JPH03101849U - - Google Patents
Info
- Publication number
- JPH03101849U JPH03101849U JP997190U JP997190U JPH03101849U JP H03101849 U JPH03101849 U JP H03101849U JP 997190 U JP997190 U JP 997190U JP 997190 U JP997190 U JP 997190U JP H03101849 U JPH03101849 U JP H03101849U
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- deflection
- deflection electrodes
- ion
- scans
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005468 ion implantation Methods 0.000 claims description 3
- 238000010884 ion-beam technique Methods 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 5
Description
第１図は、この考案の一実施例に係るイオン注
入装置を部分的に示す図である。第２図Ａないし
Ｃは、それぞれ、第１図の装置における偏向電極
の状態の例を示す図である。第３図は、偏向電極
およびその駆動装置の他の例を示す図である。第
４図は、従来のイオン注入装置の一例を部分的に
示す図である。第５図ＡないしＣは、それぞれ、
イオンビームの傾きや歪みの例を示す図である。
２……イオンビーム、４，１０……走査電極、
１６……ターゲツト、１８……駆動装置、２０…
…偏向電極、２１……支持軸、２２……電極片、
３０……電極駆動装置。
FIG. 1 is a diagram partially showing an ion implantation apparatus according to an embodiment of this invention. FIGS. 2A to 2C are diagrams showing examples of states of the deflection electrodes in the apparatus of FIG. 1, respectively. FIG. 3 is a diagram showing another example of a deflection electrode and its driving device. FIG. 4 is a diagram partially showing an example of a conventional ion implantation apparatus. Figures A to C are, respectively,
FIG. 3 is a diagram showing an example of the tilt and distortion of an ion beam. 2...Ion beam, 4,10...Scanning electrode,
16...Target, 18...Drive device, 20...
... Deflection electrode, 21 ... Support shaft, 22 ... Electrode piece,
30... Electrode driving device.
Claims (1)
に、ターゲツトをＸ方向と直交するＹ方向に機械
的に走査するようにしたイオン注入装置であつて
、Ｘ方向に走査されたイオンビームをＹ方向に偏
向させる一組の偏向電極を有するものにおいて、
前記各偏向電極を、１以上の支持軸とそれを中心
にして蝶番状に折れ曲がる複数の電極片とでそれ
ぞれ構成し、かつこの各偏向電極に対して、その
少なくとも両端部の電極片をＹ方向にそれぞれ往
復動させる電極駆動装置を設けたことを特徴とす
るイオン注入装置。 This is an ion implanter that electrically scans the ion beam in the X direction and mechanically scans the target in the Y direction, which is orthogonal to the X direction. In one having a set of deflection electrodes for deflecting,
Each of the deflection electrodes is composed of one or more support shafts and a plurality of electrode pieces bent in a hinge shape around the support shaft, and at least the electrode pieces at both ends of each deflection electrode are arranged in the Y direction. An ion implantation device characterized by being provided with an electrode driving device that causes each to reciprocate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP997190U JPH03101849U (en) | 1990-02-02 | 1990-02-02 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP997190U JPH03101849U (en) | 1990-02-02 | 1990-02-02 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03101849U true JPH03101849U (en) | 1991-10-23 |
Family
ID=31513555
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP997190U Pending JPH03101849U (en) | 1990-02-02 | 1990-02-02 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03101849U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012077554A1 (en) * | 2010-12-06 | 2012-06-14 | 株式会社日立ハイテクノロジーズ | Charged particle beam apparatus and method of irradiating charged particle beam |
| KR101476933B1 (en) * | 2013-12-30 | 2014-12-24 | 최점락 | Revolving dual ring |
| JP2015517192A (en) * | 2012-04-17 | 2015-06-18 | ヴァリアン セミコンダクター イクイップメント アソシエイツ インコーポレイテッド | Double-headed electrode manipulator |
-
1990
- 1990-02-02 JP JP997190U patent/JPH03101849U/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012077554A1 (en) * | 2010-12-06 | 2012-06-14 | 株式会社日立ハイテクノロジーズ | Charged particle beam apparatus and method of irradiating charged particle beam |
| JP2015517192A (en) * | 2012-04-17 | 2015-06-18 | ヴァリアン セミコンダクター イクイップメント アソシエイツ インコーポレイテッド | Double-headed electrode manipulator |
| KR101476933B1 (en) * | 2013-12-30 | 2014-12-24 | 최점락 | Revolving dual ring |
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