JPH02175619A - Magnetic alloy - Google Patents
Magnetic alloyInfo
- Publication number
- JPH02175619A JPH02175619A JP63331296A JP33129688A JPH02175619A JP H02175619 A JPH02175619 A JP H02175619A JP 63331296 A JP63331296 A JP 63331296A JP 33129688 A JP33129688 A JP 33129688A JP H02175619 A JPH02175619 A JP H02175619A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- alloy
- target
- oxygen
- coercive force
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910001004 magnetic alloy Inorganic materials 0.000 title claims abstract description 24
- 239000000203 mixture Substances 0.000 claims abstract description 9
- 230000000737 periodic effect Effects 0.000 claims description 6
- 229910045601 alloy Inorganic materials 0.000 abstract description 19
- 239000000956 alloy Substances 0.000 abstract description 19
- 229910052782 aluminium Inorganic materials 0.000 abstract description 15
- 230000004907 flux Effects 0.000 abstract description 11
- 229910052733 gallium Inorganic materials 0.000 abstract description 6
- 239000000463 material Substances 0.000 abstract description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 19
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 16
- 229910052760 oxygen Inorganic materials 0.000 description 15
- 239000001301 oxygen Substances 0.000 description 15
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 14
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 7
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 6
- 238000005260 corrosion Methods 0.000 description 6
- 230000007797 corrosion Effects 0.000 description 6
- 229910052742 iron Inorganic materials 0.000 description 6
- 229910052700 potassium Inorganic materials 0.000 description 6
- 239000011591 potassium Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 4
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 229910052707 ruthenium Inorganic materials 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 239000000696 magnetic material Substances 0.000 description 3
- 229910000929 Ru alloy Inorganic materials 0.000 description 2
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 230000005415 magnetization Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910001020 Au alloy Inorganic materials 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- 241000047428 Halter Species 0.000 description 1
- 241000917012 Quercus floribunda Species 0.000 description 1
- -1 argon ions Chemical class 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000004453 electron probe microanalysis Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000003353 gold alloy Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 229910001337 iron nitride Inorganic materials 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 238000004445 quantitative analysis Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910000702 sendust Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
- H01F1/01—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
- H01F1/03—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
- H01F1/12—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials
- H01F1/33—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials mixtures of metallic and non-metallic particles; metallic particles having oxide skin
Landscapes
- Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Compounds Of Iron (AREA)
- Hard Magnetic Materials (AREA)
- Soft Magnetic Materials (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、特に高密度磁気記録用の磁気ヘッドに適する
磁性合金に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a magnetic alloy particularly suitable for a magnetic head for high-density magnetic recording.
（従来の技術）
近年、磁気記録の高密度化や広帯域化の必要性が高まり
、磁気記録媒体に高い抗磁力を有する磁性材料を使用し
て記録トラック幅を狭くすることにより、高密度記録再
生を実現している。(Prior art) In recent years, the need for higher density and wider band magnetic recording has increased, and high-density recording and reproduction is possible by narrowing the recording track width by using magnetic materials with high coercive force in magnetic recording media. has been realized.
そして、この高い抗磁力を持つ磁気記録媒体に記録再生
するだめの磁気ヘッド材料として、飽和磁束密度の高い
磁性合金か必要とされており、センタスト合金や非晶質
合金等をコアの一部または全部に使用した磁気ヘッドか
提案されている。A magnetic alloy with a high saturation magnetic flux density is required as a magnetic head material for recording and reproducing on magnetic recording media with high coercive force, and centast alloys and amorphous alloys are used as part of the core It has been proposed that magnetic heads be used for all of them.
しかしながら、磁気記録媒体の高抗磁力化が一段と進み
、抗磁力か２００００ ｅ以上になるとセンダス１へ合
金や非晶質合金を使用した磁気ヘッドでは良好な磁気記
録再生が困難になった。However, as the coercive force of magnetic recording media continues to increase and the coercive force exceeds 20,000 e, it becomes difficult to perform good magnetic recording and reproduction with magnetic heads using Sendas 1 alloys or amorphous alloys.
また、磁気記録媒体の長手方向ではなく、厚さ方向に磁
化して記録する垂直磁化記録方式も提案されているが、
この垂直磁化記録方式を良好に行うには、磁気ヘッドの
主磁極の先端部の厚さを０．５μｍ以下にする必要があ
り、比較的抗磁力の低い磁気記録媒体に記録するのにも
、高い飽和磁束密度を持つ磁気ヘッドが必要とされてい
る。Additionally, a perpendicular magnetization recording method has been proposed in which the magnetic recording medium is magnetized in the thickness direction rather than in the longitudinal direction.
In order to successfully perform this perpendicular magnetization recording method, the thickness of the tip of the main pole of the magnetic head must be 0.5 μm or less, and even when recording on a magnetic recording medium with relatively low coercive force, There is a need for a magnetic head with high saturation magnetic flux density.
そして、センダスト合金や非晶質合金等よりも飽和磁束
密度の高い磁気ヘッド用合金として窒化鉄、Ｆｅ−８ｔ
系合金等の鉄を主成分とした磁性合金が知られている。Iron nitride, Fe-8t, is an alloy for magnetic heads that has a higher saturation magnetic flux density than sendust alloys and amorphous alloys.
Magnetic alloys containing iron as a main component such as alloys are known.
（発明が解決しようとする課題）
ところが、従来より知られている高飽和磁束密度の磁性
合金は、保磁力が大きくそのままでは磁気ヘッドの材料
としては不十分であるので、センダスト合金やパーマロ
イ等の保磁力の小さい磁性材料を眉間膜として使用した
多層膜構造の磁気ヘッドが提案されている。(Problem to be Solved by the Invention) However, conventionally known magnetic alloys with high saturation magnetic flux density have a large coercive force and are not sufficient as materials for magnetic heads as they are. A magnetic head with a multilayer structure using a magnetic material with a low coercive force as a glabellar film has been proposed.
しかし、多層膜構造にするには工数やコストがかかり、
信頼性を保つのも離しいという問題があった。特に、数
μｍ以上の膜厚にする為には場合によっては１００層以
上の多層膜４１１造にする必要があり、使用範囲も限ら
れていた。However, creating a multilayer film structure requires many man-hours and costs.
There was also the problem that it was difficult to maintain reliability. In particular, in order to obtain a film thickness of several micrometers or more, it is necessary to form a multilayer film 411 with 100 or more layers in some cases, and the range of use has been limited.
そこで、本発明は多層構造にしなくても高飽和磁束密度
を持ち、且つ保磁力の小さい磁性合金を提供することを
目的とする。Therefore, an object of the present invention is to provide a magnetic alloy that has a high saturation magnetic flux density without having a multilayer structure and has a small coercive force.
（課題を解決するための手段）
本発明は上記課題に鑑みてなされたものでありＦｅｗＭ
ｘｏｙなる組成で表わされ、ｗ、ｘｙで示される原子％
は
５５≦ｗ≦９８
１≦ｘ≦２５
１≦ｙ≦２０
ｗ ＋ｘ ＋ Ｖ−１００
なる関係を有し、但しＭは元素周期律表ＩＩＩｂ族の少
なくとも１種以上の元素である磁性合金、およびＦｅｗ
ＭｘＯ，Ｒｕ７なる組成で表わされｗ、ｘ、ｙ、ｚで示
される原子％は
５５≦ｗ≦９７．７
１≦ｘ≦２５
１≦ｙ≦２０
０．３ ≦２
１．３≦ｘ＋ｚ≦２５
ｗ＋ｘ＋ｙ＋ｚ＝１００
なる関係を有し、但しＭは元素周期律表Ｉｂ族の少なく
とも１種以上の元素である磁性合金を提供するものであ
る。(Means for Solving the Problems) The present invention has been made in view of the above problems, and is
It is expressed by the composition xoy, and the atomic % is indicated by w, xy.
has the following relationship: 55≦w≦98 1≦x≦25 1≦y≦20 w + Few
The atomic % represented by the composition MxO, Ru7 and indicated by w, x, y, and z is 55≦w≦97.7 1≦x≦25 1≦y≦20 0.3≦2 1.3≦x+z≦ 25 w+x+y+z=100, where M is at least one element of Group Ib of the Periodic Table of Elements.
（実施例）
本発明の磁気ヘッド用磁性合金の製造装置の一例を第一
図に示す。(Example) An example of a manufacturing apparatus for a magnetic alloy for a magnetic head according to the present invention is shown in FIG.
対向配置された一対のターゲット５．５は、元素周期律
表ＩＩＩｂ族の元素である鉄（Ｆｅ）とアルミニウム（
ＡＩ）またはガリウム（Ｇａ）の合金ターゲットか、或
いは適当な凹部を設けた純鉄のターゲットの凹部にチッ
プ状のＡ１をはめ込んだ複合ターゲットである。このタ
ーゲット５５はターゲットホルダー９．９によって支え
られており、このターゲット５とターゲットホルダー９
には、直流電源１３よりマイナス電位が印加され、ター
ゲットホルダー９の周囲にはシールド４が取付けである
。A pair of targets 5.5 facing each other are made of iron (Fe), which is an element of group IIIb of the periodic table of elements, and aluminum (
The target is an alloy target of AI) or gallium (Ga), or a composite target in which a chip-shaped A1 is fitted into the recess of a pure iron target provided with an appropriate recess. This target 55 is supported by a target holder 9.9, and this target 5 and target holder 9.
A negative potential is applied from a DC power supply 13 to the target holder 9, and a shield 4 is attached around the target holder 9.
また、このターゲットホルダー９の内部には、両ターゲ
ット５．５間にプラズマ１４を集束するための磁石６が
挿入され、ターゲット５の表面の加熱を防ぐなめに冷却
水８が流入している。Further, a magnet 6 for focusing the plasma 14 is inserted between the two targets 5.5 inside the target holder 9, and cooling water 8 flows into the target holder 9 to prevent the surface of the target 5 from being heated.
そして、接地された真空槽３の左右に、２個のターゲッ
トホルタ−９が絶縁体７によって絶縁されて設けられて
いる。Two target halters 9 are provided on the left and right sides of the grounded vacuum chamber 3 and are insulated by an insulator 7.
また、この真空槽３の上部より、酸素（０２）、アルゴ
ン（Ａ ｒ ）がそれぞれ流量計１〜２により、所定の
流量に調節されて導入されている。Furthermore, oxygen (02) and argon (Ar) are introduced from the upper part of the vacuum chamber 3, each of which is adjusted to a predetermined flow rate by flowmeters 1 and 2.
なお、アルゴンは、ターゲット５をスパッタすると同時
に成膜する磁性合金膜中の酸素の量を調節するためのも
のである。Note that argon is used to adjust the amount of oxygen in the magnetic alloy film formed at the same time as the target 5 is sputtered.
そして、真空槽３の下部には、基板ホルダー１２上に基
板１１か置かれ、不純物を防ぐためのシャッター１０が
基板１１を覆っている。A substrate 11 is placed on a substrate holder 12 at the bottom of the vacuum chamber 3, and a shutter 10 for preventing impurities covers the substrate 11.
このようなスパッタ装置において、直流電源１３により
、左右のターゲットホルダー９に支えられなターゲット
５，５間にプラズマ１４を発生させると、ターゲット５
はマイナス電位であるので、プラズマ１４中のアルゴン
イオン（Ａｒ ”）かターゲット５に衝突し、ターゲ
ット５の鉄原子が飛び出ず。In such a sputtering apparatus, when plasma 14 is generated between the targets 5 supported by the left and right target holders 9 by the DC power supply 13, the target 5
Since the potential is negative, the argon ions (Ar'') in the plasma 14 collide with the target 5, and the iron atoms in the target 5 do not fly out.
そして、ターケラ１〜５から飛び出した鉄原子と、プラ
ズマ中の酸素の原子または分子とが結合して、基板ＩＪ
の上に成長していく。Then, the iron atoms ejected from Terkera 1 to 5 combine with oxygen atoms or molecules in the plasma, and the substrate IJ
will grow on top of.
なお、スパッタ開始後の数分間は、シャッター１０を閉
じて基板１１を覆うことにより、ターゲラｌ−５の表面
の不純物か基板１１の上に付かないようにし、その後で
シャッター１０を開けるようにする。Note that for several minutes after the start of sputtering, the shutter 10 is closed to cover the substrate 11 to prevent impurities on the surface of Targetera l-5 from adhering to the substrate 11, and then the shutter 10 is opened. .
そして、流量計１〜２により、酸素、アルゴンの導入量
を調節することにより、所望の酸素を含んたＦｅ、、Ｍ
、Ｏｙ金合金得ることができる。Then, by adjusting the amount of oxygen and argon introduced using flowmeters 1 and 2, desired oxygen-containing Fe, M
, Oy gold alloy can be obtained.
このようにして得たＦｅヵＭｘＯｙ合金の酸素およびＡ
ＩまたはＧａの含有量と飽和磁束密度（Ｂｓ）、保磁力
（Ｈｃ）との関係を表に示す。Oxygen and A of the FecaMxOy alloy thus obtained
The relationship between the I or Ga content, saturation magnetic flux density (Bs), and coercive force (Hc) is shown in the table.
（以下、余白）
表は酸素およびアルミニウムまたはカリウムの含有量と
飽和磁束密度（Ｂｓ）、保磁力（Ｈｃ）との関係を示す
表であり、含有量はＥＳＣＡ （Ｘ線光電子分光分析法
） 、ＥＰＭＡ （Ｘ線マイクロアナライザ法）等によ
る定量分析で原子％で表している。この内、試料番号１
は鉄のみの場合の結果であり、試料番号２は鉄に酸素の
みを含有させた時の結果である。この表から、鉄と、ア
ルミニウムまたはガリウムの合金に酸素を適量添加する
ことによりＨｃか低下し、優れた軟磁気特性を示すよう
になっているのか判る。また、アルミニウムまたはガリ
ウムの含有量か増加すると、磁性合金の飽和磁束密度（
Ｂｓ）か低下する。アルミニウムまなはカリウムの含有
量が２５原子％以上であればＢｓが１０ｋＧ以上の高飽
和磁束密度を持つ磁性合金か得られる。(Hereinafter, blank space) The table shows the relationship between the content of oxygen and aluminum or potassium, saturation magnetic flux density (Bs), and coercive force (Hc), and the content is determined by ESCA (X-ray photoelectron spectroscopy), Expressed in atomic % by quantitative analysis using EPMA (X-ray microanalyzer method) or the like. Among these, sample number 1
is the result when only iron is used, and sample number 2 is the result when only oxygen is contained in iron. From this table, it can be seen that by adding an appropriate amount of oxygen to an alloy of iron and aluminum or gallium, Hc is lowered and the alloy exhibits excellent soft magnetic properties. Also, as the content of aluminum or gallium increases, the saturation magnetic flux density (
Bs) decreases. If the content of aluminum or potassium is 25 atomic % or more, a magnetic alloy with a high saturation magnetic flux density of Bs of 10 kG or more can be obtained.
ここで、酸素の含有量が１原子％未満であると、顕著な
酸素の効果かみられずＨＣはほとんど低下しない。また
、酸素の含有量が２０原子％を越えると軟磁気特性か大
幅に劣化し、Ｂｓの低下とＨＣの増大か起こる。したか
って、酸素の含有量が１〜２０原子％、さらに好ましく
は３〜１２原子％であるとＢｓが高くかつＨｃの小さい
磁性合金が得られる。一方、アルミニウムまたはカリウ
ムの合計の含有量か１原子％未満であると、酸素の添加
による低Ｈｃ化が見られず、資料番号２に示されている
鉄に酸素のみを添加した場合と類似してＨｃが増大する
。また、アルミニウムまたはカリウムの合計の含有量か
２５原子％を越えるとＢｓが１０ＫＧより小さくなり、
本発明の目的である高Ｂｓ特性が得られなくなり場合に
よっては１−Ｉｃの増大も見られる。したかって、アル
ミニウムまたはカリウムの合計の含有量か１〜２５原子
％であれはＢＳか高く、かつＨＣの小さい磁性合金が得
られることになる。Here, when the oxygen content is less than 1 atomic %, no significant effect of oxygen is observed and HC hardly decreases. Furthermore, if the oxygen content exceeds 20 at %, the soft magnetic properties will be significantly deteriorated, resulting in a decrease in Bs and an increase in HC. Therefore, when the oxygen content is 1 to 20 atomic %, more preferably 3 to 12 atomic %, a magnetic alloy with high Bs and low Hc can be obtained. On the other hand, if the total content of aluminum or potassium is less than 1 atomic percent, no reduction in Hc is observed due to the addition of oxygen, which is similar to the case where only oxygen is added to iron shown in document number 2. As a result, Hc increases. In addition, if the total content of aluminum or potassium exceeds 25 at%, Bs becomes less than 10KG,
The high Bs characteristic that is the object of the present invention cannot be obtained, and in some cases, an increase in 1-Ic is also observed. Therefore, if the total content of aluminum or potassium is 1 to 25 at %, a magnetic alloy with high BS and low HC can be obtained.
したがって、ＦｅＷＭｘＯｙなる式で示される組成の合
金において、ｗ、ｘ、ｙが次のような原子％の時に優れ
た軟磁気特性を示す磁性合金か得られる。Therefore, in an alloy having a composition represented by the formula FeWMxOy, a magnetic alloy exhibiting excellent soft magnetic properties can be obtained when w, x, and y are in the following atomic %.
（但し、Ｍはアルミニウムまたはカリウム）５５≦ｗ≦
９８
とか判る、さらに、酸素が含まれている場合、ル１≦ｘ
≦２５
１≦ｙ≦２０
ｗ＋ｘ＋’ｙ＝１００
また、ターゲット５を鉄（Ｆｅ）とルテニウム（Ｒｕ
）とアルミニウム（ＡＩ）またはガリウム（Ｇａ）の合
金ターゲットか、或いは適当な凹部を設けた純鉄のター
ゲットの凹部にチップ状のＲｕとＡＩまたはＧａをはめ
込んだ複合ターゲットを用いて上記と同様にスパッタを
行うことにより、Ｆｅ Ｍ ＯＲｕ、合金を得るこ
とかできＷ ｘ ｙ
る。Ｆｅ、ＭｘＯ，合金および
Ｆｅ Ｍ ＯＲｕ 合金を２％塩水に浸した後、
ｖｉｘｙ ｚ
これを取り出し、更に６０℃−９０％の高温高温中で耐
蝕試験を行った結果を第２図に示す。第２図は、初期の
Ｂｓ （Ｂｓ（０））と試験後の経過時間でのＢｓ （
Ｂｓ（ｔ））の割合と、経過時間との関係を示している
。(However, M is aluminum or potassium) 55≦w≦
98.Furthermore, if oxygen is included, Le1≦x
≦25 1≦y≦20 w+x+'y=100 In addition, the target 5 is iron (Fe) and ruthenium (Ru
) and aluminum (AI) or gallium (Ga), or a composite target in which chip-shaped Ru and AI or Ga are inserted into the recesses of a pure iron target with appropriate recesses. By performing sputtering, an Fe MORu alloy can be obtained. After soaking Fe, MxO, alloy and Fe M ORu alloy in 2% salt water,
vixy z This was taken out and further subjected to a corrosion resistance test at a high temperature of 60° C.-90%. The results are shown in FIG. Figure 2 shows the initial Bs (Bs(0)) and the Bs (Bs(0)) at the elapsed time after the test.
It shows the relationship between the ratio of Bs(t)) and the elapsed time.
この第２図から、これらの合金にルテニウムを適量添加
することによって、耐蝕性が向上するこテニウムの含有
量か少ないと耐蝕性は逆に悪くなるということを第２図
は示している。従って、Ｆｅ Ｍ ＯＲｕ なる
式で示される組成の合ｗｘｙ ｚ
金において、ｗ、ｘ、ｙ、ｚか次のような原子％の時に
優れた軟磁気特性を示し、且つ耐蝕性の優れた磁性合金
か得られる。FIG. 2 shows that by adding an appropriate amount of ruthenium to these alloys, the corrosion resistance can be improved, but if the content of ruthenium is too low, the corrosion resistance becomes worse. Therefore, in the alloy wxy z with the composition represented by the formula Fe M ORu , it is a magnetic alloy that exhibits excellent soft magnetic properties and has excellent corrosion resistance when w, x, y, z is in the following atomic %. or can be obtained.
５５≦ｗ≦９７，７
１ ≦ｘ≦２５
１≦ｙ≦２０
０．３≦ｚ
１．３≦ｘ十Ｚ≦２５
ｗ＋ｘ＋ｙ＋ｚ＝１００
なお、本発明の実施例で使用した元素周期律表ＩＩＩｂ
族の元素のＡＩとＧａとの混合物を採用しても良く、ま
た同元素周期律表ＩＩＩｂ族の他の元素であるＩｎ（イ
ンジウム）、Ｔｌタリウム）を採用しても良い。55≦w≦97,7 1≦x≦25 1≦y≦20 0.3≦z 1.3≦x10Z≦25 w+x+y+z=100 Note that the periodic table of elements IIIb used in the examples of the present invention
A mixture of AI and Ga, which are elements of the same group, may be used, or other elements of group IIIb of the periodic table, such as In (indium) and thallium (Tl), may be used.
（発明の効果）
以上のような組成の磁性合金にすることにより高飽和磁
束密度を有し、且つ低保磁力であり、更に、耐蝕性の優
れた磁気ヘッド用磁性合金が得られる。従って、本発明
の磁性合金を用いれば、高保磁力磁気媒体への良好な記
録再生が行え、高密度磁気記録再生が実現できる。(Effects of the Invention) By making a magnetic alloy having the above composition, a magnetic alloy for a magnetic head having a high saturation magnetic flux density, a low coercive force, and excellent corrosion resistance can be obtained. Therefore, by using the magnetic alloy of the present invention, it is possible to perform good recording and reproduction on a high coercive force magnetic medium, and realize high-density magnetic recording and reproduction.
また、本発明の磁性合金と、他の軟磁性材（センタスト
等）とを交互に積層して、多層構造とすることにより、
さらに保磁力の低下が期待できるが、本発明の磁性合金
だけの単層構造でも優れた磁気特性を有する磁性合金が
得られる。In addition, by alternately laminating the magnetic alloy of the present invention and other soft magnetic materials (such as Centast) to form a multilayer structure,
Although a further decrease in coercive force can be expected, a magnetic alloy having excellent magnetic properties can be obtained even with a single layer structure of only the magnetic alloy of the present invention.
第１図は、本発明の磁性合金製造法の一例であるスパッ
タ装置の概略図、第２図は本発明の磁性合金のＦｅ−Ａ
ｌ −〇−Ｒｕ合金及びＦｅ−Ａｌ−Ｒｕ合金において
Ｒｕ（ルテニウム）の含有量による耐蝕性の違いを表す
図である。
特許出願人 日本ビクター株式会社
代表者垣本邦夫FIG. 1 is a schematic diagram of a sputtering apparatus which is an example of the method for manufacturing the magnetic alloy of the present invention, and FIG.
1 is a diagram showing the difference in corrosion resistance depending on the content of Ru (ruthenium) in l-〇-Ru alloy and Fe-Al-Ru alloy. Patent applicant: Kunio Kakimoto, representative of Victor Japan Co., Ltd.
Claims (1)
ｘ，ｙで示される原子％は ５５≦ｗ≦９８ １≦ｘ≦２５ １≦ｙ≦２０ ｗ＋ｘ＋ｙ＝１００ なる関係を有し、但しＭは元素周期律表IIIｂ族の少な
くとも１種以上の元素である磁性合金。 （２）Ｆｅ＿ｗＭ＿ｘＯ＿ｙＲｕ＿ｚなる組成で表わさ
れｗ，ｘ，ｙ，ｚで示される原子％は ５５≦ｗ≦９７．７ １≦ｘ≦２５ １≦ｙ≦２０ ０．３≦ｚ １．３≦ｘ＋ｚ≦２５ ｗ＋ｘ＋ｙ＋ｚ＝１００ なる関係を有し、但しＭは元素周期律表IIIｂ族の少な
くとも１種以上の元素である磁性合金。[Claims] (1) Represented by the composition Fe_wM_xO_y, w,
The atomic % represented by x and y has the following relationship: 55≦w≦98 1≦x≦25 1≦y≦20 w+x+y=100, provided that M is at least one element of group IIIb of the periodic table of elements. A certain magnetic alloy. (2) The atomic % represented by the composition Fe_wM_xO_yRu_z and indicated by w, x, y, z is 55≦w≦97.7 1≦x≦25 1≦y≦20 0.3≦z 1.3≦x+z A magnetic alloy having the following relationship: ≦25 w+x+y+z=100, where M is at least one element of Group IIIb of the Periodic Table of Elements.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63331296A JPH02175619A (en) | 1988-12-28 | 1988-12-28 | Magnetic alloy |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63331296A JPH02175619A (en) | 1988-12-28 | 1988-12-28 | Magnetic alloy |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02175619A true JPH02175619A (en) | 1990-07-06 |
Family
ID=18242100
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63331296A Pending JPH02175619A (en) | 1988-12-28 | 1988-12-28 | Magnetic alloy |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02175619A (en) |
-
1988
- 1988-12-28 JP JP63331296A patent/JPH02175619A/en active Pending
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