JPH03123016A - 露光方法 - Google Patents

露光方法

Info

Publication number
JPH03123016A
JPH03123016A JP2214272A JP21427290A JPH03123016A JP H03123016 A JPH03123016 A JP H03123016A JP 2214272 A JP2214272 A JP 2214272A JP 21427290 A JP21427290 A JP 21427290A JP H03123016 A JPH03123016 A JP H03123016A
Authority
JP
Japan
Prior art keywords
mark
optical system
wafer
exposure
detecting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2214272A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0546088B2 (enrdf_load_stackoverflow
Inventor
Shigeo Moriyama
森山　茂夫
Yoshio Kawamura
河村　喜雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP2214272A priority Critical patent/JPH03123016A/ja
Publication of JPH03123016A publication Critical patent/JPH03123016A/ja
Publication of JPH0546088B2 publication Critical patent/JPH0546088B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2214272A 1990-08-15 1990-08-15 露光方法 Granted JPH03123016A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2214272A JPH03123016A (ja) 1990-08-15 1990-08-15 露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2214272A JPH03123016A (ja) 1990-08-15 1990-08-15 露光方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP62012367A Division JPS62181430A (ja) 1987-01-23 1987-01-23 露光装置の校正方法

Publications (2)

Publication Number Publication Date
JPH03123016A true JPH03123016A (ja) 1991-05-24
JPH0546088B2 JPH0546088B2 (enrdf_load_stackoverflow) 1993-07-13

Family

ID=16652986

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2214272A Granted JPH03123016A (ja) 1990-08-15 1990-08-15 露光方法

Country Status (1)

Country Link
JP (1) JPH03123016A (enrdf_load_stackoverflow)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3476476A (en) * 1967-03-28 1969-11-04 Optomechanisms Inc Alignment means for photo repeat machine
JPS5022577A (enrdf_load_stackoverflow) * 1973-06-26 1975-03-11
DE2557675A1 (de) * 1974-12-23 1976-07-01 Ibm Verfahren zur ausrichtung zweier planarer werkstuecke, z.b. einer maske zu einem wafer oder umgekehrt

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3476476A (en) * 1967-03-28 1969-11-04 Optomechanisms Inc Alignment means for photo repeat machine
JPS5022577A (enrdf_load_stackoverflow) * 1973-06-26 1975-03-11
DE2557675A1 (de) * 1974-12-23 1976-07-01 Ibm Verfahren zur ausrichtung zweier planarer werkstuecke, z.b. einer maske zu einem wafer oder umgekehrt

Also Published As

Publication number Publication date
JPH0546088B2 (enrdf_load_stackoverflow) 1993-07-13

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