JPH0546088B2 - - Google Patents
Info
- Publication number
- JPH0546088B2 JPH0546088B2 JP2214272A JP21427290A JPH0546088B2 JP H0546088 B2 JPH0546088 B2 JP H0546088B2 JP 2214272 A JP2214272 A JP 2214272A JP 21427290 A JP21427290 A JP 21427290A JP H0546088 B2 JPH0546088 B2 JP H0546088B2
- Authority
- JP
- Japan
- Prior art keywords
- mark
- optical system
- wafer
- exposure
- detecting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2214272A JPH03123016A (ja) | 1990-08-15 | 1990-08-15 | 露光方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2214272A JPH03123016A (ja) | 1990-08-15 | 1990-08-15 | 露光方法 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62012367A Division JPS62181430A (ja) | 1987-01-23 | 1987-01-23 | 露光装置の校正方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH03123016A JPH03123016A (ja) | 1991-05-24 |
JPH0546088B2 true JPH0546088B2 (enrdf_load_stackoverflow) | 1993-07-13 |
Family
ID=16652986
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2214272A Granted JPH03123016A (ja) | 1990-08-15 | 1990-08-15 | 露光方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03123016A (enrdf_load_stackoverflow) |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3476476A (en) * | 1967-03-28 | 1969-11-04 | Optomechanisms Inc | Alignment means for photo repeat machine |
JPS5548693B2 (enrdf_load_stackoverflow) * | 1973-06-26 | 1980-12-08 | ||
US4052603A (en) * | 1974-12-23 | 1977-10-04 | International Business Machines Corporation | Object positioning process and apparatus |
-
1990
- 1990-08-15 JP JP2214272A patent/JPH03123016A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPH03123016A (ja) | 1991-05-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5751404A (en) | Exposure apparatus and method wherein alignment is carried out by comparing marks which are incident on both reticle stage and wafer stage reference plates | |
US5811211A (en) | Peripheral edge exposure method | |
JP2773147B2 (ja) | 露光装置の位置合わせ装置及び方法 | |
JPS602772B2 (ja) | 露光装置 | |
KR100579603B1 (ko) | 리소그래피 장치 | |
KR20040086313A (ko) | 노광장치 및 노광방법 | |
JPH1050604A (ja) | 位置管理方法及び位置合わせ方法 | |
JP3344592B2 (ja) | 収差計測方法 | |
KR100239623B1 (ko) | 투영노광장치, 투영노광방법 및 반도체디바이스 제조방법 | |
JPH0142131B2 (enrdf_load_stackoverflow) | ||
JPH06101427B2 (ja) | 露光装置 | |
JPH0546088B2 (enrdf_load_stackoverflow) | ||
JPH0546089B2 (enrdf_load_stackoverflow) | ||
JPH11233424A (ja) | 投影光学装置、収差測定方法、及び投影方法、並びにデバイス製造方法 | |
JP3214027B2 (ja) | 露光装置及びそれを用いた半導体チップの製造方法 | |
JPH1152545A (ja) | レチクルおよびそれによって転写されたパターンならびにレチクルと半導体ウエハとの位置合わせ方法 | |
JPS60177625A (ja) | 投影露光装置 | |
JP2638528B2 (ja) | 位置合わせ方法 | |
JP2884767B2 (ja) | 観察装置 | |
JP3584121B2 (ja) | 走査型投影露光装置 | |
KR100251610B1 (ko) | 주사노광장치및이것을사용한노광방법 | |
JP2894061B2 (ja) | 位置検出手段を有した投影露光装置 | |
JPH05291111A (ja) | アライメント装置 | |
JPH0513304A (ja) | 投影露光装置及び半導体デバイス製造方法 | |
JPS6097623A (ja) | 露光装置 |