JPH0546089B2 - - Google Patents
Info
- Publication number
- JPH0546089B2 JPH0546089B2 JP2214273A JP21427390A JPH0546089B2 JP H0546089 B2 JPH0546089 B2 JP H0546089B2 JP 2214273 A JP2214273 A JP 2214273A JP 21427390 A JP21427390 A JP 21427390A JP H0546089 B2 JPH0546089 B2 JP H0546089B2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- mask
- pattern
- mark
- lens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 claims description 27
- 230000009467 reduction Effects 0.000 claims description 22
- 238000001514 detection method Methods 0.000 claims description 18
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 239000011651 chromium Substances 0.000 claims description 2
- 230000005540 biological transmission Effects 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 21
- 238000000034 method Methods 0.000 description 15
- 238000005286 illumination Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 239000013307 optical fiber Substances 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000007781 pre-processing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2214273A JPH03123017A (ja) | 1990-08-15 | 1990-08-15 | 露光装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2214273A JPH03123017A (ja) | 1990-08-15 | 1990-08-15 | 露光装置 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62012367A Division JPS62181430A (ja) | 1987-01-23 | 1987-01-23 | 露光装置の校正方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03123017A JPH03123017A (ja) | 1991-05-24 |
| JPH0546089B2 true JPH0546089B2 (enrdf_load_stackoverflow) | 1993-07-13 |
Family
ID=16653004
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2214273A Granted JPH03123017A (ja) | 1990-08-15 | 1990-08-15 | 露光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03123017A (enrdf_load_stackoverflow) |
-
1990
- 1990-08-15 JP JP2214273A patent/JPH03123017A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH03123017A (ja) | 1991-05-24 |
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