JPH03270203A - Magnetic alloy - Google Patents
Magnetic alloyInfo
- Publication number
- JPH03270203A JPH03270203A JP2071286A JP7128690A JPH03270203A JP H03270203 A JPH03270203 A JP H03270203A JP 2071286 A JP2071286 A JP 2071286A JP 7128690 A JP7128690 A JP 7128690A JP H03270203 A JPH03270203 A JP H03270203A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- alloy
- magnetic alloy
- coercive force
- atomic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910001004 magnetic alloy Inorganic materials 0.000 title claims abstract description 31
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 14
- 239000000203 mixture Substances 0.000 claims abstract description 10
- 229910052804 chromium Inorganic materials 0.000 claims description 5
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 229910052787 antimony Inorganic materials 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 229910052735 hafnium Inorganic materials 0.000 claims description 3
- 229910052741 iridium Inorganic materials 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229910052758 niobium Inorganic materials 0.000 claims description 3
- 229910052762 osmium Inorganic materials 0.000 claims description 3
- 229910052763 palladium Inorganic materials 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 229910052702 rhenium Inorganic materials 0.000 claims description 3
- 229910052703 rhodium Inorganic materials 0.000 claims description 3
- 229910052707 ruthenium Inorganic materials 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- 229910052718 tin Inorganic materials 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- 229910052720 vanadium Inorganic materials 0.000 claims description 3
- 229910052727 yttrium Inorganic materials 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 229910052726 zirconium Inorganic materials 0.000 claims description 2
- 229910052745 lead Inorganic materials 0.000 claims 1
- 230000004907 flux Effects 0.000 abstract description 9
- 238000005260 corrosion Methods 0.000 abstract description 8
- 230000007797 corrosion Effects 0.000 abstract description 8
- 230000035699 permeability Effects 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 23
- 229910045601 alloy Inorganic materials 0.000 description 15
- 239000000956 alloy Substances 0.000 description 15
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 14
- 229910052757 nitrogen Inorganic materials 0.000 description 11
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 229910001339 C alloy Inorganic materials 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 229910001337 iron nitride Inorganic materials 0.000 description 3
- 239000000696 magnetic material Substances 0.000 description 3
- 229910000702 sendust Inorganic materials 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 229910020641 Co Zr Inorganic materials 0.000 description 2
- 229910020520 Co—Zr Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 230000005415 magnetization Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- -1 argon ions Chemical class 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000004453 electron probe microanalysis Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 238000004445 quantitative analysis Methods 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
Landscapes
- Soft Magnetic Materials (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、高密度磁気記録用の磁気ヘッドに適する磁性
合金に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a magnetic alloy suitable for a magnetic head for high-density magnetic recording.
（従来の技術）
近年、磁気記録の高密度化や広帯域化の必要性が高まり
、磁気記録媒体に高い抗磁力を有する磁性材料を使用し
て記録トラック幅を狭くすることにより、高密度磁気記
録再生を実現している。(Prior art) In recent years, the need for higher density and wider band magnetic recording has increased, and high-density magnetic recording has been achieved by narrowing the recording track width by using magnetic materials with high coercive force in magnetic recording media. Achieving regeneration.
そして、この高い抗磁力をもつ磁気記録媒体に記録再生
するするための磁気ヘッド材料として、飽和磁束密度Ｂ
ｓの高い磁性合金が必要とされており、センダスト合金
やＣｏ−Ｚｒ系非晶質合金等をコアの一部または全部に
使用した磁気ヘッドが提案されている。The saturation magnetic flux density B
Magnetic alloys with high s are required, and magnetic heads using Sendust alloys, Co-Zr amorphous alloys, etc. for part or all of the core have been proposed.
然しなから、磁気記録媒体の高抗磁力化が−段と進み、
磁気記録媒体の抗磁力が２Ｃ１０００ｅ以上になると、
センダスト合金やＣｏ−Ｚｒ系非晶質合金を使用した磁
気ヘッドでは良好な磁気記録再生が困難になった。又、
磁気記録媒体の長手方向ではなく、厚さ方向に磁化して
記録する垂直磁化記録方式も提案されているが、この垂
直磁化記録方式を良好に行うには、磁気ヘッドの主磁極
の先端部の厚さを０．５μｍ以下にする必要があり、比
較的抗磁力の低い磁気記録媒体に記録するにも、高い飽
和磁束密度を持つ磁気ヘッド用磁性合金が必要になる。However, as the coercive force of magnetic recording media continues to increase,
When the coercive force of the magnetic recording medium becomes 2C1000e or more,
It has become difficult to achieve good magnetic recording and reproduction with magnetic heads using sendust alloys or Co-Zr amorphous alloys. or,
A perpendicular magnetization recording method has also been proposed in which the magnetic recording medium is magnetized in the thickness direction rather than in the longitudinal direction, but in order to perform well with this perpendicular magnetization recording method, it is necessary to The thickness must be 0.5 μm or less, and a magnetic alloy for a magnetic head with a high saturation magnetic flux density is required even for recording on a magnetic recording medium with relatively low coercive force.
そして、センダスト合金やＣｏ−Ｚｒ系非晶質合金より
も飽和磁束密度の高い磁性合金として、窒化鉄やＦｅ−
３ｉ系合金等の鉄を主成分とした磁性合金が知られてい
る。Iron nitride and Fe-
Magnetic alloys containing iron as a main component, such as 3i-based alloys, are known.
（発明が解決しようとする課題）
ところが、従来より知られている、これらの高Ｂｓ磁性
合金は、保磁力Ｈｃが大きく、そのままでは磁気ヘッド
の材料としては不十分であるのでセンダスト合金やパー
マロイ等の保磁力の小さい磁性材料か、或いはＳｉＯ２
等の非磁性材料を中間層とした多層構造の磁気ヘッドが
提案されている。(Problem to be Solved by the Invention) However, these conventionally known high Bs magnetic alloys have a large coercive force Hc and are not sufficient as materials for magnetic heads as they are, so sendust alloys, permalloy, etc. magnetic material with low coercive force, or SiO2
A multilayer magnetic head with an intermediate layer made of non-magnetic material has been proposed.
然しなから、多層構造にするには工数やコストがかかり
、信頼性を保つのも難しいという問題点があった。特に
、数μｍ以上の膜厚にする為には場合によっては１００
層以上の多層構造にする必要があり、使用範囲も限られ
ていた。However, creating a multilayer structure requires a lot of man-hours and costs, and it is difficult to maintain reliability. In particular, in order to obtain a film thickness of several μm or more, it may be necessary to
It required a multilayer structure with more than one layer, and its range of use was also limited.
この問題点を解決するために、本発明穴等はＦｅ−Ｎ−
０合金によって、単層で高Ｂｓ・低Ｈｃの磁性合金が得
られることを提案したが、熱安定性の面から、ガラスモ
ールド工程には適さないという問題があった。In order to solve this problem, the holes etc. of the present invention are made of Fe-N-
It was proposed that a magnetic alloy with high Bs and low Hc could be obtained in a single layer using a zero alloy, but there was a problem in that it was not suitable for the glass molding process from the viewpoint of thermal stability.
そこで本発明は多層構造にしなくても高飽和磁束密度を
持ち、保磁力が小さく、熱安定性に優れた磁性合金を提
供することを目的とする。Therefore, an object of the present invention is to provide a magnetic alloy that has a high saturation magnetic flux density without having a multilayer structure, has a small coercive force, and has excellent thermal stability.
（課題を解決するための手段）
本発明は上記の課題を解決するためになされたものであ
り、ＦｅｘＮｙＭｚなる組成式で表され、ｘ、ｙ、ｚて
示される原子％が
１ ≦ ｙ ≦１（１
０，５≦ ２ ≦ｔＯ
ｘ ＋ ｙ ＋ ｚ −１００なる関係を有す
る磁性合金。（但しＭはＣまたはＧｅまたはＣとＧｅの
混合物）またはＦ ｅ ＸＮ ｙ Ｍｚ Ｌ ｖなる組
成式て表され、ｘ、ｙ、ｚ、ｖで示される原子％が
１≦ｙ≦１０
０．５≦ｚ≦１０
０３≦Ｖ≦１０
Ｘ＋Ｙ＋Ｚ＋ｖ霧１００
なる関係を有する磁性合金。（但しＭはＣまたはＧｅま
たはＣとＧｅの混合物であり、ＬはＴｉ。(Means for Solving the Problems) The present invention has been made to solve the above problems, and is represented by the composition formula FexNyMz, where the atomic % represented by x, y, and z is 1≦y≦1. (Magnetic alloy having the relationship: 1 0,5≦2≦tO x + y + z -100. (However, M is C, Ge, or a mixture of C and Ge.) and the atomic % represented by x, y, z, and v is 1≦y≦10 0.5≦z≦10 03≦V≦10 It is a mixture of C and Ge, and L is Ti.
Ｖ、Ｃｒ、Ｃｏ、Ｎｉ、Ｃｕ、Ｙ、Ｚｒ、Ｎｂ。V, Cr, Co, Ni, Cu, Y, Zr, Nb.
Ｍｏ、Ｒｕ、Ｒｈ、Ｐｄ、Ａｇ、Ｓｎ、Ｓｂ。Mo, Ru, Rh, Pd, Ag, Sn, Sb.
Ｈｆ、Ｔａ、Ｗ、Ｒｅ、Ｏｓ、Ｉ ｒ、Ｐｔ、Ａｕ。Hf, Ta, W, Re, Os, Ir, Pt, Au.
ｐｂなる群の中から選ばれた少なくとも１種類以上の元
素）をそれぞれ提供するものである。at least one element selected from the group pb).
（実施例）
本発明になる磁性合金の製造装置の一実施例を第１図に
示す。(Example) An example of the magnetic alloy manufacturing apparatus according to the present invention is shown in FIG.
一対のターゲット５．５は鉄（Ｆｅ）とＣ１Ｇｅ等の合
金ターゲットか、或いは適当な四部を設けた純鉄のター
ゲットの凹部にチップ状のＣ８Ｇｅ等をはめ込んだ複合
ターゲットである。このターゲット５．５はターゲット
ホルダ９によって支えられており、このターゲット５と
ターゲットホルダ９には、直流電源１３よリマイナス電
位が印加され、更にこのターゲットホルダ９の周囲には
シールド４が取り付けである。The pair of targets 5.5 is either an alloy target of iron (Fe) and C1Ge or the like, or a composite target in which chip-shaped C8Ge or the like is fitted into a concave part of a pure iron target provided with four appropriate parts. This target 5.5 is supported by a target holder 9, and a negative potential is applied to the target 5 and the target holder 9 from a DC power supply 13, and a shield 4 is attached around the target holder 9. be.
又、このターゲットホルダ９の内部には、両ターゲット
５．５間にプラズマ１４を集束するための磁石６．６が
挿入され、かつターゲット５の表面の加熱を防ぐために
冷却水８が流入している。Further, inside this target holder 9, a magnet 6.6 for focusing the plasma 14 is inserted between both targets 5.5, and cooling water 8 flows in to prevent the surface of the target 5 from being heated. There is.
そして、接地された真空槽１５の左右に、２個のターゲ
ットホルダ９が絶縁体７によって絶縁されて設けられて
いる。Two target holders 9 are provided on the left and right sides of the grounded vacuum chamber 15 and are insulated by an insulator 7.
又、この真空槽１５の上部より、窒素（Ｎ２）アルゴン
（Ａｒ）がそれぞれ流量計１．２により、所定の流量に
調節されて導入されている。Further, nitrogen (N2) and argon (Ar) are introduced from the upper part of the vacuum chamber 15, each being adjusted to a predetermined flow rate by a flow meter 1.2.
なお、アルゴンは、ターゲット５をスパッタすると同時
に成膜する磁性合金膜中の窒素の量を調節するためのも
のである。Note that argon is used to adjust the amount of nitrogen in the magnetic alloy film formed at the same time as the target 5 is sputtered.
そして、真空槽１５の下部には基板ホルダ１２上に基板
１１が置かれ、不純物を防ぐためのシャッタ１０が基板
１１を覆っている。A substrate 11 is placed on a substrate holder 12 at the bottom of the vacuum chamber 15, and a shutter 10 for preventing impurities covers the substrate 11.
このようなスパッタ装置において、直流電源１３により
、左右のターゲットホルダ９に支えられたターゲット５
．５の間にプラズマ１４を発生させると、ターゲット５
はマイナス電位であるので、プラズマ１４中のアルゴン
イオン（Ａｒ″′）がターゲッット５に衝突し、ターゲ
ット５の鉄原子及びＣ，Ｇｅ等の原子が飛び出す。In such a sputtering apparatus, the target 5 supported by the left and right target holders 9 is powered by the DC power supply 13.
．． When the plasma 14 is generated between 5 and 5, the target 5
Since the potential is negative, argon ions (Ar'') in the plasma 14 collide with the target 5, and iron atoms and atoms such as C and Ge of the target 5 fly out.
そして、ターゲット５から飛び出した鉄とＣ５Ｇｅ等の
原子と、プラズマ中の窒素の原子または分子とが結合し
て、基板１１の上に成長していく。Then, atoms of iron, C5Ge, etc. ejected from the target 5 combine with nitrogen atoms or molecules in the plasma, and grow on the substrate 11.
なお、スパッタ開始後の数分間はシャッタｌＯを閉じて
基板１１を覆うことにより、ターゲット５の表面の不純
物が基板１１の上に付かないようにし、その後でシャッ
タ１０を開けるようにする。Note that the shutter 10 is closed to cover the substrate 11 for several minutes after the start of sputtering to prevent impurities on the surface of the target 5 from adhering to the substrate 11, and then the shutter 10 is opened.
そして、流量計１．２により窒素及びアルゴンの導入量
を調節することにより、所望の窒素を含んだＦｅｙＮｙ
Ｍｚ合金または、ＦｅｙＮｙＭｚＬｖ合金を得ることが
できる。Then, by adjusting the amount of nitrogen and argon introduced using the flowmeter 1.2, FeyNy containing the desired nitrogen is obtained.
Mz alloys or FeyNyMzLv alloys can be obtained.
この様にして得たＦ ｅ ｘＮｙ Ｍｚ合金の窒素及び
Ｃ，Ｇｅ等の元素の含有量と飽和磁束密度（Ｂｓ）、保
磁力（Ｈｃ）との関係を表１に示す。Table 1 shows the relationship between the contents of elements such as nitrogen, C, and Ge, and the saturation magnetic flux density (Bs) and coercive force (Hc) of the Fe x Ny Mz alloy thus obtained.
（以下余白）
表 １
表１は窒素、Ｃ５Ｇｅ等の含有量と飽和磁束密度（Ｂｓ
）、保磁力（Ｈｃ）との関係を示すものであり、含有量
はＥＳＣＡ（Ｘ線光電子分光分析法） 、ＥＰＭＡ （
Ｘ線マイクロアナライサ法）等による定量分析で原子％
て表しているが、±２０％程度の誤差が見込まれる。保
磁力は真空中ての熱処理を行った時の値であり、熱処理
温度はここでは３００ ’ ｃである。この内、試料番
号１はＦｅに窒素のみを含有させた時の結果であり、試
料番号２は、ＦｅにＣのみを含有させた時の結果である
。(Margins below) Table 1 Table 1 shows the content of nitrogen, C5Ge, etc. and the saturation magnetic flux density (Bs
), shows the relationship with coercive force (Hc), and the content is ESCA (X-ray photoelectron spectroscopy), EPMA (
Atomic % by quantitative analysis using X-ray microanalyzer method, etc.
However, an error of about ±20% is expected. The coercive force is the value when heat treatment is performed in vacuum, and the heat treatment temperature is 300'C here. Among these, sample number 1 is the result when Fe contains only nitrogen, and sample number 2 is the result when Fe contains only C.
試料番号３〜７は、本発明の磁性合金である。Sample numbers 3 to 7 are magnetic alloys of the present invention.
窒素の含有量が１原子％未満であると、顕著な窒素の効
果が見られずＨｃはほとんど低下しない。When the nitrogen content is less than 1 atomic %, no significant effect of nitrogen is observed and Hc hardly decreases.
また、第４図に示したように窒素の含有量がｌＯ原子％
以下であると、Ｂｓは１５ｋ Ｇ以上となる。In addition, as shown in Figure 4, the nitrogen content is lO atomic %.
If it is below, Bs will be 15kG or more.
従って、窒素の含有量が１−１０原子％である時、高Ｂ
ｓで低Ｈｃの磁性合金が得られる。Therefore, when the nitrogen content is 1-10 at%, high B
A low Hc magnetic alloy can be obtained at s.
第２図は、本発明になる磁性合金と従来例である窒化鉄
（ＦｅＮ）合金の熱処理温度による保磁力（Ｈｃ）の変
化を示す。窒化鉄は、熱処理温度３００° Ｃの時は比
較的Ｈｃが低いが３００°Ｃ以上にすると急激にＨｅが
増大する。これに対し本発明になる磁性合金は、Ｈｃが
小さく熱安定性にも優れていることが解る。ここで、Ｃ
，Ｇｅ等の合計の含有量が０，５原子％未満であると、
低Ｈｃ化と熱安定性の向上に対する顕著な効果は見られ
ず、１０原子％を越えるとＢｓが１５ｋＧ以上の磁性合
金が得られなくなる。従って、Ｃ，Ｇｅ等の合計の含有
量が０．５〜ｌＯ原子％の時、高Ｂｓ・低Ｈｃで熱安定
性にも優れた磁性合金を得ることができる。FIG. 2 shows the change in coercive force (Hc) of the magnetic alloy according to the present invention and a conventional iron nitride (FeN) alloy depending on the heat treatment temperature. Iron nitride has a relatively low Hc when the heat treatment temperature is 300°C, but when the heat treatment temperature is 300°C or higher, the He rapidly increases. In contrast, it can be seen that the magnetic alloy of the present invention has a small Hc and excellent thermal stability. Here, C
, Ge, etc., the total content is less than 0.5 at%,
No remarkable effect on lowering Hc and improving thermal stability is observed, and if it exceeds 10 at %, a magnetic alloy with Bs of 15 kG or more cannot be obtained. Therefore, when the total content of C, Ge, etc. is 0.5 to 10 atomic %, a magnetic alloy with high Bs, low Hc and excellent thermal stability can be obtained.
また、第３図は、膜厚を２μｍとした時の本発明になる
磁性合金の透磁率μと周波数の関係を示す。Further, FIG. 3 shows the relationship between the magnetic permeability μ and frequency of the magnetic alloy according to the present invention when the film thickness is 2 μm.
本発明になる磁性合金は、透磁率が３０００と高く、磁
気ヘッドとして十分な再生効率が得られることが解る。It can be seen that the magnetic alloy according to the present invention has a magnetic permeability as high as 3000, and can obtain sufficient reproduction efficiency as a magnetic head.
表 ２
表２はＴｉ５Ｃｒ等の元素が耐蝕性の向上に寄与するこ
とを示したものである。Table 2 Table 2 shows that elements such as Ti5Cr contribute to improving corrosion resistance.
実験は、試料を６（１’ｃ−９（１％の恒温恒湿中に放
置し、１０００時間経過後に腐蝕痕が見られないものを
○、腐蝕痕か生したものを×として耐蝕性を示した。試
料番号２１は、比較例であるＦｅＮ合金、試料番号２２
は、Ｆｅ−Ｎ−Ｃ合金、試料番号２３〜４７は、Ｆｅ−
Ｎ−Ｃ合金にＴｉ、Ｃｒ等の元素を添加した合金であり
、試料番号２２〜４７は、本発明になる磁性合金である
。ここて、Ｔｉ、Ｃｒ等の合計の含有量が０．３原子％
未満であると、耐蝕性に対する顕著な効果が見られず、
１０原子％を越えると１５ｋＧ以上のＢｓが得られなく
なる。従って、Ｔｉ、Ｖ、Ｃｒ、Ｃｏ、Ｎｉ、Ｃｕ、Ｙ
、Ｚｒ。In the experiment, the samples were left in a constant temperature and humidity environment of 6 (1'C-9 (1%), and the corrosion resistance was evaluated as ○ for those with no corrosion marks after 1000 hours, and × for those with corrosion marks. Sample number 21 is a comparative example of FeN alloy, sample number 22
is Fe-N-C alloy, and sample numbers 23 to 47 are Fe-N-C alloy.
These are alloys in which elements such as Ti and Cr are added to an N-C alloy, and sample numbers 22 to 47 are magnetic alloys according to the present invention. Here, the total content of Ti, Cr, etc. is 0.3 at%
If it is less than that, there will be no noticeable effect on corrosion resistance,
If it exceeds 10 atomic %, Bs of 15 kG or more cannot be obtained. Therefore, Ti, V, Cr, Co, Ni, Cu, Y
, Zr.
Ｎｂ、Ｍｏ、Ｒｕ、Ｒｈ、Ｐｄ、Ａｇ、Ｓｎ。Nb, Mo, Ru, Rh, Pd, Ag, Sn.
Ｓｂ、Ｈｆ、Ｔａ、Ｗ、Ｒｅ、Ｏｓ、Ｉ ｒ、Ｐｔ。Sb, Hf, Ta, W, Re, Os, Ir, Pt.
Ａυ、Ｐｂの合計の含有量が０，３〜ＩＯ原子％である
時、磁気特性と耐蝕性に優れた磁性合金が得られる。When the total content of Aυ and Pb is 0.3 to IO atomic %, a magnetic alloy with excellent magnetic properties and corrosion resistance can be obtained.
（発明の効果）
本発明は、以上のような組成の磁性合金とすることによ
り、高飽和磁束密度を有し、保磁力が小さく、透磁率が
大きく、更に熱安定性と耐蝕性に優れた磁気ヘッド等の
磁気デバイス用磁性合金が得られる。従って、本発明の
磁性合金を用いれば、高保磁力媒体への良好な記録再生
が行える他、高性能の薄膜磁気ヘッド等を作成すること
ができ、高密度磁気記録再生が実現できる。(Effects of the Invention) The present invention provides a magnetic alloy having the composition described above, which has high saturation magnetic flux density, low coercive force, high magnetic permeability, and excellent thermal stability and corrosion resistance. A magnetic alloy for magnetic devices such as magnetic heads is obtained. Therefore, by using the magnetic alloy of the present invention, it is possible to perform good recording and reproducing on a high coercive force medium, and also to create a high-performance thin film magnetic head and the like, and realize high-density magnetic recording and reproducing.
第１図は、本発明になる磁性合金を製造する装置の一実
施例であるスパッタ装置の概略図、第２図は、熱処理温
度によるＨｃの変化を表す図、第３図は、透磁率μと周
波数の関係を示す図、第４図は、ＦｅＮ合金における窒
素含有量と飽和磁束密度の関係（Ｂｓ）を示す図である
。FIG. 1 is a schematic diagram of a sputtering apparatus which is an embodiment of the apparatus for manufacturing the magnetic alloy according to the present invention, FIG. 2 is a diagram showing changes in Hc depending on heat treatment temperature, and FIG. 3 is a diagram showing magnetic permeability μ FIG. 4 is a diagram showing the relationship between nitrogen content and saturation magnetic flux density (Bs) in FeN alloy.
Claims (1)
ｙ，ｚで示される原子％が １≦ｙ≦１０ ０．５≦ｚ≦１０ ｘ＋ｙ＋ｚ＝１００ なる関係を有する磁性合金。（但しＭはＣまたはＧｅま
たはＣとＧｅの混合物） （２）Ｆｅ＿ｘＮ＿ｙＭ＿ｚＬ＿ｖなる組成式で表され
、ｘ，ｙ，ｚ，ｖで示される原子％が １≦ｙ≦１０ ０・５≦ｚ≦１０ ０．３≦ｖ≦１０ ｘ＋ｙ＋ｚ＋ｖ＝１００ なる関係を有する磁性合金。（但しＭはＣまたはＧｅま
たはＣとＧｅの混合物であり、ＬはＴｉ，Ｖ，Ｃｒ，Ｃ
ｏ，Ｎｉ，Ｃｕ，Ｙ，Ｚｒ，Ｎｂ，Ｍｏ，Ｒｕ，Ｒｈ，
Ｐｄ，Ａｇ，Ｓｎ，Ｓｂ，Ｈｆ，Ｔａ，Ｗ，Ｒｅ，Ｏｓ
，Ｉｒ，Ｐｔ，Ａｕ，Ｐｂなる群の中から選ばれた少な
くとも１種類以上の元素）[Claims] (1) Represented by the compositional formula Fe_xN_yM_z, x,
A magnetic alloy in which the atomic % represented by y and z has the following relationship: 1≦y≦10 0.5≦z≦10 x+y+z=100. (However, M is C, Ge, or a mixture of C and Ge) (2) It is represented by the composition formula Fe_xN_yM_zL_v, and the atomic % represented by x, y, z, and v is 1≦y≦10 0.5≦z≦10 A magnetic alloy having the following relationship: 0.3≦v≦10 x+y+z+v=100. (However, M is C or Ge or a mixture of C and Ge, and L is Ti, V, Cr, C
o, Ni, Cu, Y, Zr, Nb, Mo, Ru, Rh,
Pd, Ag, Sn, Sb, Hf, Ta, W, Re, Os
, Ir, Pt, Au, Pb)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2071286A JPH03270203A (en) | 1990-03-20 | 1990-03-20 | Magnetic alloy |
| US07/598,515 US5154983A (en) | 1989-10-18 | 1990-10-16 | Magnetic alloy |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2071286A JPH03270203A (en) | 1990-03-20 | 1990-03-20 | Magnetic alloy |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03270203A true JPH03270203A (en) | 1991-12-02 |
Family
ID=13456307
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2071286A Pending JPH03270203A (en) | 1989-10-18 | 1990-03-20 | Magnetic alloy |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03270203A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5478416A (en) * | 1993-01-29 | 1995-12-26 | Canon Kabushiki Kaisha | Magnetic alloy |
| JP2019531889A (en) * | 2016-10-05 | 2019-11-07 | エクソンモービル ケミカル パテンツ インコーポレイテッド | Method for producing metal nitride and metal carbide |
-
1990
- 1990-03-20 JP JP2071286A patent/JPH03270203A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5478416A (en) * | 1993-01-29 | 1995-12-26 | Canon Kabushiki Kaisha | Magnetic alloy |
| JP2019531889A (en) * | 2016-10-05 | 2019-11-07 | エクソンモービル ケミカル パテンツ インコーポレイテッド | Method for producing metal nitride and metal carbide |
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