JPH0142131B2 - - Google Patents

Info

Publication number
JPH0142131B2
JPH0142131B2 JP62012367A JP1236787A JPH0142131B2 JP H0142131 B2 JPH0142131 B2 JP H0142131B2 JP 62012367 A JP62012367 A JP 62012367A JP 1236787 A JP1236787 A JP 1236787A JP H0142131 B2 JPH0142131 B2 JP H0142131B2
Authority
JP
Japan
Prior art keywords
optical system
mark
wafer
alignment
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP62012367A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62181430A (ja
Inventor
Shigeo Moryama
Yoshio Kawamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP62012367A priority Critical patent/JPS62181430A/ja
Publication of JPS62181430A publication Critical patent/JPS62181430A/ja
Publication of JPH0142131B2 publication Critical patent/JPH0142131B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP62012367A 1987-01-23 1987-01-23 露光装置の校正方法 Granted JPS62181430A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62012367A JPS62181430A (ja) 1987-01-23 1987-01-23 露光装置の校正方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62012367A JPS62181430A (ja) 1987-01-23 1987-01-23 露光装置の校正方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP51130482A Division JPS602772B2 (ja) 1976-11-01 1976-11-01 露光装置

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP2214273A Division JPH03123017A (ja) 1990-08-15 1990-08-15 露光装置
JP2214272A Division JPH03123016A (ja) 1990-08-15 1990-08-15 露光方法

Publications (2)

Publication Number Publication Date
JPS62181430A JPS62181430A (ja) 1987-08-08
JPH0142131B2 true JPH0142131B2 (enrdf_load_stackoverflow) 1989-09-11

Family

ID=11803298

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62012367A Granted JPS62181430A (ja) 1987-01-23 1987-01-23 露光装置の校正方法

Country Status (1)

Country Link
JP (1) JPS62181430A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2588860B2 (ja) * 1988-01-27 1997-03-12 ウシオ電機株式会社 プリント基板製作の露光方法
JP2830492B2 (ja) 1991-03-06 1998-12-02 株式会社ニコン 投影露光装置及び投影露光方法
US5874820A (en) * 1995-04-04 1999-02-23 Nikon Corporation Window frame-guided stage mechanism

Also Published As

Publication number Publication date
JPS62181430A (ja) 1987-08-08

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