JPH0138911Y2 - - Google Patents
Info
- Publication number
- JPH0138911Y2 JPH0138911Y2 JP8920181U JP8920181U JPH0138911Y2 JP H0138911 Y2 JPH0138911 Y2 JP H0138911Y2 JP 8920181 U JP8920181 U JP 8920181U JP 8920181 U JP8920181 U JP 8920181U JP H0138911 Y2 JPH0138911 Y2 JP H0138911Y2
- Authority
- JP
- Japan
- Prior art keywords
- etching
- substrate
- chamber
- plasma
- chambers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 70
- 238000005530 etching Methods 0.000 claims description 61
- 238000001020 plasma etching Methods 0.000 claims description 5
- 150000002500 ions Chemical class 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 4
- 230000007935 neutral effect Effects 0.000 claims description 4
- 230000005684 electric field Effects 0.000 claims description 3
- 238000001704 evaporation Methods 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 3
- 239000004809 Teflon Substances 0.000 description 13
- 229920006362 Teflon® Polymers 0.000 description 13
- 238000002347 injection Methods 0.000 description 6
- 239000007924 injection Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 230000007723 transport mechanism Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- 229910018125 Al-Si Inorganic materials 0.000 description 1
- 229910018520 Al—Si Inorganic materials 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 229910018594 Si-Cu Inorganic materials 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- 229910008465 Si—Cu Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8920181U JPH0138911Y2 (enrdf_load_stackoverflow) | 1981-06-16 | 1981-06-16 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8920181U JPH0138911Y2 (enrdf_load_stackoverflow) | 1981-06-16 | 1981-06-16 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57200030U JPS57200030U (enrdf_load_stackoverflow) | 1982-12-20 |
| JPH0138911Y2 true JPH0138911Y2 (enrdf_load_stackoverflow) | 1989-11-21 |
Family
ID=29884351
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8920181U Expired JPH0138911Y2 (enrdf_load_stackoverflow) | 1981-06-16 | 1981-06-16 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0138911Y2 (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0666298B2 (ja) * | 1983-02-03 | 1994-08-24 | 日電アネルバ株式会社 | ドライエッチング装置 |
-
1981
- 1981-06-16 JP JP8920181U patent/JPH0138911Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57200030U (enrdf_load_stackoverflow) | 1982-12-20 |
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