保磁力（Ｈｃ）との関係を表に示す。The nitrogen/oxygen and Re contents of the Fev Nw Ox Rey alloy thus obtained and the saturation magnetic flux density (Bs)
, and the relationship with coercive force (Hc) are shown in the table.
表
表は窒素・酸素及びＲｅの含有量と飽和磁束密度（Ｂｓ
）、保磁力（Ｈｃ）との関係を示すものであり、含有量
はＥＳＣＡ（Ｘ線光電子分光分析法） 、ＥＰＭＡ （
Ｘ線マイクロアナライザ法）等による定量分析で原子％
で表しているが、±２０％程度の誤差が見込まれる。保
磁力は真空中での熱処理を行った時の値であり、熱処理
温度はここでは３００″′Ｃである。この内、試料番号
ｌはＦｅに窒素のみを含有させた時の結果であり、試料
番号２はＦｅにＲｅのみを含有させた時の結果である。The table shows the content of nitrogen, oxygen and Re and the saturation magnetic flux density (Bs
), shows the relationship with coercive force (Hc), and the content is ESCA (X-ray photoelectron spectroscopy), EPMA (
Atomic % by quantitative analysis using X-ray microanalyzer method, etc.
However, an error of about ±20% is expected. The coercive force is the value when heat treatment is performed in vacuum, and the heat treatment temperature is 300'''C. Among these, sample number 1 is the result when only nitrogen is contained in Fe. Sample number 2 is the result when only Re is contained in Fe.
試料番号３〜８は、本発明の磁性合金である。Sample numbers 3 to 8 are magnetic alloys of the present invention.
窒素の含有量が１原子％未満であると、顕著な窒素の効
果が見られずＨｃはほとんど低下しない。When the nitrogen content is less than 1 atomic %, no significant effect of nitrogen is observed and Hc hardly decreases.
また第４図に示したように、窒素の含有量が２０原子％
以下であると、Ｂｓが１０ｋ ０以上の磁性合金が得ら
れる。従って、窒素の含有量が１〜２０原子％更に好ま
しくは１−１ｏ原子％である時、高Ｂｓで低Ｈｅの磁性
合金が得られる。窒素含有量が１〜ｌＯ原子％の時はＢ
ｓが１５ｋＧ以上の磁性合金が得られる。In addition, as shown in Figure 4, the nitrogen content is 20 at%
If it is below, a magnetic alloy with Bs of 10 k 0 or more can be obtained. Therefore, when the nitrogen content is 1 to 20 atomic %, more preferably 1 to 10 atomic %, a high Bs and low He magnetic alloy can be obtained. B when the nitrogen content is 1 to 10 atom%
A magnetic alloy with s of 15 kG or more can be obtained.
酸素の含有量が１原子％未満であると、顕著な酸素の効
果が見られず、磁気特性の改善がほとんど見られない。When the oxygen content is less than 1 atomic %, no significant oxygen effect is observed and almost no improvement in magnetic properties is observed.
また、酸素の含有量が１０原子％を越えるとＨｃの増大
が著しくなる。Furthermore, when the oxygen content exceeds 10 atomic %, Hc increases significantly.
従って、酸素の含有量が１〜１０原子％である時、高Ｂ
ｓで低Ｈｅの磁性合金が得られる。Therefore, when the oxygen content is 1 to 10 at%, high B
A low He magnetic alloy can be obtained at s.
第２図は、本発明になる磁性合金と従来例である窒化鉄
（ＦｅＮ）合金の、熱処理温度による保磁力（Ｈｅ）の
変化を示す。窒化鉄は、熱処理温度８００ ’ ｃの時
は比較的Ｈｃは低いが、３００”ｃ以上にすると急激に
Ｈｅが増大する。これに対し本発明になる磁性合金は、
Ｈｃが小さく熱安定性にも優れていることが解る。ここ
でＲｅの含有量が０．５原子％未満であると、熱安定性
の向上に対する顕著な効果は見られず、６原子％を越え
ると大幅なりｓの低下とＨｅの増大が生じる。従って、
Ｒｅの含有量が０．５〜６原子％の時、高Ｂｓ・低Ｈｃ
で熱安定性にも優れた磁性合金を得ることができる。FIG. 2 shows the change in coercive force (He) of the magnetic alloy according to the present invention and a conventional iron nitride (FeN) alloy depending on the heat treatment temperature. Iron nitride has a relatively low Hc when the heat treatment temperature is 800'c, but when the heat treatment temperature is 300'c or higher, the He rapidly increases.On the other hand, the magnetic alloy of the present invention has a relatively low Hc.
It can be seen that Hc is small and thermal stability is excellent. Here, if the Re content is less than 0.5 atomic %, no significant effect on improving thermal stability is observed, and if it exceeds 6 atomic %, a significant decrease in s and an increase in He occur. Therefore,
When the Re content is 0.5 to 6 at%, high Bs and low Hc
It is possible to obtain a magnetic alloy with excellent thermal stability.
また第３図は、膜厚を２μｍとした時の本発明になる磁
性合金の透磁率μと周波数の関係を示す。Further, FIG. 3 shows the relationship between the magnetic permeability μ and frequency of the magnetic alloy according to the present invention when the film thickness is 2 μm.
本発明になる磁性合金は、透磁率が２５００以上と高く
、磁気ヘッドとして十分な再生効率が得られる。The magnetic alloy according to the present invention has a high magnetic permeability of 2,500 or more, and can obtain sufficient reproduction efficiency as a magnetic head.
また、主に耐蝕性及び耐摩耗性の向上を目的として、Ｂ
、Ｃ，ＡＩ、Ｓｉ、Ｔｉ、Ｖ、Ｃｒ。In addition, mainly for the purpose of improving corrosion resistance and wear resistance, B
, C, AI, Si, Ti, V, Cr.
Ｃｏ、Ｎｉ、Ｃｕ、Ｇａ、Ｇｅ、Ｙ、Ｚｒ、Ｎｂ。Co, Ni, Cu, Ga, Ge, Y, Zr, Nb.
Ｍｏ、Ｒｕ、Ｒｈ、Ｐｄ、Ａｇ、Ｓｎ、Ｓｂ。Mo, Ru, Rh, Pd, Ag, Sn, Sb.
Ｈｆ、Ｔａ、Ｗ、Ｒｅ、Ｏｓ、Ｉｒ、Ｐｔ、Ａｕ。Hf, Ta, W, Re, Os, Ir, Pt, Au.
ｐｂを３原子％以下含有させることができる。Pb can be contained in an amount of 3 at % or less.
（発明の効果）
本発明は、以上のような組成の磁性合金とすることによ
り、高飽和磁束密度を有し、保磁力が小さく、透磁率が
大きく、更に熱安定性と耐蝕性に優れた磁気ヘッド等の
磁気デバイス用磁性合金が得られる。従って、本発明の
磁性合金を用いれば、高保磁力媒体への良好な記録再生
が行える他、高性能の薄膜磁気ヘッド等を作成すること
ができ、高密度な磁気記録再生が実現できる。(Effects of the Invention) The present invention provides a magnetic alloy having the composition described above, which has high saturation magnetic flux density, low coercive force, high magnetic permeability, and excellent thermal stability and corrosion resistance. A magnetic alloy for magnetic devices such as magnetic heads is obtained. Therefore, by using the magnetic alloy of the present invention, it is possible to perform good recording and reproducing on a high coercive force medium, and also to create a high-performance thin film magnetic head and the like, and realize high-density magnetic recording and reproducing.
第１図は、本発明になる磁性合金を製造する装置の一実
施例であるスパッタ装置の概略図、第２図は、熱処理温
度によるＨｅの変化を表わす図、第３図は、透磁率μと
周波数の関係を示す図、第４図は、ＦｅＮ合金における
窒素含有量と飽和磁束密度（Ｂｓ）の関係を示す図であ
る。FIG. 1 is a schematic diagram of a sputtering apparatus which is an embodiment of the apparatus for manufacturing the magnetic alloy according to the present invention, FIG. 2 is a diagram showing the change in He depending on the heat treatment temperature, and FIG. 3 is a diagram showing the magnetic permeability μ FIG. 4 is a diagram showing the relationship between nitrogen content and saturation magnetic flux density (Bs) in FeN alloy.
Claims (1)
，ｗ，ｘ，ｙで示される原子％は １≦ｗ≦２０、１≦ｘ≦１０ ０．５≦ｙ≦６ ｖ＋ｗ＋ｘ＋ｙ＝１００ なる関係を有する磁性合金。[Claims] Represented by the compositional formula Fe_vN_wO_xRe_y, v
, w, x, and y are atomic % having the following relationships: 1≦w≦20, 1≦x≦10 0.5≦y≦6 v+w+x+y=100.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2071287A JPH03270204A (en) | 1990-03-20 | 1990-03-20 | Magnetic alloy |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2071287A JPH03270204A (en) | 1990-03-20 | 1990-03-20 | Magnetic alloy |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03270204A true JPH03270204A (en) | 1991-12-02 |
Family
ID=13456333
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2071287A Pending JPH03270204A (en) | 1990-03-20 | 1990-03-20 | Magnetic alloy |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03270204A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5617275A (en) * | 1994-05-02 | 1997-04-01 | Sanyo Electric Co., Ltd. | Thin film head having a core comprising Fe-N-O in a specific atomic composition ratio |
-
1990
- 1990-03-20 JP JP2071287A patent/JPH03270204A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5617275A (en) * | 1994-05-02 | 1997-04-01 | Sanyo Electric Co., Ltd. | Thin film head having a core comprising Fe-N-O in a specific atomic composition ratio |
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