JPH03101849U - - Google Patents

Info

Publication number
JPH03101849U
JPH03101849U JP997190U JP997190U JPH03101849U JP H03101849 U JPH03101849 U JP H03101849U JP 997190 U JP997190 U JP 997190U JP 997190 U JP997190 U JP 997190U JP H03101849 U JPH03101849 U JP H03101849U
Authority
JP
Japan
Prior art keywords
electrode
deflection
deflection electrodes
ion
scans
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP997190U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP997190U priority Critical patent/JPH03101849U/ja
Publication of JPH03101849U publication Critical patent/JPH03101849U/ja
Pending legal-status Critical Current

Links

JP997190U 1990-02-02 1990-02-02 Pending JPH03101849U (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP997190U JPH03101849U (enrdf_load_stackoverflow) 1990-02-02 1990-02-02

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP997190U JPH03101849U (enrdf_load_stackoverflow) 1990-02-02 1990-02-02

Publications (1)

Publication Number Publication Date
JPH03101849U true JPH03101849U (enrdf_load_stackoverflow) 1991-10-23

Family

ID=31513555

Family Applications (1)

Application Number Title Priority Date Filing Date
JP997190U Pending JPH03101849U (enrdf_load_stackoverflow) 1990-02-02 1990-02-02

Country Status (1)

Country Link
JP (1) JPH03101849U (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012077554A1 (ja) * 2010-12-06 2012-06-14 株式会社日立ハイテクノロジーズ 荷電粒子線装置及び荷電粒子線照射方法
KR101476933B1 (ko) * 2013-12-30 2014-12-24 최점락 회전이 가능한 이중반지
JP2015517192A (ja) * 2012-04-17 2015-06-18 ヴァリアン セミコンダクター イクイップメント アソシエイツ インコーポレイテッド 両頭電極マニピュレータ

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012077554A1 (ja) * 2010-12-06 2012-06-14 株式会社日立ハイテクノロジーズ 荷電粒子線装置及び荷電粒子線照射方法
JP2015517192A (ja) * 2012-04-17 2015-06-18 ヴァリアン セミコンダクター イクイップメント アソシエイツ インコーポレイテッド 両頭電極マニピュレータ
KR101476933B1 (ko) * 2013-12-30 2014-12-24 최점락 회전이 가능한 이중반지

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