JPH0282032U - - Google Patents

Info

Publication number
JPH0282032U
JPH0282032U JP16288688U JP16288688U JPH0282032U JP H0282032 U JPH0282032 U JP H0282032U JP 16288688 U JP16288688 U JP 16288688U JP 16288688 U JP16288688 U JP 16288688U JP H0282032 U JPH0282032 U JP H0282032U
Authority
JP
Japan
Prior art keywords
load lock
boat
wafers
preliminary chamber
lock chambers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16288688U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0517879Y2 (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP16288688U priority Critical patent/JPH0517879Y2/ja
Publication of JPH0282032U publication Critical patent/JPH0282032U/ja
Application granted granted Critical
Publication of JPH0517879Y2 publication Critical patent/JPH0517879Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP16288688U 1988-12-14 1988-12-14 Expired - Lifetime JPH0517879Y2 (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16288688U JPH0517879Y2 (enrdf_load_stackoverflow) 1988-12-14 1988-12-14

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16288688U JPH0517879Y2 (enrdf_load_stackoverflow) 1988-12-14 1988-12-14

Publications (2)

Publication Number Publication Date
JPH0282032U true JPH0282032U (enrdf_load_stackoverflow) 1990-06-25
JPH0517879Y2 JPH0517879Y2 (enrdf_load_stackoverflow) 1993-05-13

Family

ID=31447121

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16288688U Expired - Lifetime JPH0517879Y2 (enrdf_load_stackoverflow) 1988-12-14 1988-12-14

Country Status (1)

Country Link
JP (1) JPH0517879Y2 (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04137613A (ja) * 1990-09-28 1992-05-12 Handotai Process Kenkyusho:Kk 半導体装置の製造装置
JPH04188721A (ja) * 1990-11-22 1992-07-07 Tokyo Electron Ltd 縦型熱処理装置
JPH05198659A (ja) * 1992-01-22 1993-08-06 Tokyo Ohka Kogyo Co Ltd プラズマ処理装置
JPH0883831A (ja) * 1994-09-13 1996-03-26 Nec Corp 半導体装置の製造装置
WO1996024949A1 (fr) * 1995-02-10 1996-08-15 Tokyo Electron Limited Procede de traitement thermique et appareil
JPH1092906A (ja) * 1996-09-05 1998-04-10 Samsung Electron Co Ltd 半導体ウェーハ熱処理装置

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04137613A (ja) * 1990-09-28 1992-05-12 Handotai Process Kenkyusho:Kk 半導体装置の製造装置
JPH04188721A (ja) * 1990-11-22 1992-07-07 Tokyo Electron Ltd 縦型熱処理装置
JPH05198659A (ja) * 1992-01-22 1993-08-06 Tokyo Ohka Kogyo Co Ltd プラズマ処理装置
JPH0883831A (ja) * 1994-09-13 1996-03-26 Nec Corp 半導体装置の製造装置
WO1996024949A1 (fr) * 1995-02-10 1996-08-15 Tokyo Electron Limited Procede de traitement thermique et appareil
US6322631B1 (en) 1995-02-10 2001-11-27 Tokyo Electron Limited Heat treatment method and its apparatus
JPH1092906A (ja) * 1996-09-05 1998-04-10 Samsung Electron Co Ltd 半導体ウェーハ熱処理装置

Also Published As

Publication number Publication date
JPH0517879Y2 (enrdf_load_stackoverflow) 1993-05-13

Similar Documents

Publication Publication Date Title
KR20040044624A (ko) 다중 클러스터 장치
JP3926890B2 (ja) 処理システム
JPS63234554A (ja) 半導体装置の製造方法
JPH0533529B2 (enrdf_load_stackoverflow)
JPH0282032U (enrdf_load_stackoverflow)
JPH01251734A (ja) マルチチャンバ型ｃｖｄ装置
JPH0461146A (ja) 半導体ウエハ移替装置
EP0378815A3 (en) Continuous chemical vapour deposition system
JP2932646B2 (ja) 膜形成方法
JPH04323849A (ja) ウェーハ用真空チャック
JPH0945754A (ja) 半導体製造装置のウェーハ台装置
JPH05226455A (ja) 処理装置
JPS63127125U (enrdf_load_stackoverflow)
JPH0138911Y2 (enrdf_load_stackoverflow)
JP2975496B2 (ja) 素子分離構造の形成方法
JP2683673B2 (ja) 縦型熱処理装置
KR19980068081A (ko) 매엽식 반도체 시스템의 시퀀스 처리방법
JPS5923414Y2 (ja) 両面目合せ露光機のウエ−ハチヤツク機構
JPH01241124A (ja) レジスト被塗布体の加熱装置
JPH0528756Y2 (enrdf_load_stackoverflow)
JPH04365348A (ja) 半導体製造装置
JPH0721570Y2 (ja) 縦型減圧ｃｖｄ膜製造装置
JPH0279026U (enrdf_load_stackoverflow)
JPH0275724U (enrdf_load_stackoverflow)
JPH0350329U (enrdf_load_stackoverflow)