JPH0322616B2 - - Google Patents
Info
- Publication number
- JPH0322616B2 JPH0322616B2 JP58111672A JP11167283A JPH0322616B2 JP H0322616 B2 JPH0322616 B2 JP H0322616B2 JP 58111672 A JP58111672 A JP 58111672A JP 11167283 A JP11167283 A JP 11167283A JP H0322616 B2 JPH0322616 B2 JP H0322616B2
- Authority
- JP
- Japan
- Prior art keywords
- acid
- printing plate
- photosensitive
- weight
- diazo resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/0166—Diazonium salts or compounds characterised by the non-macromolecular additives
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Materials For Photolithography (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58111672A JPS603632A (ja) | 1983-06-21 | 1983-06-21 | 感光性平版印刷版 |
US06/622,597 US4576893A (en) | 1983-06-21 | 1984-06-20 | Presensitized lithographic printing plate precursor |
DE8484107117T DE3481652D1 (de) | 1983-06-21 | 1984-06-20 | Vorlaeufer fuer vorsensibilisierte flachdruckplatte. |
EP84107117A EP0130488B1 (en) | 1983-06-21 | 1984-06-20 | Presensitized lithographic printing plate precursor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58111672A JPS603632A (ja) | 1983-06-21 | 1983-06-21 | 感光性平版印刷版 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS603632A JPS603632A (ja) | 1985-01-10 |
JPH0322616B2 true JPH0322616B2 (en, 2012) | 1991-03-27 |
Family
ID=14567253
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58111672A Granted JPS603632A (ja) | 1983-06-21 | 1983-06-21 | 感光性平版印刷版 |
Country Status (4)
Country | Link |
---|---|
US (1) | US4576893A (en, 2012) |
EP (1) | EP0130488B1 (en, 2012) |
JP (1) | JPS603632A (en, 2012) |
DE (1) | DE3481652D1 (en, 2012) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0782236B2 (ja) * | 1984-10-12 | 1995-09-06 | 三菱化学株式会社 | 感光性組成物 |
JPS6238471A (ja) * | 1985-08-14 | 1987-02-19 | Fuji Photo Film Co Ltd | 感光性平版印刷版の製造方法 |
JPH0642071B2 (ja) * | 1985-11-09 | 1994-06-01 | コニカ株式会社 | 感光性組成物および感光性平版印刷版 |
JPS62275243A (ja) * | 1986-05-23 | 1987-11-30 | Fuji Photo Film Co Ltd | 感光性材料の製造方法 |
US5223376A (en) * | 1986-06-20 | 1993-06-29 | Toyo Soda Manufacturing Co., Ltd. | Method for producing fine patterns utilizing specific polymeric diazonium salt, or diazonium salt/sulfone group containing polymer, as photobleachable agent |
JPH0820729B2 (ja) * | 1986-07-25 | 1996-03-04 | 三菱化学株式会社 | 染色可能な感光性組成物 |
US5240807A (en) * | 1987-08-20 | 1993-08-31 | Hoechst Celanese Corporation | Photoresist article having a portable, conformable, built-on mask |
JPH0798431B2 (ja) * | 1988-06-01 | 1995-10-25 | 富士写真フイルム株式会社 | 平版印刷版用支持体 |
JP2652100B2 (ja) * | 1991-12-17 | 1997-09-10 | 富士写真フイルム株式会社 | 感光性組成物 |
JPH05165209A (ja) * | 1991-12-17 | 1993-07-02 | Fuji Photo Film Co Ltd | 感光性組成物 |
EP0583962B1 (en) * | 1992-08-17 | 1997-07-16 | Konica Corporation | Light-sensitive composition |
US5846685A (en) * | 1997-01-31 | 1998-12-08 | Kodak Polychrome Graphics, Llc | Radiation sensitive diazo sulfo-acrylic adducts and method for producing a printing plate |
US6458511B1 (en) * | 2000-06-07 | 2002-10-01 | Kodak Polychrome Graphics Llc | Thermally imageable positive-working lithographic printing plate precursor and method for imaging |
US8742324B2 (en) | 2010-06-14 | 2014-06-03 | Panasonic Corporation | Structure for shielding a gap between members |
KR20120104450A (ko) * | 2011-03-08 | 2012-09-21 | (주)엘지하우시스 | 웨이퍼 가공 필름용 점착제 조성물 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL267931A (en, 2012) * | 1960-08-05 | 1900-01-01 | ||
NL132291C (en, 2012) * | 1961-01-25 | |||
US3679419A (en) * | 1969-05-20 | 1972-07-25 | Azoplate Corp | Light-sensitive diazo condensate containing reproduction material |
US4123276A (en) * | 1974-02-28 | 1978-10-31 | Fuji Photo Film Co., Ltd. | Photosensitive composition |
JPS533216A (en) * | 1976-06-28 | 1978-01-12 | Fuji Photo Film Co Ltd | Diazo photosensitive composition |
JPS5856986B2 (ja) * | 1976-10-05 | 1983-12-17 | 東光株式会社 | 発振素子 |
JPS55527A (en) * | 1978-06-16 | 1980-01-05 | Fuji Photo Film Co Ltd | Photosensitive planographic plate |
US4247597A (en) * | 1978-06-28 | 1981-01-27 | Pitney Bowes, Inc. | Electroscopic carrier particles having a carboxylic acid surface treatment |
US4408532A (en) * | 1980-04-30 | 1983-10-11 | Minnesota Mining And Manufacturing Company | Lithographic printing plate with oleophilic area of radiation exposed adduct of diazo resin and sulfonated polymer |
CA1153611A (en) * | 1980-04-30 | 1983-09-13 | Minnesota Mining And Manufacturing Company | Aqueous developable photosensitive composition and printing plate |
JPS57192952A (en) * | 1981-05-25 | 1982-11-27 | Konishiroku Photo Ind Co Ltd | Composition of developing solution |
EP0083835A3 (en) * | 1982-01-12 | 1984-03-07 | Autotype International Limited | Stabilization of diazo-resin sensitisers |
-
1983
- 1983-06-21 JP JP58111672A patent/JPS603632A/ja active Granted
-
1984
- 1984-06-20 US US06/622,597 patent/US4576893A/en not_active Expired - Lifetime
- 1984-06-20 EP EP84107117A patent/EP0130488B1/en not_active Expired
- 1984-06-20 DE DE8484107117T patent/DE3481652D1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0130488A3 (en) | 1987-01-07 |
EP0130488A2 (en) | 1985-01-09 |
US4576893A (en) | 1986-03-18 |
JPS603632A (ja) | 1985-01-10 |
EP0130488B1 (en) | 1990-03-14 |
DE3481652D1 (de) | 1990-04-19 |
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