JPH0312773B2 - - Google Patents

Info

Publication number
JPH0312773B2
JPH0312773B2 JP59044100A JP4410084A JPH0312773B2 JP H0312773 B2 JPH0312773 B2 JP H0312773B2 JP 59044100 A JP59044100 A JP 59044100A JP 4410084 A JP4410084 A JP 4410084A JP H0312773 B2 JPH0312773 B2 JP H0312773B2
Authority
JP
Japan
Prior art keywords
porous silicon
substrate
nitrogen atmosphere
pressure
silicon layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59044100A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60189238A (ja
Inventor
Fumio Otoi
Hironori Kitabayashi
Kenji Anzai
Kazuo Imai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Oki Electric Industry Co Ltd
Original Assignee
Nippon Telegraph and Telephone Corp
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp, Oki Electric Industry Co Ltd filed Critical Nippon Telegraph and Telephone Corp
Priority to JP4410084A priority Critical patent/JPS60189238A/ja
Publication of JPS60189238A publication Critical patent/JPS60189238A/ja
Publication of JPH0312773B2 publication Critical patent/JPH0312773B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Element Separation (AREA)
  • Formation Of Insulating Films (AREA)
JP4410084A 1984-03-09 1984-03-09 半導体装置の製造方法 Granted JPS60189238A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4410084A JPS60189238A (ja) 1984-03-09 1984-03-09 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4410084A JPS60189238A (ja) 1984-03-09 1984-03-09 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS60189238A JPS60189238A (ja) 1985-09-26
JPH0312773B2 true JPH0312773B2 (enrdf_load_stackoverflow) 1991-02-21

Family

ID=12682193

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4410084A Granted JPS60189238A (ja) 1984-03-09 1984-03-09 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS60189238A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2643406B2 (ja) * 1989-01-18 1997-08-20 日本電気株式会社 酸化膜の形成方法及び酸化装置
JPH0438985U (enrdf_load_stackoverflow) * 1990-07-31 1992-04-02

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59144149A (ja) * 1983-02-08 1984-08-18 Toko Inc 誘電体分離基板の製造方法

Also Published As

Publication number Publication date
JPS60189238A (ja) 1985-09-26

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