JPH0317378B2 - - Google Patents

Info

Publication number
JPH0317378B2
JPH0317378B2 JP29222686A JP29222686A JPH0317378B2 JP H0317378 B2 JPH0317378 B2 JP H0317378B2 JP 29222686 A JP29222686 A JP 29222686A JP 29222686 A JP29222686 A JP 29222686A JP H0317378 B2 JPH0317378 B2 JP H0317378B2
Authority
JP
Japan
Prior art keywords
light
haze
face plate
defects
low
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP29222686A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63143830A (ja
Inventor
Izuo Horai
Kei Nara
Masashi Pponda
Hiroshi Tsuzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi Electronics Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Electronics Engineering Co Ltd filed Critical Hitachi Electronics Engineering Co Ltd
Priority to JP29222686A priority Critical patent/JPS63143830A/ja
Publication of JPS63143830A publication Critical patent/JPS63143830A/ja
Publication of JPH0317378B2 publication Critical patent/JPH0317378B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP29222686A 1986-12-08 1986-12-08 ヘイズ欠陥検出方法 Granted JPS63143830A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29222686A JPS63143830A (ja) 1986-12-08 1986-12-08 ヘイズ欠陥検出方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29222686A JPS63143830A (ja) 1986-12-08 1986-12-08 ヘイズ欠陥検出方法

Publications (2)

Publication Number Publication Date
JPS63143830A JPS63143830A (ja) 1988-06-16
JPH0317378B2 true JPH0317378B2 (en, 2012) 1991-03-07

Family

ID=17779127

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29222686A Granted JPS63143830A (ja) 1986-12-08 1986-12-08 ヘイズ欠陥検出方法

Country Status (1)

Country Link
JP (1) JPS63143830A (en, 2012)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8497991B2 (en) 2009-02-27 2013-07-30 Mitsubishi Heavy Industries, Ltd. Thin-film inspection apparatus and inspection method

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2615903B2 (ja) * 1988-09-09 1997-06-04 富士通株式会社 半導体ウエハ表面のヘイズ評価法
US5216485A (en) * 1991-09-04 1993-06-01 International Business Machines Corporation Advanced via inspection tool (avit)
KR100719941B1 (ko) * 2004-12-22 2007-05-18 주식회사 피케이엘 포토마스크 표면의 헤이즈 측정장치 및 그 측정방법
KR100854705B1 (ko) 2005-12-14 2008-08-27 나노전광 주식회사 백색광 주사 간섭계를 이용한 포토마스크 표면의 헤이즈검출장치 및 그 검출방법
JP5319876B2 (ja) 2006-07-31 2013-10-16 株式会社日立ハイテクノロジーズ 表面検査装置及び表面検査方法
KR100793085B1 (ko) * 2006-12-18 2008-01-10 코닉시스템 주식회사 포토 마스크의 헤이즈 발생장치
KR100822677B1 (ko) * 2006-12-18 2008-04-17 코닉시스템 주식회사 포토 마스크의 헤이즈 발생장치
JP2009133778A (ja) 2007-11-30 2009-06-18 Hitachi High-Technologies Corp 検査装置及び検査方法
JP5564807B2 (ja) * 2009-03-12 2014-08-06 株式会社日立ハイテクノロジーズ 欠陥検査装置及び欠陥検査方法
JP5593399B2 (ja) 2010-12-27 2014-09-24 株式会社日立ハイテクノロジーズ 計測装置
JP5689918B2 (ja) * 2013-05-08 2015-03-25 株式会社日立ハイテクノロジーズ 試料の状態を評価するための装置及び方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8497991B2 (en) 2009-02-27 2013-07-30 Mitsubishi Heavy Industries, Ltd. Thin-film inspection apparatus and inspection method

Also Published As

Publication number Publication date
JPS63143830A (ja) 1988-06-16

Similar Documents

Publication Publication Date Title
RU1786406C (ru) Способ контрол дефектов на плоской отражающей поверхности и устройство дл его осуществлени
JP2010197367A (ja) ガラス表面の異物検査装置及びその方法｛ｄｅｔｅｃｔｉｏｎａｐｐａｒａｔｕｓｆｏｒｐａｒｔｉｃｌｅｏｎｔｈｅｇｌａｓｓａｎｄｄｅｔｅｃｔｉｏｎｍｅｔｈｏｄｕｓｉｎｇｔｈｅｓａｍｅ｝
JPH0317378B2 (en, 2012)
JPH05100413A (ja) 異物検査装置
JP2533610B2 (ja) 異物検査装置
EP0152165A2 (en) Defect inspecting apparatus for inspecting defects in optical type disc
JPS5973710A (ja) 透明円板の表面欠陥検査装置
JP2004219119A (ja) 欠陥検査方法および装置
JP3280742B2 (ja) ガラス基板用欠陥検査装置
JP4626764B2 (ja) 異物検査装置及び異物検査方法
JP2711140B2 (ja) 徴細粒子測定装置
JPH01314953A (ja) 光学的表面検査装置
JP3336392B2 (ja) 異物検査装置及び方法
JPH09281051A (ja) 検査装置
JPH07128250A (ja) 半導体装置製造用フォトマスクの異物検査装置
JP2709946B2 (ja) 異物検査方法および異物検査装置
JPH0326447Y2 (en, 2012)
JPH09218162A (ja) 表面欠陥検査装置
JPS6216372B2 (en, 2012)
JPH102863A (ja) Ｉｃマスクの異物検出方法
JPS62135751A (ja) 表面検査装置
JPH01245138A (ja) ガラスディスク検査装置における散乱光の受光方式および受光器
JPS61207951A (ja) 透明物体欠陥検査装置
JPH0432340B2 (en, 2012)
JPH0776751B2 (ja) メタリック製品の表面欠点検出方式

Legal Events

Date Code Title Description
S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313113

R371 Transfer withdrawn

Free format text: JAPANESE INTERMEDIATE CODE: R371

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313113

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313113

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term