JPS633406A - Magnetically soft thin film - Google Patents
Magnetically soft thin filmInfo
- Publication number
- JPS633406A JPS633406A JP14622686A JP14622686A JPS633406A JP S633406 A JPS633406 A JP S633406A JP 14622686 A JP14622686 A JP 14622686A JP 14622686 A JP14622686 A JP 14622686A JP S633406 A JPS633406 A JP S633406A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- soft magnetic
- magnetically soft
- soft thin
- sputtering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 35
- 239000000203 mixture Substances 0.000 claims abstract description 19
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 11
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 11
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 11
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 9
- 230000005291 magnetic effect Effects 0.000 claims description 54
- 229910052759 nickel Inorganic materials 0.000 claims description 11
- 229910052741 iridium Inorganic materials 0.000 claims description 10
- 229910052748 manganese Inorganic materials 0.000 claims description 10
- 229910052750 molybdenum Inorganic materials 0.000 claims description 10
- 229910052702 rhenium Inorganic materials 0.000 claims description 10
- 229910052707 ruthenium Inorganic materials 0.000 claims description 10
- 229910052721 tungsten Inorganic materials 0.000 claims description 10
- 229910052804 chromium Inorganic materials 0.000 claims description 9
- 229910052762 osmium Inorganic materials 0.000 claims description 9
- 229910052763 palladium Inorganic materials 0.000 claims description 9
- 229910052697 platinum Inorganic materials 0.000 claims description 9
- 229910052735 hafnium Inorganic materials 0.000 claims description 8
- 239000000956 alloy Substances 0.000 abstract description 19
- 229910045601 alloy Inorganic materials 0.000 abstract description 19
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 abstract description 18
- 238000000034 method Methods 0.000 abstract description 12
- 238000004544 sputter deposition Methods 0.000 abstract description 9
- 229910052782 aluminium Inorganic materials 0.000 abstract description 6
- 229910052742 iron Inorganic materials 0.000 abstract description 6
- 239000000758 substrate Substances 0.000 abstract description 6
- 229910052732 germanium Inorganic materials 0.000 abstract description 5
- 238000010438 heat treatment Methods 0.000 abstract description 5
- 239000000654 additive Substances 0.000 abstract description 3
- 230000000996 additive effect Effects 0.000 abstract description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 2
- 239000012300 argon atmosphere Substances 0.000 abstract description 2
- 229910017052 cobalt Inorganic materials 0.000 abstract description 2
- 239000010941 cobalt Substances 0.000 abstract description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 abstract description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 abstract description 2
- 239000011521 glass Substances 0.000 abstract description 2
- 230000006698 induction Effects 0.000 abstract description 2
- 238000001552 radio frequency sputter deposition Methods 0.000 abstract description 2
- 238000001704 evaporation Methods 0.000 description 8
- 230000008020 evaporation Effects 0.000 description 7
- 230000004907 flux Effects 0.000 description 7
- 239000011162 core material Substances 0.000 description 6
- 239000010408 film Substances 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910018459 Al—Ge Inorganic materials 0.000 description 1
- 229910001444 Cr+ Inorganic materials 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005294 ferromagnetic effect Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000006247 magnetic powder Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000003550 marker Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011120 plywood Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000000700 radioactive tracer Substances 0.000 description 1
- 229910000702 sendust Inorganic materials 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、良好な軟磁気特性を示し高保磁力記録媒体用
の磁気ヘッド材料等に好適な軟磁性薄膜に関するもので
ある。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a soft magnetic thin film that exhibits good soft magnetic properties and is suitable for magnetic head materials for high coercive force recording media.
本発明は、Ｆｅ、Ａｊ！、Ｇｅ （Ｆｅの一部をＣＯで
置換したものを含む）とＴｉ、Ｚｒ、Ｎｂ、Ｔａ。The present invention provides Fe, Aj! , Ge (including those in which part of Fe is replaced with CO), Ti, Zr, Nb, Ta.
Ｗ、Ｃｒ、Ｍｏ、Ｍｎ、Ｒｕ、Ｏｓ、Ｉ ｒ、Ｒｅ。W, Cr, Mo, Mn, Ru, Os, Ir, Re.
Ｎｉ、Ｐｄ、Ｐｔ、Ｈｆの少なくとも１種を組合わせた
新規な組成を有する軟磁性薄膜を提供し、特に耐摩耗性
に優れた軟磁性薄膜を提供するものである。The present invention provides a soft magnetic thin film having a novel composition combining at least one of Ni, Pd, Pt, and Hf, and particularly provides a soft magnetic thin film with excellent wear resistance.
例えばオーディオテープレコーダやＶＴＲ（ビデオテー
プレコーダ）等の磁気記録再生装置においては、記録信
号の高密度化や高品質化等が進められており、この高記
録密度化に対応して、磁気記録媒体として磁性粉にＦｅ
、Ｃｏ、Ｎｉ等の金属あるいは合金からなる粉末を用い
た、いわゆるメタルテープや、強磁性金属材料を真空薄
膜形成技術によりベースフィルム上に直接被着した、い
わゆるｙ着テープ等が開発され、各分野で実用化されて
いる。For example, in magnetic recording and reproducing devices such as audio tape recorders and VTRs (video tape recorders), the density and quality of recording signals are increasing, and in response to this increase in recording density, magnetic recording media Fe in magnetic powder as
, so-called metal tapes using powders made of metals or alloys such as Co, Ni, etc., and so-called y-adhesive tapes in which ferromagnetic metal materials are directly deposited on a base film using vacuum thin film forming technology, have been developed. It has been put into practical use in the field.
ところで、このような高抗磁力を有する磁気記録媒体の
特性を発渾せしめるためには、磁気ヘッドのコア材料の
特性として、高い飽和磁束密度を有するとともに、同一
の磁気ヘッドで再生を行なおうとする場合においては、
高ｉ３磁率を併せて有することが要求される０例えば、
従来磁気ヘッドのコア材料として多用されているフェラ
イト材では飽和磁束密度が低（、また、パーマロイでは
耐摩耗性に問題がある。By the way, in order to develop the characteristics of a magnetic recording medium with such high coercive force, it is necessary to have a core material of the magnetic head that has a high saturation magnetic flux density and to perform reproduction with the same magnetic head. In the case of
For example, 0 that is required to have high i3 magnetic flux as well,
Ferrite materials, which have been commonly used as core materials for conventional magnetic heads, have a low saturation magnetic flux density (and permalloy has problems with wear resistance).
そこで、かかる諸要求を満たすコア材料の一つとして、
本願出願人は先に特許願昭６０−２１８７３６号におい
てＦｅ−４１−Ｇｅ （Ｆｅの一部をＣＯで置換したも
のを含む）系合金からなる軟磁性薄膜を提案した。Therefore, as one of the core materials that meet these requirements,
The applicant of the present application previously proposed a soft magnetic thin film made of a Fe-41-Ge (including one in which part of Fe is replaced with CO) system alloy in patent application No. 60-218736.
ところで現在、磁気ヘッド材に対し高密度記録が要求さ
れているために、テープと磁気ヘッド間の相対速度が上
昇しつつあるのが現状である。従って、初期の磁気ヘッ
ドのｉｉｔ磁変換特性を長時間に亘って維持するために
コア材に耐摩耗性についての要求が厳しくなっているの
が現状である。Nowadays, because high-density recording is required for magnetic head materials, the relative speed between the tape and the magnetic head is increasing. Therefore, in order to maintain the IIT magnetic conversion characteristics of the initial magnetic head over a long period of time, the current situation is that the requirements for wear resistance of the core material are becoming stricter.
このような状況から、高品質化、高記録密度化を図るた
めの磁気記録媒体の高抗磁力化の試みも、従来のコア材
料を用いる限りにおいて、摩耗性の限界から自ずと制約
を受けている。Under these circumstances, attempts to increase the coercive force of magnetic recording media in order to achieve higher quality and higher recording density are naturally constrained by the limitations of abrasion resistance as long as conventional core materials are used. .
そこで本発明は、上述の従来の実情に鑑みて提案された
ものであって、Ｆｅ−Ａｊ！−Ｇｅ （Ｆｅの一部をＣ
ｏで置換したものを含む）系合金のより一層の改善を目
的とするものであり、良好な軟磁気特性（透磁率や抗磁
力等）、高飽和磁束密度を有し、しかも耐摩耗性に優れ
、記録、再生特性の良好な軟磁性薄膜を提供することを
目的とする。Therefore, the present invention has been proposed in view of the above-mentioned conventional situation, and Fe-Aj! -Ge (part of Fe is C
The objective is to further improve the alloys (including those substituted with The object of the present invention is to provide a soft magnetic thin film with excellent recording and reproducing characteristics.
本発明者等は、上述の目的を達成せんものと長期に亘り
鋭意研究の結果、特に耐摩耗性の改善という観点から、
Ｔｉ、Ｚｒ、Ｎｂ、Ｔａ、Ｗ、Ｃｒ＋Ｍｏ、Ｍｎ、Ｒｕ
、０３．Ｉ ｒ、Ｒｅ、Ｎｉ、Ｐ＋ＩＰＣ２Ｈｆの少な
くとも１種以上の元素をＦｅ−Ａ、ｆｔ−Ｑｅ （Ｆ
ｅの一部をＣＯで置換したものを含む）系合金に添加す
ることが有効であることを見出した。The inventors of the present invention have conducted intensive research over a long period of time to achieve the above-mentioned objectives, and as a result, from the viewpoint of improving wear resistance,
Ti, Zr, Nb, Ta, W, Cr+Mo, Mn, Ru
, 03. At least one element of Ir, Re, Ni, P+IPC2Hf is combined with Fe-A, ft-Qe (F
It has been found that it is effective to add this to alloys (including those in which a part of e is replaced with CO).
そこで、本発明の軟磁性薄膜は、Ｆ ｅ ａ Ｃｏ ｂ
Ａ ｌ ｃ Ｇ ｅａ Ｍ ＊ （ただしａ、ｂ、ｃ
、ｄ、ｅはそれぞれ組成比を原子％として表し、ＭはＴ
ｉ。Therefore, the soft magnetic thin film of the present invention is made of Fe a Co b
A l c G ea M * (However, a, b, c
, d, and e each represent the composition ratio as atomic %, and M is T
i.
Ｚｒ、Ｎｂ、Ｔａ、Ｗ、Ｃｒ、Ｍｏ、Ｍｎ、Ｒｕ。Zr, Nb, Ta, W, Cr, Mo, Mn, Ru.
Ｏｓ、Ｉｒ、Ｒｅ、Ｎｉ、Ｐｄ、Ｐｔ、Ｈｆの少なくと
も１種を表す、）なる組成式で示され、その組成範囲が
６８≦ａ＋ｂ≦８４
０≦ｂ≦１５
１≦ｃ≦３１
１≦ｄ≦３１
０．５≦ｅ≦６
ａ＋ｂ＋ｃ＋ｄ＋ｅ−１ｏ。represents at least one of Os, Ir, Re, Ni, Pd, Pt, and Hf, and the composition range is 68≦a+b≦84 0≦b≦15 1≦c≦31 1≦d ≦31 0.5≦e≦6 a+b+c+d+e-1o.
なる関係を満足することを特徴とした。It is characterized by satisfying the following relationship.
すなわち、本発明の軟磁性薄膜は、Ｆｅ、 Ａｌ。That is, the soft magnetic thin film of the present invention is made of Fe, Al.
Ｇｅ（Ｆｅの一部をＣｏで置換したものを含む）を基本
組成とする合金にＴｉ、Ｚｒ、Ｎｂ、Ｔａ。Ti, Zr, Nb, and Ta in alloys whose basic composition is Ge (including those in which part of Fe is replaced with Co).
Ｗ、Ｃｒ、Ｍｏ、Ｍｎ、Ｒｕ、Ｏｓ、Ｉｒ、Ｒｅ。W, Cr, Mo, Mn, Ru, Os, Ir, Re.
Ｎｉ、Ｐｄ、Ｐｔ、Ｈｆの少なくとも１種を添加してな
るものであって、耐摩耗性や軟磁気特性に優れ、高飽和
磁束密度Ｂｓを有するものである。It is made by adding at least one of Ni, Pd, Pt, and Hf, has excellent wear resistance and soft magnetic properties, and has a high saturation magnetic flux density Bs.
また、基本合金として用いられるＦｅ−Ａｌ−Ｇｅ（Ｆ
ｅの一部をＣｏで置換したものを含む）合金の組成中Ａ
１の一部もしくは全部をＧａで、またはＧｅの一部もし
くは全部を３ｉで置換した組成の合金も基本合金に含む
ものとする。In addition, Fe-Al-Ge (F
A in the composition of alloys (including those in which a part of e is replaced with Co)
The basic alloys also include alloys in which a part or all of 1 is replaced by Ga, or a part or all of Ge is replaced by 3i.
本発明の軟磁性薄膜においては、各成分元素の組成比を
所定の範囲内に設定することが好ましく、この範囲を外
れると磁歪が大きくなり、磁気特性が劣化する。特に、
基本合金に添加するＴｉ、Ｚｒ。In the soft magnetic thin film of the present invention, it is preferable to set the composition ratio of each component element within a predetermined range; if it deviates from this range, magnetostriction increases and magnetic properties deteriorate. especially,
Ti and Zr added to the basic alloy.
Ｎｂ、Ｔａ、Ｗ、Ｃｒ、Ｍｏ、Ｍｎ、Ｒｕ、Ｏｓ。Nb, Ta, W, Cr, Mo, Mn, Ru, Os.
Ｉｒ、Ｒｅ、Ｎｉ、Ｐｄ、Ｐｔ、Ｈｆの少なくとも１種
６添加量については、０．５原子％より少ない場合には
目的とする耐摩耗性の改善効果が得られず、６原子％よ
り多い場合には磁気特性の劣化を招いてしまう。Regarding the addition amount of at least one of Ir, Re, Ni, Pd, Pt, and Hf, if it is less than 0.5 atomic %, the desired effect of improving wear resistance cannot be obtained, and if it is more than 6 atomic %. In some cases, this may lead to deterioration of magnetic properties.
上記軟磁性薄膜の製造方法としては種々の方法が考えら
れるが、なかでも真空薄膜形成技術によるのが良い。Various methods can be considered for manufacturing the above-mentioned soft magnetic thin film, but among them, vacuum thin film forming technology is preferred.
この真空薄膜形成技術の手法としては、スパッタリング
やイオンブレーティング、真空蒸着法。The techniques for forming this vacuum thin film include sputtering, ion blasting, and vacuum evaporation.
クラスター・イオンビーム法等が挙げられる。Examples include cluster ion beam method.
また、上記各成分元素の組成を調節する方法としては、
１）各成分元素を所定の割合となるように秤量し、これ
らをあらかじめ例えば高周波溶解炉等で溶解して合金イ
ンゴットを形成しておき、この合金インゴットを蒸発源
として使用する方法、ｉｉ ）各成分の単独元素の蒸発
源を用意し、これら蒸発源の数で組成を制御する方法、
ｉｉｉ ）各成分の単独元素の蒸発源を用意し、これら
蒸発源に加える出力（印加電圧）を制御して蒸発スピー
ドをコントロールし組成を制御する方法、
ｉｖ）合金を蒸発源として蒸着しながら他の元素を打ち
込む方法、
等が挙げられる。In addition, as a method for adjusting the composition of each of the above component elements, 1) Weigh each component element to a predetermined ratio and melt them in advance, for example, in a high frequency melting furnace to form an alloy ingot. , a method of using this alloy ingot as an evaporation source, ii) a method of preparing evaporation sources of a single element of each component and controlling the composition by the number of these evaporation sources, iii) a method of preparing an evaporation source of a single element of each component However, methods include controlling the output (applied voltage) applied to these evaporation sources to control the evaporation speed and composition, and iv) a method in which other elements are implanted while evaporating an alloy as an evaporation source.
なお、上述の真空薄膜形成技術等により膜付けされた軟
磁性薄膜は、そのままの状態では保磁力は若干高い値を
示し良好な軟磁気特性が得られないので、熱処理を施し
て膜の歪を除去し、軟磁気特性を改善することが好まし
い。Note that the soft magnetic thin film formed by the above-mentioned vacuum thin film forming technology has a slightly high coercive force in its original state and good soft magnetic properties cannot be obtained, so heat treatment is performed to reduce the distortion of the film. It is preferable to remove it to improve the soft magnetic properties.
このように、軟磁性薄膜の構成元素としてＦｅ。 In this way, Fe is used as a constituent element of the soft magnetic thin film.
Ａ１．Ｇｅ （Ｆｅの一部をＣＯで置換したものを含む
）を基本組成とする合金にＴｉ、Ｚｒ、Ｎｂ。A1. Ti, Zr, and Nb are added to alloys whose basic composition is Ge (including those in which part of Fe is replaced with CO).
Ｔａ、Ｗ、Ｃｒ、Ｍｏ、Ｍｎ、Ｒｕ、Ｏｓ、Ｉｒ。Ta, W, Cr, Mo, Mn, Ru, Os, Ir.
Ｒｅ、Ｎｉ、Ｐｄ、Ｐｔ、Ｈｆの少なくとも１種を選び
添加し、これらの組成比を所定の範囲内に設定すること
により、耐摩耗性に非常に優れた軟磁性薄膜となる。By selectively adding at least one of Re, Ni, Pd, Pt, and Hf and setting their composition ratio within a predetermined range, a soft magnetic thin film with extremely excellent wear resistance can be obtained.
以下、本発明の具体的な実施例について説明するが、本
発明がこの実施例に限定されるものではないことは言う
までもない。Hereinafter, specific examples of the present invention will be described, but it goes without saying that the present invention is not limited to these examples.
先ず、９９．９％以上の純度を有する電解鉄、電解コバ
ルト、９９．９９χの純度を有するアルミニウム、９９
、９９９２の純度を存するゲルマニウム及び９４．０〜
９９．９χの純度を有するＴｉ、Ｚｒ、Ｎｂ、Ｔａ。First, electrolytic iron with a purity of 99.9% or more, electrolytic cobalt, aluminum with a purity of 99.99χ, 99
, germanium with a purity of 9992 and 94.0~
Ti, Zr, Nb, Ta with a purity of 99.9χ.
Ｗ、Ｃｒ、Ｍｏ、Ｍｎ、Ｒｕ、Ｏｓ、Ｉ ｒ、Ｒｅ。W, Cr, Mo, Mn, Ru, Os, Ir, Re.
Ｎｉ、Ｐｄ、Ｐｔ、Ｈｆの少なくとも１種の添加元素を
それぞれ所定の組成比となるように秤量し、アルゴン雰
囲気中で高周波誘導加熱炉を用いて溶解・鋳造後、さら
に機械加工を行って直径１０５ ｍｍ。At least one additional element of Ni, Pd, Pt, and Hf is weighed so as to have a predetermined composition ratio, melted and cast using a high-frequency induction heating furnace in an argon atmosphere, and further machined to obtain a diameter. 105 mm.
厚み４ｍｍのスパッタリング用合金ターゲットを作製し
た。An alloy target for sputtering with a thickness of 4 mm was produced.
次に、この合金ターゲットを用いて、プレーナー・マグ
ネトロン型ＲＦスパッタリング装置により、到達ガス圧
８． ＯＸ １０−’Ｔｏｒｒ、Ｔｏｒｒ、ス分圧４．
ＯＸ １０−３Ｔｏｒｒ、予備スパッタ１時間、スパ
ッタ時間４５分、投入電力３００Ｗの条件でスパッタリ
ングを行い、水冷した結晶化ガラス基板（商品名 ＰＥ
Ｇ３１３０ＣＨＯＹＡ社製）上に膜厚約２μｍの薄膜を
得た。Next, using this alloy target, a planar magnetron type RF sputtering device was used to reach a gas pressure of 8. OX 10-'Torr, Torr, partial pressure4.
Sputtering was performed under the conditions of OX 10-3 Torr, preliminary sputtering for 1 hour, sputtering time for 45 minutes, and input power of 300 W, and a water-cooled crystallized glass substrate (product name: PE
A thin film with a thickness of about 2 μm was obtained on the G3130 (manufactured by CHOYA).
上述の方法に従い、軟磁性薄膜が形成された基板を５０
０℃で１時間真空アニールを行い、作製した軟磁性薄膜
の各サンプルについて、軟磁性薄膜の膜組成を分析し、
室温における飽和磁束密度Ｂｓ、抗磁力Ｈｃ、実行ｉｌ
ｌ率ｕｅｆｆ（ＩＭ＋Ｉｚにおける値）、耐摩耗性につ
いて調べた。According to the above method, the substrate on which the soft magnetic thin film was formed was heated for 50 minutes.
Vacuum annealing was performed at 0°C for 1 hour, and the film composition of the soft magnetic thin film was analyzed for each sample of the produced soft magnetic thin film.
Saturation magnetic flux density Bs, coercive force Hc, execution il at room temperature
The l ratio ueff (value at IM+Iz) and wear resistance were investigated.
ここで、飽和磁束密度３ｓは試料振動磁束計（ＶＳＭ）
、抗磁力ＨｅはＢ −Ｈループトレーサ、遇（ｎ率μは
８の字コイル型透磁率計で測定した。Here, the saturation magnetic flux density 3s is measured using a vibrating sample magnetometer (VSM).
The coercive force He was measured using a B-H loop tracer, and the n ratio μ was measured using a figure-8 coil type permeability meter.
また、耐摩耗性は次のようにして測定した。つまり、第
１図に示すようにダミーヘッド（１）のテープ摺動面上
に先ず、Ｃｒ下地層として０．２〜０゜４μｍのＣｒ薄
膜層（２）を基板加熱温度２００〜３００℃、到達ガス
圧８．０Ｘ１０−″Ｔｏｒｒ、Ｔｏｒｒ、ス分圧４．０
’ Ｘ １０−’Ｔｏｒｒ、予備スパッ予備スパッタ１
ン
件で付着させた。その際ダミーヘッドを２００〜３００
℃に加熱し１０分間逆スパツタを行った。Moreover, abrasion resistance was measured as follows. That is, as shown in FIG. 1, first, a Cr thin film layer (2) of 0.2 to 0.4 μm is formed as a Cr underlayer on the tape sliding surface of the dummy head (1) at a substrate heating temperature of 200 to 300°C. Ultimate gas pressure 8.0X10-''Torr, Torr, partial pressure 4.0
'X 10-'Torr, preliminary sputter preliminary sputter 1
It was attached in the case of At that time, add 200 to 300 dummy heads.
It was heated to ℃ and subjected to reverse sputtering for 10 minutes.
その後、所定の組成を持つ軟磁性薄膜（３）（各サンプ
ル）を膜厚杓ｌＯμｍとなるように基板加熱温度２００
〜３００℃、到達ガス圧８．０Ｘ１０−’Ｔｏｒｒ＋
アルゴンガス分圧４． ＯＸ １０−３Ｔｏｒｒ、予備
スパ７り１時間、スパッタ時間３時間、投入電力３００
Ｗの条件で付着させたその際にもダミーヘッドを２００
〜３００℃に加熱し１０分間逆スパツタを行った。After that, a soft magnetic thin film (3) (each sample) having a predetermined composition was heated to a substrate heating temperature of 200 μm to a film thickness of 10 μm.
~300℃, ultimate gas pressure 8.0X10-'Torr+
Argon gas partial pressure4. OX 10-3 Torr, preliminary spa 7 hours 1 hour, sputtering time 3 hours, input power 300
At that time, the dummy head was attached at 200 mm.
It was heated to ~300°C and reverse sputtered for 10 minutes.
ダミーヘッド摺動面上に軟磁性薄膜（３）を上述のよう
にしてスパッタリングにて形成させた後、第２図に示す
ようにヘッド台板（４）に接着剤（５）を用いて接着し
た。接着剤（５）が充分硬化した後、１インチＶＴＲ（
ソニー社製、商品名ＢＶＨ−１０００’）用ヘッドドラ
ムに合板（４）ごと装着した。その際、ダミーヘッド（
１）の突出量が８０±５μｍとなるように調整した。After forming the soft magnetic thin film (3) on the sliding surface of the dummy head by sputtering as described above, it is bonded to the head base plate (4) using an adhesive (5) as shown in Figure 2. did. After the adhesive (5) has sufficiently hardened, attach the 1-inch VTR (
The plywood (4) was attached to a head drum for BVH-1000' manufactured by Sony Corporation. At that time, the dummy head (
The protrusion amount of 1) was adjusted to be 80±5 μm.
上記ダミーヘッド（１）を装着した１インチＶＴＲ（ソ
ニー社製、商品名ＢＶＨ−１０００）にセントし、γ−
Ｆｅ、Ｏ，系テープ（ソニー社製。Place the dummy head (1) on a 1-inch VTR (manufactured by Sony, product name BVH-1000), and
Fe, O, tape (manufactured by Sony).
商品名Ｖ−１６−６４Ａ）を用いて摩耗性のテストを行
った。その時のテープとダミーヘッドの相対スピードは
２５．５９ ｍ ／ ｓｅｃである。ダミーヘッドはテ
ープ走行時間５時間毎にドラムより取り外し、顕微鏡（
倍率Ｘ４００）を用いてテープ摺動面からマーカーまで
の距離を測定した。一つの試料につき６個のダミーヘッ
ドを作り、それらの測定値の平均値をもって摩耗度とし
た。テープ走行時間は、合計１５時間である。耐摩耗値
は、テープ走行時間と摩耗量の関係を最小自乗法により
算出したときの直線の傾きである。A wear test was conducted using V-16-64A (trade name). The relative speed between the tape and the dummy head at that time was 25.59 m/sec. The dummy head is removed from the drum every 5 hours of tape running time and is
The distance from the tape sliding surface to the marker was measured using a magnification of X400. Six dummy heads were made for each sample, and the average value of the measured values was taken as the degree of wear. The total tape running time was 15 hours. The wear resistance value is the slope of a straight line when the relationship between the tape running time and the amount of wear is calculated by the method of least squares.
各サンプルの組成と各々についての測定結果を第１表〜
第４表に示す。Table 1 shows the composition of each sample and the measurement results for each.
It is shown in Table 4.
（以下余白）
上記第１表〜第４表より、Ｆｅ、Ａｌ、Ｇｅ（Ｆｅの一
部をＧｏで置換したものを含む）にＴｉ。(Left below) From Tables 1 to 4 above, Fe, Al, Ge (including those in which part of Fe is replaced with Go) and Ti.
Ｚｒ、Ｎｂ、Ｔａ、Ｗ、Ｃｒ、Ｍｏ、Ｍｎ、Ｒｕ。Zr, Nb, Ta, W, Cr, Mo, Mn, Ru.
Ｏｓ、Ｉｒ、Ｒｅ、Ｎｉ、Ｐｄ、Ｐｔ、Ｈｆの少なくと
も１種の添加元素を添加することによって耐摩耗性につ
いて非常に優れた軟磁性薄膜となることがわかった。It has been found that by adding at least one additive element of Os, Ir, Re, Ni, Pd, Pt, and Hf, a soft magnetic thin film with extremely excellent wear resistance can be obtained.
（発明の効果〕
上述の説明からも明らかなように、軟磁性１膜の成分元
素としてＦｅ、ＡＣＧｅ （Ｆｅの一部をＣＯで置換
したものを含む）からなる合金中にＴｉ、Ｚｒ、Ｎｂ、
Ｔａ、Ｗ、Ｃｒ、Ｍｏ、Ｍｎ。(Effects of the Invention) As is clear from the above description, Ti, Zr, and Nb are contained in an alloy consisting of Fe and ACGe (including those in which a part of Fe is replaced with CO) as component elements of the soft magnetic film. ,
Ta, W, Cr, Mo, Mn.
Ｒｕ、Ｏｓ、Ｉｒ、Ｒｅ、Ｎｉ、Ｐｄ、Ｐｔ、ＨＥの少
なくとも１種の添加元素を添加し、これらの組成比を所
定の値に設定することにより、従来の軟磁性薄膜より優
れた耐摩耗性を確保することが可能になった。By adding at least one additive element of Ru, Os, Ir, Re, Ni, Pd, Pt, and HE and setting the composition ratio of these to a predetermined value, it has superior wear resistance than conventional soft magnetic thin films. It became possible to secure sexuality.
また、センダスト合金を凌く飽和磁束密度Ｂｓも達成す
ることができ、軟磁気特性にも優れている軟磁性薄膜と
することが可能となった。Furthermore, it was possible to achieve a saturation magnetic flux density Bs that exceeds that of Sendust alloy, and it became possible to create a soft magnetic thin film that also has excellent soft magnetic properties.
したがって、この軟磁性薄膜を例えば磁気ヘッドのコア
材料として用いることにより、磁気記録媒体の高抗磁力
化に充分対処することができ、高品質化や高記録密度化
等記録、再生特性の良好な磁気ヘッドとすることができ
る。Therefore, by using this soft magnetic thin film as a core material of a magnetic head, for example, it is possible to sufficiently cope with the increase in coercive force of a magnetic recording medium, and to improve recording and reproduction characteristics such as higher quality and higher recording density. It can be a magnetic head.
第１図は耐摩耗性を測定するためのダミーヘッドの構成
を示す斜視図であり、第２図は軟磁性１膜を付着したダ
ミーヘッドのヘッド台板への取り付は状態を示す模式的
な平面図である。
■・・・ダミーヘッド
３・・・軟磁性薄膜
４・ ・ ・ヘッド台）反Figure 1 is a perspective view showing the configuration of a dummy head for measuring wear resistance, and Figure 2 is a schematic diagram showing the state of attachment of the dummy head to which a soft magnetic film is attached to the head base plate. FIG. ■...Dummy head 3...Soft magnetic thin film 4... Head stand)
Claims (1)
ｂ、ｃ、ｄ、ｅはそれぞれ組成比を原子％として表し、
ＭはＴｉ、Ｚｒ、Ｎｂ、Ｔａ、Ｗ、Ｃｒ、Ｍｏ、Ｍｎ、
Ｒｕ、Ｏｓ、Ｉｒ、Ｒｅ、Ｎｉ、Ｐｄ、Ｐｔ、Ｈｆの少
なくとも１種を表す。）なる組成式で示され、その組成
範囲が ６８≦ａ＋ｂ≦８４ ０≦ｂ≦１５ １≦ｃ≦３１ １≦ｄ≦３１ ０．５≦ｅ≦６ ａ＋ｂ＋ｃ＋ｄ＋ｅ＝１００ なる関係を満足することを特徴とする軟磁性薄膜。[Claims] Fe_aCo_bAl_cGe_dM_e (where a,
b, c, d, e each represent the composition ratio as atomic %,
M is Ti, Zr, Nb, Ta, W, Cr, Mo, Mn,
Represents at least one of Ru, Os, Ir, Re, Ni, Pd, Pt, and Hf. ), and its composition range satisfies the following relationships: 68≦a+b≦84 0≦b≦15 1≦c≦31 1≦d≦31 0.5≦e≦6 a+b+c+d+e=100 Soft magnetic thin film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61146226A JPH0758647B2 (en) | 1986-06-24 | 1986-06-24 | Crystalline soft magnetic thin film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61146226A JPH0758647B2 (en) | 1986-06-24 | 1986-06-24 | Crystalline soft magnetic thin film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS633406A true JPS633406A (en) | 1988-01-08 |
| JPH0758647B2 JPH0758647B2 (en) | 1995-06-21 |
Family
ID=15402962
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61146226A Expired - Fee Related JPH0758647B2 (en) | 1986-06-24 | 1986-06-24 | Crystalline soft magnetic thin film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0758647B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000070106A1 (en) * | 1999-05-14 | 2000-11-23 | Fuji Electric Co., Ltd. | Magnetic alloy and magnetic recording medium and method for preparation thereof, and target for forming magnetic film and magnetic recording device |
| JP2006322228A (en) * | 2005-05-19 | 2006-11-30 | Japan Railway Construction Transport & Technology Agency | Concrete track slab and form for molding |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5827941A (en) * | 1981-08-11 | 1983-02-18 | Hitachi Ltd | Manufacture of amorphous thin film |
| JPS62104107A (en) * | 1985-10-31 | 1987-05-14 | Sony Corp | Soft magnetic thin film |
| JPS62104106A (en) * | 1985-10-31 | 1987-05-14 | Sony Corp | Soft magnetic thin film |
-
1986
- 1986-06-24 JP JP61146226A patent/JPH0758647B2/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5827941A (en) * | 1981-08-11 | 1983-02-18 | Hitachi Ltd | Manufacture of amorphous thin film |
| JPS62104107A (en) * | 1985-10-31 | 1987-05-14 | Sony Corp | Soft magnetic thin film |
| JPS62104106A (en) * | 1985-10-31 | 1987-05-14 | Sony Corp | Soft magnetic thin film |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000070106A1 (en) * | 1999-05-14 | 2000-11-23 | Fuji Electric Co., Ltd. | Magnetic alloy and magnetic recording medium and method for preparation thereof, and target for forming magnetic film and magnetic recording device |
| US6607612B1 (en) | 1999-05-14 | 2003-08-19 | Migaku Takahashi | Magnetic alloy and magnetic recording medium and method for preparation thereof, and target for forming magnetic film and magnetic recording device |
| JP2006322228A (en) * | 2005-05-19 | 2006-11-30 | Japan Railway Construction Transport & Technology Agency | Concrete track slab and form for molding |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0758647B2 (en) | 1995-06-21 |
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