JPH03288410A - Magnetic alloy - Google Patents
Magnetic alloyInfo
- Publication number
- JPH03288410A JPH03288410A JP2089768A JP8976890A JPH03288410A JP H03288410 A JPH03288410 A JP H03288410A JP 2089768 A JP2089768 A JP 2089768A JP 8976890 A JP8976890 A JP 8976890A JP H03288410 A JPH03288410 A JP H03288410A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- alloy
- magnetic alloy
- atomic
- target
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910001004 magnetic alloy Inorganic materials 0.000 title claims abstract description 33
- 229910052727 yttrium Inorganic materials 0.000 claims abstract description 7
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052787 antimony Inorganic materials 0.000 claims abstract description 4
- 229910052802 copper Inorganic materials 0.000 claims abstract description 4
- 229910052737 gold Inorganic materials 0.000 claims abstract description 4
- 229910052741 iridium Inorganic materials 0.000 claims abstract description 4
- 229910052745 lead Inorganic materials 0.000 claims abstract description 4
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 4
- 229910052762 osmium Inorganic materials 0.000 claims abstract description 4
- 229910052763 palladium Inorganic materials 0.000 claims abstract description 4
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 4
- 229910052703 rhodium Inorganic materials 0.000 claims abstract description 4
- 229910052707 ruthenium Inorganic materials 0.000 claims abstract description 4
- 229910052718 tin Inorganic materials 0.000 claims abstract description 4
- 239000000203 mixture Substances 0.000 claims description 4
- 229910045601 alloy Inorganic materials 0.000 abstract description 10
- 239000000956 alloy Substances 0.000 abstract description 10
- 230000004907 flux Effects 0.000 abstract description 9
- 238000000034 method Methods 0.000 abstract description 4
- 229910052709 silver Inorganic materials 0.000 abstract description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 27
- 229910052757 nitrogen Inorganic materials 0.000 description 13
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 12
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 11
- 239000001301 oxygen Substances 0.000 description 11
- 229910052760 oxygen Inorganic materials 0.000 description 11
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 7
- 238000005260 corrosion Methods 0.000 description 7
- 230000007797 corrosion Effects 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 230000035699 permeability Effects 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 3
- 229910001337 iron nitride Inorganic materials 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 229910001020 Au alloy Inorganic materials 0.000 description 2
- 229910020641 Co Zr Inorganic materials 0.000 description 2
- 229910020520 Co—Zr Inorganic materials 0.000 description 2
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 239000003353 gold alloy Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910000889 permalloy Inorganic materials 0.000 description 2
- 229910000702 sendust Inorganic materials 0.000 description 2
- 229910000979 O alloy Inorganic materials 0.000 description 1
- 229910000946 Y alloy Inorganic materials 0.000 description 1
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 1
- -1 argon ions Chemical class 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000004453 electron probe microanalysis Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000004445 quantitative analysis Methods 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Soft Magnetic Materials (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、高密度磁気記録に適する磁気ヘッド等磁気デ
バイス用の磁性合金に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a magnetic alloy for magnetic devices such as magnetic heads suitable for high-density magnetic recording.
（従来の技術）
近年、磁気記録の高密度化や広帯域化の必要性が高まり
、磁気記録媒体に高い抗磁力を有する磁性材料を使用し
て記録トラック幅を狭くすることにより、高密度磁気記
録再生を実現している。そして、この高い抗磁力をもつ
磁気記録媒体に記録再生するための磁気ヘッド材料とし
て、飽和磁束密度Ｂｓの高い磁性合金が必要とされてお
り、センダスト合金やＣｏ−Ｚｒ系非晶質合金等をコア
の一部または全部に使用した磁気ヘッドが提案されてい
る。(Prior art) In recent years, the need for higher density and wider band magnetic recording has increased, and high-density magnetic recording has been achieved by narrowing the recording track width by using magnetic materials with high coercive force in magnetic recording media. Achieving regeneration. Magnetic alloys with high saturation magnetic flux density Bs are required as magnetic head materials for recording and reproducing on magnetic recording media with high coercive force, and Sendust alloys, Co-Zr amorphous alloys, etc. A magnetic head using part or all of the core has been proposed.
然しなから、磁気記録媒体の高抗磁力化が一段と進み、
磁気記録媒体の抗磁力が２００００ ｅ以上になると、
センダスト合金やＣｏ−Ｚｒ系非晶質合金を使用した磁
気ヘッドでは良好な磁気記録再生が困難になる。However, as the coercive force of magnetic recording media continues to increase,
When the coercive force of the magnetic recording medium becomes 20,000 e or more,
In a magnetic head using Sendust alloy or a Co-Zr based amorphous alloy, it is difficult to achieve good magnetic recording and reproduction.
又、磁気記録媒体の長手方向ではなく、厚さ方向に磁化
して記録する垂直磁化記録方式も提案されているが、こ
の垂直磁化記録を良好に行うには、磁気ヘッドの主磁極
の先端部の厚さを０．５μｍ以下にする必要があり、比
較的抗磁力の低い磁気記録媒体に記録するにも、高い飽
和磁束密度を持つ磁気ヘッド用の磁性合金が必要とされ
ている。Also, a perpendicular magnetization recording method has been proposed in which the magnetic recording medium is magnetized in the thickness direction rather than in the longitudinal direction. The thickness of the magnetic head must be 0.5 μm or less, and a magnetic alloy for a magnetic head with a high saturation magnetic flux density is required even for recording on a magnetic recording medium with a relatively low coercive force.
そして、センダスト合金やＣｏ−Ｚｒ系非晶質合金より
も飽和磁束密度の高い磁性合金として、窒化鉄やＦｅ−
８ｉ系合金等の鉄を主成分とした磁性合金が知られてい
る。Iron nitride and Fe-
Magnetic alloys containing iron as a main component, such as 8i-based alloys, are known.
（発明が解決しようとする課３１）
ところが、従来より知られている高飽和磁束密度を有す
る磁性合金は、保磁力Ｈｃが大きく、そのままでは磁気
ヘッドの材料としては不十分であるので、センダスト合
金やパーマロイ等の保磁力の小さい磁性材料を層間膜と
して使用した多層構造の磁気ヘッドが提案されている。(Issue 31 to be solved by the invention) However, conventionally known magnetic alloys with high saturation magnetic flux density have a large coercive force Hc and are insufficient as materials for magnetic heads as they are. A magnetic head with a multilayer structure using a magnetic material with a low coercive force such as Permalloy or Permalloy as an interlayer film has been proposed.
然しなから、多層構造にするには工数やコストがかかり
、信頼性を保つのも難しいという問題点があった。特に
数μｍ以上の膜厚にする為には、場合によっては１００
層以上の多層構造とする必要があり、使用範囲も限られ
ていた。However, creating a multilayer structure requires a lot of man-hours and costs, and it is difficult to maintain reliability. In particular, in order to obtain a film thickness of several μm or more, it may be necessary to
It required a multilayer structure with more than one layer, and the range of use was limited.
これらの問題点を解決するために、本発明穴等はＦｅ−
Ｎ−０合金によって、単層で高Ｂｓ・低Ｈｅの磁性合金
が得られることを提案したが、熱安定性の面からガラス
モールド工程には適さないという問題点があった。In order to solve these problems, the holes etc. of the present invention are made of Fe-
Although it was proposed that a single-layer magnetic alloy with high Bs and low He could be obtained using N-0 alloy, there was a problem that it was not suitable for the glass molding process from the viewpoint of thermal stability.
そこで、本発明は多層構造にしなくても高飽和磁束密度
を持ち、保磁力が小さく、熱安定性に優れた磁性合金を
提供することを目的とする。Therefore, an object of the present invention is to provide a magnetic alloy that has a high saturation magnetic flux density without a multilayer structure, has a small coercive force, and has excellent thermal stability.
（課題を解決するための手段）
本発明は上記の課題を解決するためになされたものであ
り、Ｆ ｅｖ ＮＷ ＯＸ ＹＹなる組成式で表され、
ｖ、ｗ、ｘ、ｙで示される原子％が１≦Ｗ≦２０ ０．
１≦ｘ≦１０
０．５≦ｙ≦６
ｖ＋ｗ＋ｘ＋ｙ＝１００
なる関係を有する磁性合金（但し、Ｙはイツトリウム）
または−１Ｆｅｖ Ｎｗ Ｏｘ Ｙｙ Ｍｚなる組成式
で表され、
ｖ、ｗ、ｘ、ｙ、ｚで示される原子％が１≦Ｗ≦２０
０．１≦ｘ≦１０
０．５≦ｙ≦６０．８≦２≦６
ｖ＋ｗ＋ｘ＋ｙ＋ｚ−１００
なる関係を有する磁性合金（但し、Ｙはイツトリウムで
あり、ＬはＣｏ、Ｎｉ、Ｃｕ、Ｒｕ、Ｒｈ。(Means for Solving the Problems) The present invention has been made to solve the above problems, and is represented by the composition formula F ev NW OX YY,
Atomic % represented by v, w, x, y is 1≦W≦20 0.
A magnetic alloy having the following relationships: 1≦x≦10 0.5≦y≦6 v+w+x+y=100 (where, Y is yttrium)
Or -1Fev Nw Ox Yy Mz is represented by the composition formula, and the atomic % represented by v, w, x, y, z is 1≦W≦20
A magnetic alloy having the following relationships: 0.1≦x≦10 0.5≦y≦60.8≦2≦6 v+w+x+y+z−100 (where, Y is yttrium, and L is Co, Ni, Cu, Ru, Rh.
Ｐｄ、Ａｇ、Ｓｎ、Ｓｂ、Ｏｓ、Ｉ ｒ、Ｐｔ、Ａｕ、
Ｐｂからなる群の中から選ばれた少なくとも１種類以上
の元素）をそれぞれ提供するものである。Pd, Ag, Sn, Sb, Os, Ir, Pt, Au,
(at least one element selected from the group consisting of Pb).
（実施例）
本発明になる磁性合金の製造装置の一実施例を第１図に
示す。(Example) An example of the magnetic alloy manufacturing apparatus according to the present invention is shown in FIG.
一対のターゲット５．５は鉄（Ｆｅ）とイツトリウム（
Ｙ）等の合金ターゲットか、或いは適当な凹部を設けた
純鉄のターゲットの凹部にチップ状のＹ等をはめ込んだ
複合ターゲットである。このターゲット５．５はターゲ
ットホルダ９によって支えられており、このターゲット
５とターゲットホルダ９には、直流電源１３よりマイナ
ス電位が印加され、更にこのターゲットホルダ９の周囲
には、シールド４が取り付けである。A pair of targets 5.5 are iron (Fe) and yttrium (
It is either an alloy target such as Y) or a composite target in which a chip-shaped Y or the like is fitted into the recess of a pure iron target with an appropriate recess. This target 5.5 is supported by a target holder 9, a negative potential is applied to this target 5 and target holder 9 from a DC power supply 13, and a shield 4 is attached around this target holder 9. be.
又、このターゲットホルダ９の内部には、両ターゲット
５．５間にプラズマ１４を集束するための磁石６．６が
挿入され、かつターゲット５の表面の加熱を防ぐために
冷却水８が流入している。Further, inside this target holder 9, a magnet 6.6 for focusing the plasma 14 is inserted between both targets 5.5, and cooling water 8 flows in to prevent the surface of the target 5 from being heated. There is.
そして、接地された真空槽１５の左右に、２個のターゲ
ットホルダ９が絶縁体７によって絶縁されて設けられて
いる。Two target holders 9 are provided on the left and right sides of the grounded vacuum chamber 15 and are insulated by an insulator 7.
又、この真空Ｉ！１５の上部より、窒素（Ｎ２）酸素（
０２）アルゴン（Ａ「）がそれぞれ流量計１〜３により
、所定の流量に調節されて導入されている。Also, this vacuum I! From the top of 15, nitrogen (N2) oxygen (
02) Argon (A'') is introduced at a predetermined flow rate using flowmeters 1 to 3, respectively.
なお、アルゴンは、ターゲット５をスパッタすると同時
に成膜する磁性合金膜中の酸素と窒素の量を調節するた
めのものである。Note that argon is used to adjust the amount of oxygen and nitrogen in the magnetic alloy film formed at the same time as the target 5 is sputtered.
そして、真空槽１５の下部には基板ホルダ１２上に基板
１１が置かれ、後で述べる不純物を防ぐためのシャッタ
１０が基板１１を覆っている。The substrate 11 is placed on a substrate holder 12 at the bottom of the vacuum chamber 15, and the substrate 11 is covered with a shutter 10 for preventing impurities, which will be described later.
このようなスパッタ装置において、直流電源１３により
、左右のターゲットホルダ９に支えられたターゲット５
．５の間にプラズマ１４を発生させると、ターゲット５
はマイナス電位であるので、プラズマ１４中のアルゴン
イオン（Ａｒ”）がターゲット５に衝突し、ターゲット
５の鉄原子及びＹ等の原子が飛び出す。In such a sputtering apparatus, the target 5 supported by the left and right target holders 9 is powered by the DC power supply 13.
．． When the plasma 14 is generated between 5 and 5, the target 5
Since is at a negative potential, argon ions (Ar'') in the plasma 14 collide with the target 5, and atoms such as iron atoms and Y atoms of the target 5 fly out.
そして、ターゲット５から飛び出した鉄とＹ等の原子と
、プラズマ中の窒素および酸素の原子または分子が結合
して基板１１の上に成長していく。Then, atoms of iron, Y, etc. ejected from the target 5 combine with atoms or molecules of nitrogen and oxygen in the plasma, and grow on the substrate 11.
なお、スパッタ開始後の数分間は、シャッタ１０を閉じ
て基板１１を覆うことにより、ターゲット５の表面の不
純物が基板１１の上に付かないようにし、その後でシャ
ッタ１０を開けるようにする。Note that for several minutes after the start of sputtering, the shutter 10 is closed to cover the substrate 11 to prevent impurities on the surface of the target 5 from adhering to the substrate 11, and then the shutter 10 is opened.
そして、流量計１〜３により窒素、酸素及びアルゴンの
導入量を調整することにより、所望の窒素及び酸素を含
んだＦ ｅｖ Ｎｗ Ｏｘ Ｙｙ金合金得ることができ
る。Then, by adjusting the amounts of nitrogen, oxygen, and argon introduced using the flowmeters 1 to 3, a F ev Nw Ox Yy gold alloy containing desired nitrogen and oxygen can be obtained.
このようにして得たＦ ｅ ｙ ＮＷ ＯＸ ＹＹ金合
金窒素・酸素及びＹの含有量と、飽和磁束密度（Ｂｓ）
保磁力（Ｈｃ）との関係を表１に示す。Contents of nitrogen, oxygen, and Y in the F e y NW OX YY gold alloy obtained in this way, and saturation magnetic flux density (Bs)
Table 1 shows the relationship with coercive force (Hc).
表 １
表１は、窒素・酸素及びＹの含有量と飽和磁束密度（Ｂ
ｓ）、保磁力（Ｈｃ）との関係を示すものであり、含有
量は、ＥＳＣＡ（Ｘ線光電子分光分析法） 、ＥＰＭＡ
（Ｘ線マイクロアナライザ法）等による定量分析で原
子％で表しているが、±２０％程度の誤差が見込まれる
。保磁力は、真空中での熱処理を行った時の値であり、
熱処理温度は、ここでは４００°Ｃである。この内試料
番号１は、Ｆｅに窒素のみを含有させた時の結果である
。試料番号２〜７は、本発明の磁性合金である。Table 1 Table 1 shows the content of nitrogen, oxygen, and Y and the saturation magnetic flux density (B
s), shows the relationship with coercive force (Hc), and the content is ESCA (X-ray photoelectron spectroscopy), EPMA
Although it is expressed in atomic % by quantitative analysis using (X-ray microanalyzer method) etc., an error of about ±20% is expected. Coercive force is the value when heat treatment is performed in vacuum,
The heat treatment temperature here is 400°C. Among these, sample number 1 is the result when only nitrogen is contained in Fe. Sample numbers 2 to 7 are magnetic alloys of the present invention.
窒素の含有量が１原子％未満であると、顕著な窒素の効
果が見られずＨｅはほとんど低下しない。When the nitrogen content is less than 1 atomic %, no significant effect of nitrogen is observed and He hardly decreases.
また第４図に示したように、窒素の含有量が２０原子％
以下であるとＢｓが１ＯｋＧ以上の磁性合金が得られる
。従って、窒素の含有量が１〜２０原子％、更に好まし
くは、１〜ｌＯ原子％である時、高Ｂｓで低Ｈｃの磁性
合金が得られる。窒素含有量が１〜１０原子％の時は、
Ｂｓが１５ｋ Ｇ以上の磁性合金が得られる。In addition, as shown in Figure 4, the nitrogen content is 20 at%
If it is below, a magnetic alloy with Bs of 1 OkG or more can be obtained. Therefore, when the nitrogen content is 1 to 20 atomic %, more preferably 1 to 10 atomic %, a magnetic alloy with high Bs and low Hc can be obtained. When the nitrogen content is 1 to 10 at%,
A magnetic alloy with a Bs of 15 kG or more can be obtained.
酸素の含有量が０．１原子％未満であると、顕著な酸素
の効果が見られず磁気特性の改善がほとんど見られない
。また、酸素の含有量がｌＯ原子％を越えると磁気特性
が劣化する。従って、酸素の含有量が０．１〜ｌＯ原子
％である時、高Ｂｓ・低Ｈｃで透磁率μｅの高い磁性合
金が得られる。When the oxygen content is less than 0.1 atomic %, no significant oxygen effect is observed and almost no improvement in magnetic properties is observed. Furthermore, when the oxygen content exceeds 10 atomic %, the magnetic properties deteriorate. Therefore, when the oxygen content is 0.1 to 10 atomic %, a magnetic alloy with high Bs, low Hc and high magnetic permeability μe can be obtained.
第２図は、本発明になる磁性合金と従来例である窒化鉄
（ＦｅＮ）合金の、熱処理温度による保磁力（Ｈｃ）の
変化を示す。窒化鉄は、熱処理温度３００ ” ｃの時
は比較的Ｈｃは低いが、３００”ｃ以上にすると急激に
Ｈｅが増大する。これに対し本発明になる磁性合金は、
Ｈｃが小さく熱安定性にも優れていることが解る。ここ
で、Ｙの含有量が０．５原子％未満であると、熱安定性
の向上に対する顕著な効果は見られず、６原子％を越え
るとＨｃの増大が生じる。従って、Ｙの含有量が０．５
〜６原子％の時、高Ｂｓ・低Ｈｃで熱安定性にも優れた
磁性合金を得ることができる。また第３図は、膜厚を２
μｍとした時の本発明になる磁性合金の透磁率μｅと周
波数の関係を示すものであり、本発明になる磁性合金に
よれば、透磁率μｅが３０００以上であり、良好な記録
再生を行なうことができるものである。FIG. 2 shows the change in coercive force (Hc) of the magnetic alloy according to the present invention and a conventional iron nitride (FeN) alloy depending on the heat treatment temperature. Iron nitride has a relatively low Hc when the heat treatment temperature is 300''c, but when the heat treatment temperature exceeds 300''c, the He rapidly increases. On the other hand, the magnetic alloy of the present invention is
It can be seen that Hc is small and thermal stability is excellent. Here, if the content of Y is less than 0.5 atomic %, no significant effect on improving thermal stability is observed, and if it exceeds 6 atomic %, an increase in Hc occurs. Therefore, the content of Y is 0.5
When the content is 6 atomic %, a magnetic alloy with high Bs, low Hc and excellent thermal stability can be obtained. In addition, in Figure 3, the film thickness is 2
This shows the relationship between the magnetic permeability μe of the magnetic alloy according to the present invention when expressed as μm and the frequency. According to the magnetic alloy according to the present invention, the magnetic permeability μe is 3000 or more, and good recording and reproduction can be performed. It is something that can be done.
表 ２
表２は、Ｒｕ等の元素が耐蝕性の向上に寄与することを
示したものである。実験は試料を６０°Ｃ−９０％の高
温高湿中に放置し、１０００時間経過後に腐蝕痕が見ら
れないものを○、腐蝕痕が生じたものを×として耐蝕性
を示した。試料番号２１は、比較例であるＦｅＮ合金、
試料番号２２〜８５は、Ｆｅ−Ｎ−０−Ｙ合金にＲｕ等
の元素を添加した合金であり、試料番号２２〜８５が本
発明になる磁性合金である。Table 2 Table 2 shows that elements such as Ru contribute to improving corrosion resistance. In the experiment, samples were left in a high temperature and high humidity environment of 60° C. and 90%, and corrosion resistance was evaluated by rated ○ if no corrosion marks were observed after 1000 hours and × if corrosion marks were observed. Sample number 21 is a comparative example of FeN alloy,
Sample numbers 22 to 85 are alloys in which elements such as Ru are added to a Fe-N-0-Y alloy, and sample numbers 22 to 85 are magnetic alloys according to the present invention.
ここで、Ｒｕ等の合−計の含有量が０．３原子％未満で
あると、耐蝕性に対する顕著な効果が見られず、６原子
％を越えると磁気特性の劣化が生じる。Here, if the total content of Ru, etc. is less than 0.3 atomic %, no significant effect on corrosion resistance will be observed, and if it exceeds 6 atomic %, the magnetic properties will deteriorate.
従って、Ｃｏ、Ｎｉ、Ｃｕ、Ｒｕ、Ｒｈ、Ｐｄ。Therefore, Co, Ni, Cu, Ru, Rh, Pd.
Ａｇ、Ｓｎ、Ｓｂ、Ｏｓ、Ｉ ｒ、Ｐｔ、Ａｕ、Ｐｂか
らなる群の中から選ばれた少なくとも１種類以上の元素
の合計の含有量が０．８〜６原子％である時、磁気特性
と耐蝕性に優れた磁性合金が得られる。When the total content of at least one element selected from the group consisting of Ag, Sn, Sb, Os, Ir, Pt, Au, and Pb is 0.8 to 6 at%, the magnetic properties A magnetic alloy with excellent corrosion resistance can be obtained.
（発明の効果）
本発明は、以上のような組成の磁性合金とすることによ
り、高飽和磁束密度を有し、保磁力が小さく、透磁率が
大きく、更に熱安定性と耐蝕性に優れた磁気ヘッド等の
磁気デバイス用の磁性合金が得られる。従って、本発明
の磁性合金を用いれば、高保磁力媒体への良好な記録再
生が行える他、高性能の薄膜磁気ヘッド等を作成するこ
とができ、高密度な磁気記録再生が実現できる。(Effects of the Invention) The present invention provides a magnetic alloy having the composition described above, which has high saturation magnetic flux density, low coercive force, high magnetic permeability, and excellent thermal stability and corrosion resistance. A magnetic alloy for magnetic devices such as magnetic heads is obtained. Therefore, by using the magnetic alloy of the present invention, it is possible to perform good recording and reproducing on a high coercive force medium, and also to create a high-performance thin film magnetic head and the like, and realize high-density magnetic recording and reproducing.
第１図は、本発明になる磁性合金を製造する装置の一実
施例であるスパッタ装置の概略図、第２図は、熱処理温
度によるＨｅの変化を表わす図、第３図は、透磁率μｅ
と周波数の関係を示す図、第４図は、ＦｅＮ合金におけ
る窒素含有量と飽和磁束密度（Ｂｓ）の関係を示す図で
ある。FIG. 1 is a schematic diagram of a sputtering apparatus which is an embodiment of the apparatus for manufacturing the magnetic alloy according to the present invention, FIG. 2 is a diagram showing the change in He depending on the heat treatment temperature, and FIG. 3 is a diagram showing the magnetic permeability μe.
FIG. 4 is a diagram showing the relationship between nitrogen content and saturation magnetic flux density (Bs) in FeN alloy.
Claims (1)
ｖ，ｗ，ｘ，ｙで示される原子％が １≦ｗ≦２０ ０．１≦ｘ≦１０ ０．５≦ｙ≦６ ｖ＋ｗ＋ｘ＋ｙ＝１００ なる関係を有する磁性合金。（但し、Ｙはイットリウム
） （２）Ｆｅ＿ｖＮ＿ｗＯ＿ｘＹ＿ｙＭ＿ｚなる組成式で
表され、ｖ，ｗ，ｘ，ｙ，ｚで示される原子％が１≦ｗ
≦２０ ０．１≦ｘ≦１０ ０．５≦ｙ≦６ ０．３≦ｚ≦６ ｖ＋ｗ＋ｘ＋ｙ＋ｚ＝１００ なる関係を有する磁性合金。（但し、Ｙはイットリウム
であり、ＬはＣｏ，Ｎｉ，Ｃｕ，Ｒｕ，Ｒｈ，Ｐｄ，Ａ
ｇ，Ｓｎ，Ｓｂ，Ｏｓ，Ｉｒ，Ｐｔ，Ａｕ，Ｐｂからな
る群の中から選ばれた少なくとも１種類以上の元素）[Claims] (1) It is expressed by the compositional formula Fe_vN_wO_xY_y, and the atomic % represented by v, w, x, and y is 1≦w≦20 0.1≦x≦10 0.5≦y≦6 v+w+x+y= A magnetic alloy having a relationship of 100. (However, Y is yttrium) (2) It is represented by the composition formula Fe_vN_wO_xY_yM_z, and the atomic % represented by v, w, x, y, z is 1≦w
≦20 0.1≦x≦10 0.5≦y≦6 0.3≦z≦6 v+w+x+y+z=100 A magnetic alloy having the following relationships. (However, Y is yttrium, and L is Co, Ni, Cu, Ru, Rh, Pd, A
At least one element selected from the group consisting of g, Sn, Sb, Os, Ir, Pt, Au, Pb)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2089768A JPH03288410A (en) | 1990-04-04 | 1990-04-04 | Magnetic alloy |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2089768A JPH03288410A (en) | 1990-04-04 | 1990-04-04 | Magnetic alloy |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03288410A true JPH03288410A (en) | 1991-12-18 |
Family
ID=13979880
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2089768A Pending JPH03288410A (en) | 1990-04-04 | 1990-04-04 | Magnetic alloy |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03288410A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5617275A (en) * | 1994-05-02 | 1997-04-01 | Sanyo Electric Co., Ltd. | Thin film head having a core comprising Fe-N-O in a specific atomic composition ratio |
-
1990
- 1990-04-04 JP JP2089768A patent/JPH03288410A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5617275A (en) * | 1994-05-02 | 1997-04-01 | Sanyo Electric Co., Ltd. | Thin film head having a core comprising Fe-N-O in a specific atomic composition ratio |
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