JPS63127125U - - Google Patents
Info
- Publication number
- JPS63127125U JPS63127125U JP1770387U JP1770387U JPS63127125U JP S63127125 U JPS63127125 U JP S63127125U JP 1770387 U JP1770387 U JP 1770387U JP 1770387 U JP1770387 U JP 1770387U JP S63127125 U JPS63127125 U JP S63127125U
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- processing
- dummy wafer
- vacuum
- processing chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1770387U JPS63127125U (enrdf_load_stackoverflow) | 1987-02-12 | 1987-02-12 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1770387U JPS63127125U (enrdf_load_stackoverflow) | 1987-02-12 | 1987-02-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63127125U true JPS63127125U (enrdf_load_stackoverflow) | 1988-08-19 |
Family
ID=30810697
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1770387U Pending JPS63127125U (enrdf_load_stackoverflow) | 1987-02-12 | 1987-02-12 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63127125U (enrdf_load_stackoverflow) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02106037A (ja) * | 1988-10-14 | 1990-04-18 | Tokyo Electron Ltd | 処理方法 |
| JPH0412628U (enrdf_load_stackoverflow) * | 1990-05-22 | 1992-01-31 | ||
| EP0856875B1 (en) * | 1990-08-29 | 2003-05-07 | Hitachi, Ltd. | Operating method for vacuum processing apparatus |
| JP2004311894A (ja) * | 2003-04-10 | 2004-11-04 | Renesas Technology Corp | 半導体装置の製造方法 |
| JP2011222825A (ja) * | 2010-04-12 | 2011-11-04 | Tokyo Electron Ltd | 被処理体処理装置 |
| JP2017011023A (ja) * | 2015-06-18 | 2017-01-12 | 株式会社Ｓｃｒｅｅｎホールディングス | 基板処理装置および基板処理方法 |
-
1987
- 1987-02-12 JP JP1770387U patent/JPS63127125U/ja active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02106037A (ja) * | 1988-10-14 | 1990-04-18 | Tokyo Electron Ltd | 処理方法 |
| JPH0412628U (enrdf_load_stackoverflow) * | 1990-05-22 | 1992-01-31 | ||
| EP0856875B1 (en) * | 1990-08-29 | 2003-05-07 | Hitachi, Ltd. | Operating method for vacuum processing apparatus |
| EP0805481B1 (en) * | 1990-08-29 | 2006-06-21 | Hitachi, Ltd. | Operating method for vacuum processing apparatus |
| JP2004311894A (ja) * | 2003-04-10 | 2004-11-04 | Renesas Technology Corp | 半導体装置の製造方法 |
| JP2011222825A (ja) * | 2010-04-12 | 2011-11-04 | Tokyo Electron Ltd | 被処理体処理装置 |
| JP2017011023A (ja) * | 2015-06-18 | 2017-01-12 | 株式会社Ｓｃｒｅｅｎホールディングス | 基板処理装置および基板処理方法 |