JPH0314518B2 - - Google Patents
Info
- Publication number
- JPH0314518B2 JPH0314518B2 JP744987A JP744987A JPH0314518B2 JP H0314518 B2 JPH0314518 B2 JP H0314518B2 JP 744987 A JP744987 A JP 744987A JP 744987 A JP744987 A JP 744987A JP H0314518 B2 JPH0314518 B2 JP H0314518B2
- Authority
- JP
- Japan
- Prior art keywords
- waste liquid
- photoresist
- concentrated
- treating
- component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000007788 liquid Substances 0.000 claims description 102
- 239000002699 waste material Substances 0.000 claims description 94
- 229920002120 photoresistant polymer Polymers 0.000 claims description 73
- 238000000034 method Methods 0.000 claims description 35
- 238000000108 ultra-filtration Methods 0.000 claims description 30
- 239000012528 membrane Substances 0.000 claims description 29
- 239000000126 substance Substances 0.000 claims description 14
- 239000007787 solid Substances 0.000 claims description 10
- 238000006116 polymerization reaction Methods 0.000 claims description 8
- 238000002485 combustion reaction Methods 0.000 claims description 6
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 239000000243 solution Substances 0.000 description 28
- 238000011282 treatment Methods 0.000 description 21
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- 238000004519 manufacturing process Methods 0.000 description 13
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- 239000000047 product Substances 0.000 description 10
- 239000000463 material Substances 0.000 description 8
- 238000012545 processing Methods 0.000 description 8
- 239000003513 alkali Substances 0.000 description 7
- 238000011161 development Methods 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 239000002518 antifoaming agent Substances 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 239000005416 organic matter Substances 0.000 description 3
- 239000012466 permeate Substances 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 238000007711 solidification Methods 0.000 description 3
- 230000008023 solidification Effects 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 239000012141 concentrate Substances 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229920002492 poly(sulfone) Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 230000000379 polymerizing effect Effects 0.000 description 2
- 238000001223 reverse osmosis Methods 0.000 description 2
- 229910001415 sodium ion Inorganic materials 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 241000863032 Trieres Species 0.000 description 1
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000004480 active ingredient Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000011038 discontinuous diafiltration by volume reduction Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000005194 fractionation Methods 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 230000003204 osmotic effect Effects 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000006303 photolysis reaction Methods 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000011550 stock solution Substances 0.000 description 1
- 229920001059 synthetic polymer Polymers 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
Landscapes
- Separation Using Semi-Permeable Membranes (AREA)
- Heat Treatment Of Water, Waste Water Or Sewage (AREA)
- Physical Water Treatments (AREA)
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62007449A JPS63178888A (ja) | 1987-01-17 | 1987-01-17 | フオトレジスト含有廃液の処理方法 |
| US07/076,372 US4786417A (en) | 1986-07-23 | 1987-07-22 | Management of photoresist materials containing waste solution |
| DE8787306477T DE3782205T2 (de) | 1986-07-23 | 1987-07-22 | Behandlung einer photoresistmaterialien enthaltenden abfalloesung. |
| EP87306477A EP0254550B1 (en) | 1986-07-23 | 1987-07-22 | Treatment of photoresist materials containing waste solution |
| KR1019870007965A KR950014323B1 (ko) | 1986-07-23 | 1987-07-22 | 포토레지스트 폐액의 처리방법 |
| AT87306477T ATE81476T1 (de) | 1986-07-23 | 1987-07-22 | Behandlung einer photoresistmaterialien enthaltenden abfalloesung. |
| CN87105308A CN1010555B (zh) | 1986-07-23 | 1987-07-23 | 含光刻胶的废液的处理 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62007449A JPS63178888A (ja) | 1987-01-17 | 1987-01-17 | フオトレジスト含有廃液の処理方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63178888A JPS63178888A (ja) | 1988-07-22 |
| JPH0314518B2 true JPH0314518B2 (enrdf_load_stackoverflow) | 1991-02-26 |
Family
ID=11666146
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62007449A Granted JPS63178888A (ja) | 1986-07-23 | 1987-01-17 | フオトレジスト含有廃液の処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63178888A (enrdf_load_stackoverflow) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5112491A (en) * | 1991-03-01 | 1992-05-12 | E. I. Du Pont De Nemours And Company | Management of waste solution containing photoresist materials |
| US5811224A (en) * | 1994-08-24 | 1998-09-22 | Bayer Corporation | Process for rejuvenating developer in printing plate development |
| KR20080018215A (ko) * | 2005-06-22 | 2008-02-27 | 도아고세이가부시키가이샤 | 기체 표면 위의 유기 피막의 제거 방법 및 제거 장치 |
| JP7084683B2 (ja) * | 2015-02-23 | 2022-06-15 | 東京応化工業株式会社 | 液体の精製方法、薬液又は洗浄液の製造方法、フィルターメディア、及び、フィルターデバイス |
| JP7501075B2 (ja) * | 2020-04-24 | 2024-06-18 | ニプロ株式会社 | 排液の前処理方法および前処理システム |
-
1987
- 1987-01-17 JP JP62007449A patent/JPS63178888A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63178888A (ja) | 1988-07-22 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |