JPS62181430A - 露光装置の校正方法 - Google Patents

露光装置の校正方法

Info

Publication number
JPS62181430A
JPS62181430A JP62012367A JP1236787A JPS62181430A JP S62181430 A JPS62181430 A JP S62181430A JP 62012367 A JP62012367 A JP 62012367A JP 1236787 A JP1236787 A JP 1236787A JP S62181430 A JPS62181430 A JP S62181430A
Authority
JP
Japan
Prior art keywords
mask
wafer
optical system
mark
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62012367A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0142131B2 (enrdf_load_stackoverflow
Inventor
Shigeo Moriyama
森山　茂夫
Yoshio Kawamura
河村　喜雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP62012367A priority Critical patent/JPS62181430A/ja
Publication of JPS62181430A publication Critical patent/JPS62181430A/ja
Publication of JPH0142131B2 publication Critical patent/JPH0142131B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP62012367A 1987-01-23 1987-01-23 露光装置の校正方法 Granted JPS62181430A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62012367A JPS62181430A (ja) 1987-01-23 1987-01-23 露光装置の校正方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62012367A JPS62181430A (ja) 1987-01-23 1987-01-23 露光装置の校正方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP51130482A Division JPS602772B2 (ja) 1976-11-01 1976-11-01 露光装置

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP2214273A Division JPH03123017A (ja) 1990-08-15 1990-08-15 露光装置
JP2214272A Division JPH03123016A (ja) 1990-08-15 1990-08-15 露光方法

Publications (2)

Publication Number Publication Date
JPS62181430A true JPS62181430A (ja) 1987-08-08
JPH0142131B2 JPH0142131B2 (enrdf_load_stackoverflow) 1989-09-11

Family

ID=11803298

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62012367A Granted JPS62181430A (ja) 1987-01-23 1987-01-23 露光装置の校正方法

Country Status (1)

Country Link
JP (1) JPS62181430A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01191493A (ja) * 1988-01-27 1989-08-01 Ushio Inc プリント基板製作の露光方法
KR100314554B1 (ko) * 1995-04-04 2001-11-30 시마무라 테루오 노광장치 및 노광방법
USRE37946E1 (en) 1991-03-06 2002-12-31 Nikon Corporation Exposure method and projection exposure apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01191493A (ja) * 1988-01-27 1989-08-01 Ushio Inc プリント基板製作の露光方法
USRE37946E1 (en) 1991-03-06 2002-12-31 Nikon Corporation Exposure method and projection exposure apparatus
KR100314554B1 (ko) * 1995-04-04 2001-11-30 시마무라 테루오 노광장치 및 노광방법

Also Published As

Publication number Publication date
JPH0142131B2 (enrdf_load_stackoverflow) 1989-09-11

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